scholarly journals Ion-assisted laser deposition of intermediate layers for YBa2Cu3O7-δ thin film growth on polycrystalline and amorphous substrates

1993 ◽  
Author(s):  
Ronald P. Reade
Keyword(s):  
Thin Film ◽  
Film Growth ◽  
Thin Film Growth ◽  
Laser Deposition ◽  
Intermediate Layers ◽  
Amorphous Substrates

Biaxially-Textured YBa2Cu3O7–x Thin Film Growth on Polycrystalline and Amorphous Substrates Using Ion Assisted Laser Deposition of Yttria-Stabilized Zirconia Intermediate Layers

1992 ◽  
Vol 285 ◽  
Author(s):  
R. P. Reade ◽  
P. Berdahl ◽  
R. E. Russo ◽  
S. M. Garrison
Keyword(s):  
Thin Film ◽  
Film Growth ◽  
Incident Angle ◽  
Ion Beam ◽  
Yttria Stabilized Zirconia ◽  
Thin Film Growth ◽  
Laser Deposition ◽  
Stabilized Zirconia ◽  
Polycrystalline Alumina ◽  
Intermediate Layers

ABSTRACTThe growth of (001)-textured, biaxially-aligned yttria-stabilized zirconia (YSZ) intermediate layers on amorphous or randomly-oriented polycrystalline substrates is desirable for subsequent YBa2Cu3O7–x (YBCO) c-axis thin film growth. Laser deposition of YSZ on polycrystalline metal substrates (Haynes Alloy #230) in 1.0 millitorr oxygen at 70°C produces partial (001) texture but no alignment of in-plane axes. Highly-textured biaxially-aligned layers are obtained by using an ion beam to assist growth. Similar layers are obtained on amorphous silica and polycrystalline alumina substrates. The effects of ion-beam parameters including incident angle, source gas, and beam voltage and current are presented. Highly c-axis-oriented, biaxiallyaligned YBCO thin films have been deposited in situ on these YSZ layers, with Tc(R=0) ∼ 92K and Jc(77K) = 6 × 105 A/cm2. Angular magnetoresistance data shows a dip in resistance with magnetic field normal to the film, in contrast to films grown epitaxially on single crystal substrates, which have maximum resistance with field normal.

Incongruent pulsed laser deposition strategy for thin film growth of Ca3Co4O9 thermoelectric compound

2019 ◽  
Vol 45 (10) ◽  
pp. 13138-13143 ◽  
Author(s):  
Haiyang Hu ◽  
Fei Shao ◽  
Jikun Chen ◽  
Max Döbeli ◽  
Qingfeng Song ◽  
...  
Keyword(s):  
Thin Film ◽  
Pulsed Laser Deposition ◽  
Film Growth ◽  
Pulsed Laser ◽  
Thin Film Growth ◽  
Laser Deposition

Thin film growth by inverse pulsed laser deposition

2005 ◽  
Vol 484 (1-2) ◽  
pp. 165-169 ◽  
Author(s):  
Tamás Szörényi ◽  
Zsolt Geretovszky
Keyword(s):  
Thin Film ◽  
Pulsed Laser Deposition ◽  
Film Growth ◽  
Pulsed Laser ◽  
Thin Film Growth ◽  
Laser Deposition

Controlled deposition of wedge-shaped profiles for thin (∼10Å) layers by pulsed laser deposition

2003 ◽  
Vol 804 ◽  
Author(s):  
H.M. Christen ◽  
I. Ohkubo
Keyword(s):  
Thin Film ◽  
Pulsed Laser Deposition ◽  
Film Growth ◽  
Pulsed Laser ◽  
Thin Film Growth ◽  
Laser Deposition ◽  
Sample Sizes ◽  
Basic Principles ◽  
Controlled Deposition ◽  
Thin Wedge

ABSTRACTA method yielding precisely controlled thickness profiles in thin-film growth is necessary for continuous compositional spread techniques. While multiple approaches have been introduced and successfully tested, some specific applications require the use of very thin “wedge”-type profiles (∼10 Å at the thickest point), while at the same time yielding lateral sample sizes of several centimeters. Here we introduce the basic principles of a pulsed-laser deposition based approach utilizing the translation of the substrate behind a slit-shaped aperture and demonstrate by simple calculations that this method can satisfy these requirements.

Effect of Ga Re-evaporation on AlxGa1-xN Thin Film Growth by Dual-Beam Pulsed Laser Deposition Method in N2Ambient

2003 ◽  
Vol 42 (Part 1, No. 5A) ◽  
pp. 2856-2857 ◽  
Author(s):  
Yoichiro Masuyama ◽  
Shinsuke Komatsu ◽  
Masaya Kiso ◽  
Kouhei Mizuno ◽  
Takeshi Kobayashi
Keyword(s):  
Thin Film ◽  
Pulsed Laser Deposition ◽  
Film Growth ◽  
Pulsed Laser ◽  
Thin Film Growth ◽  
Laser Deposition ◽  
Deposition Method ◽  
Dual Beam

scholarly journals High quality superconducting titanium nitride thin film growth using infrared pulsed laser deposition

2018 ◽  
Vol 31 (5) ◽  
pp. 055017 ◽  
Author(s):  
A Torgovkin ◽  
S Chaudhuri ◽  
A Ruhtinas ◽  
M Lahtinen ◽  
T Sajavaara ◽  
...  
Keyword(s):  
Thin Film ◽  
Titanium Nitride ◽  
Pulsed Laser Deposition ◽  
Film Growth ◽  
Pulsed Laser ◽  
Thin Film Growth ◽  
Laser Deposition ◽  
High Quality
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