Controlled Megasonic Cleaning of Patterned Structures Using Solutions with Dissolved Gas and Surfactant

2021 ◽  
Author(s):  
Bichitra Nanda Sahoo ◽  
So Young Han ◽  
Nagendra Prasad Yerriboina ◽  
Hyuntae Kim ◽  
Keita Ando ◽  
...  
Keyword(s):  
Dissolved Gas ◽  
Megasonic Cleaning ◽  
Patterned Structures

scholarly journals Chemically controlled megasonic cleaning of patterned structures using solutions with dissolved gas and surfactant

2021 ◽  
pp. 105859
Author(s):  
Bichitra Nanda Sahoo ◽  
So Young Han ◽  
Hyun-Tae Kim ◽  
Keita Ando ◽  
Tae-Gon Kim ◽  
...  
Keyword(s):  
Dissolved Gas ◽  
Megasonic Cleaning ◽  
Patterned Structures

Evaluation of Megasonic Cleaning for Sub-90nm Technologies

2005 ◽  
Vol 103-104 ◽  
pp. 141-146 ◽  
Author(s):  
Guy Vereecke ◽  
Frank Holsteyns ◽  
Sophia Arnauts ◽  
S. Beckx ◽  
P. Jaenen ◽  
...  
Keyword(s):  
Low Temperature ◽  
Mass Balance ◽  
Semiconductor Manufacturing ◽  
Particle Removal ◽  
Dissolved Gas ◽  
Cleaning Efficiency ◽  
Megasonic Cleaning ◽  
High Particle ◽  
The Cost

Cleaning of nanoparticles (< 50nm ) is becoming a major challenge in semiconductor manufacturing and the future use of traditional methods, such as megasonic cleaning, is questioned. In this paper the capability of megasonic cleaning to remove nanoparticles without inflicting damage to fragile structures is investigated. The role of dissolved gas in cleaning efficiency indicates that cavitation is the main cleaning mechanism. Consequently gas mass-balance analyses are needed to optimize the performance of cleaning tools. When gas is dissolved in the cleaning present tools can remove nanoparticles down to about 30 nm using dilute chemistries at low temperature. Ultimate performance is limited by cleaning uniformity, which depends on tool design and operation. However no tool reached the target of high particle removal efficiency andlow damage. Significantly lower damage could only be obtained by decreasing the power, at the cost of a lower cleaning efficiency for nanoparticles. The development of damage-free megasonic is discussed.

Megasonic cleaning: effect of dissolved gas properties on cleaning

2013 ◽  
Author(s):  
Hrishi Shende ◽  
Sherjang Singh ◽  
James Baugh ◽  
Uwe Dietze ◽  
Peter Dress
Keyword(s):  
Dissolved Gas ◽  
Megasonic Cleaning ◽  
Gas Properties

Hybrid Micro-Optical Sensors via Sol-Gel Soft Lithography

2000 ◽  
Vol 628 ◽  
Author(s):  
Mark A. Clarner ◽  
Michael J. Lochhead
Keyword(s):  
Optical Sensors ◽  
Soft Lithography ◽  
Sol Gel ◽  
Silica Gels ◽  
Ph Sensing ◽  
Ambient Conditions ◽  
Sensor Applications ◽  
Patterned Structures ◽  
Biological Functionality ◽  
Indicator Dyes

ABSTRACTOrganically modified silica gels and dye-doped silica gels have been patterned into micrometer-scale structures on a substrate using micro molding in capillaries (MIMIC). This approach is from a class of elastomeric stamping and molding techniques collectively known as soft lithography. Soft lithography and sol-gel processing share attractive features in that they are relatively benign processes performed at ambient conditions, which makes both techniques compatible with a wide variety of organic molecules, molecular assemblies, and biomolecules. The combination of sol-gel and soft lithography, therefore, holds enormous promise as a tool for microfabrication of materials with optical, chemical, or biological functionality that are not readily patterned with conventional methods. This paper describes our investigation of micro-patterned organic-inorganic hybrid materials containing indicator dyes for microfluidic sensor applications. Reversible colorimetric pH sensing via entrapped reagents is demonstrated in a prototype microfluidic sensor element. Patterned structures range from one to tens of micrometers in cross-section and are up to centimeters in length. Fundamental chemical processing issues associated with mold filling, cracking and sensor stability are discussed.

The Effect of Gas Property on Atomization Features of Dissolved Gas Jet

1997 ◽  
Vol 24 (1-3) ◽  
pp. 180-188
Author(s):  
Shao Yiming ◽  
Zhen Huang ◽  
Siichi Shiga ◽  
Hisao Nakamura ◽  
Takao Karasawa
Keyword(s):  
Gas Jet ◽  
Dissolved Gas

Effects of Ultrasounds on Neat nitrobenzene

2019 ◽  
Vol 70 (8) ◽  
pp. 3085-3088
Author(s):  
Carmen Eugenia Stavarache ◽  
Yasuaki Maeda ◽  
Mircea Vinatoru
Keyword(s):  
Nitro Group ◽  
Radical Cation ◽  
Reaction Mechanisms ◽  
Diphenyl Ether ◽  
Argon Atmosphere ◽  
Phenyl Radical ◽  
Dissolved Gas ◽  
Decomposition Products ◽  
Oxygenated Compounds ◽  
Phenyl Cation

Neat nitrobenzene was continuously irradiated at two ultrasonic frequencies: 40 and 200 kHz, under air and argon atmosphere, respectively. Samples taken at intervals of 1, 5, 10 and 24 h were analyzed by GC-MS and decomposition products were identified. Possible reaction mechanisms are discussed. Presence of air as dissolved gas leads to oxygenated compounds such as 1,4-benzoquinone, 2,4-dinitrophenol, m-dinitrobenzene while argon inhibits the decomposition of nitrobenzene, especially at sonication times under 5 h. Based on the nature of the compounds identified we advanced a mechanism, involving a divergent splitting of unstable radical cation of NB in air and argon respectively. Thus, under air, the phenyl cation formation is preferred leading to 1,4-benzoquinone nitro-biphenyls and dinitrobenzene, while under argon, the phenyl radical formation seems to be favored, leading to phenol and diphenyl ether. The oxygenated compounds detected under argon clearly are a consequence of the nitro group splitting.

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