Property-Targeted Design of High-Entropy Alloys Based on Tailoring Through Solid-State Alloying from Multilayer Thin Films

2020 ◽  
Author(s):  
Seungjin Nam ◽  
Sang Jun Kim ◽  
Kook Noh Yoon ◽  
Moon J. Kim ◽  
Manuel Quevedo-Lopez ◽  
...  
Author(s):  
F. Ma ◽  
S. Vivekanand ◽  
K. Barmak ◽  
C. Michaelsen

Solid state reactions in sputter-deposited Nb/Al multilayer thin films have been studied by transmission and analytical electron microscopy (TEM/AEM), differential scanning calorimetry (DSC) and X-ray diffraction (XRD). The Nb/Al multilayer thin films for TEM studies were sputter-deposited on (1102)sapphire substrates. The periodicity of the films is in the range 10-500 nm. The overall composition of the films are 1/3, 2/1, and 3/1 Nb/Al, corresponding to the stoichiometric composition of the three intermetallic phases in this system.Figure 1 is a TEM micrograph of an as-deposited film with periodicity A = dA1 + dNb = 72 nm, where d's are layer thicknesses. The polycrystalline nature of the Al and Nb layers with their columnar grain structure is evident in the figure. Both Nb and Al layers exhibit crystallographic texture, with the electron diffraction pattern for this film showing stronger diffraction spots in the direction normal to the multilayer. The X-ray diffraction patterns of all films are dominated by the Al(l 11) and Nb(l 10) peaks and show a merging of these two peaks with decreasing periodicity.


JOM ◽  
2021 ◽  
Author(s):  
Evgeny T. Moiseenko ◽  
Sergey M. Zharkov ◽  
Roman R. Altunin ◽  
Oleg V. Belousov ◽  
Leonid A. Solovyov ◽  
...  

2022 ◽  
Vol 207 ◽  
pp. 114302
Author(s):  
Seungjin Nam ◽  
Sang Jun Kim ◽  
Moon J. Kim ◽  
Manuel Quevedo-Lopez ◽  
Jun Yeon Hwang ◽  
...  

2011 ◽  
Vol 184 (1) ◽  
pp. 14-18 ◽  
Author(s):  
Saulius Burinskas ◽  
Vytautas Adomonis ◽  
Julius Dudonis ◽  
Giedrius Laukaitis ◽  
Virgilijus Minialga ◽  
...  

MRS Advances ◽  
2017 ◽  
Vol 2 (26) ◽  
pp. 1375-1380 ◽  
Author(s):  
M B D Ellis ◽  
G R Doughty

AbstractFor the past ten years Metalysis have produced tantalum, titanium and titanium alloy powders for high performance applications using their solid state salt electrolysis process. This low energy and environmentally friendly process is now being used to manufacture the next generation of High Entropy Alloys (HEAs).In most cases the manufacture of HEAs involves high temperatures which put all of the alloying elements into the liquid phase. This can lead to numerous problems and restrict the number of HEAs which can be made, particularly the alloys where one needs to combine low melting point elements with refractory elements and also where there are significant liquid density differences between the constituents causing melt segregation.The aim is to present the preliminary work carried out by Metalysis and to show how the solid state diffusion process based on molten salt electrolysis lends itself to the industrial scale manufacture of the next generation of HEAs. This study will focus on the HEAs whose constituent alloying elements have large differences in both their melting points and liquid densities, for example, chromium, niobium, tantalum, titanium and aluminum.


Nanoscale ◽  
2020 ◽  
Vol 12 (26) ◽  
pp. 14135-14149
Author(s):  
Y. F. Zhao ◽  
X. B. Feng ◽  
J. Y. Zhang ◽  
Y. Lu ◽  
S. H. Wu ◽  
...  

Phase transformation strengthening and plasticity of nanostructured FeCoCrNi thin films can be tailored utilizing constraining effects. The transformation occurs only in FeCoCrNi/Ni nanolaminates with large h while not in FeCoCrNi/Ni.


2015 ◽  
Vol 2015 ◽  
pp. 1-6 ◽  
Author(s):  
Chun-Huei Tsau ◽  
Zhang-Yan Hwang ◽  
Swe-Kai Chen

The (Al, Cr, Ti)FeCoNi alloy thin films were deposited by PVD and using the equimolar targets with same compositions from the concept of high-entropy alloys. The thin films became metal oxide films after annealing at vacuum furnace for a period; and the resistivity of these thin films decreased sharply. After optimum annealing treatment, the lowest resistivity of the FeCoNiOx, CrFeCoNiOx, AlFeCoNiOx, and TiFeCoNiOxfilms was 22, 42, 18, and 35 μΩ-cm, respectively. This value is close to that of most of the metallic alloys. This phenomenon was caused by delaminating of the alloy oxide thin films because the oxidation was from the surfaces of the thin films. The low resistivity of these oxide films was contributed to the nonfully oxidized elements in the bottom layers and also vanishing of the defects during annealing.


2012 ◽  
Vol 18 (S2) ◽  
pp. 1920-1921 ◽  
Author(s):  
C. Gómez Esparza ◽  
I. Estrada Guel ◽  
W. Antunez Flores ◽  
E. Torres Moye ◽  
J. Herrera Ramírez ◽  
...  

Extended abstract of a paper presented at Microscopy and Microanalysis 2012 in Phoenix, Arizona, USA, July 29 – August 2, 2012.


2009 ◽  
Vol 15 (S3) ◽  
pp. 75-76 ◽  
Author(s):  
S. Simões ◽  
F. Viana ◽  
A. S. Ramos ◽  
M. T. Vieira ◽  
M. F. Vieira

AbstractSelf-propagating exothermic reactions are known to occur in multilayer films with alternating layers of a transition metal and a light element. The high velocity of these reactions, associated with high heat release rate, convert these systems in a unique heat source. The possibility of tailoring such a heat source to meet the needs of a particular process is very attractive to applications such as brazing or solid-state diffusion bonding. The solid state reactions occurring in Ni and Al multilayer thin films, produced by d.c. magnetron sputtering with bilayer thickness (period) of 5, 14 and 30 nm, were studied by differential scanning calorimetry (DSC). DSC results demonstrated that reaction temperature and heat released increase with the period of Ni/Al multilayer thin films.


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