Sub 50nm Critical Dimension Lithography Using Surface Plasmon Enhanced Illumination

2004 ◽  
Author(s):  
HARVARD MEDICAL SCHOOL BOSTON MA
Keyword(s):  
Surface Plasmon ◽  
Critical Dimension

scholarly journals Quantitative analysis and modeling of line edge roughness in near-field lithography: toward high pattern quality in nanofabrication

Nanophotonics ◽  
2019 ◽  
Vol 8 (5) ◽  
pp. 879-888 ◽  
Author(s):  
Dandan Han ◽  
Changhoon Park ◽  
Seonghyeon Oh ◽  
Howon Jung ◽  
Jae W. Hahn
Keyword(s):  
Quantitative Analysis ◽  
Surface Plasmon ◽  
Near Field ◽  
Critical Dimension ◽  
Aerial Image ◽  
Line Edge Roughness ◽  
Lateral Direction ◽  
Spherical Waves ◽  
Material Chemistry ◽  
Edge Roughness

AbstractQuantitative analysis of line edge roughness (LER) is very important for understanding the root causes of LER and thereby improving the pattern quality in near-field lithography (NFL), because LER has become the main limiter of critical dimension (CD) control as the feature size of nanostructures is scaled down. To address this challenge, the photoresist point-spread function of NFL with a contact plasmonic ridge nanoaperture can be employed to account for the physical and chemical effects involved in the LER-generation mechanism. Our theoretical and experimental results show that the sources of LER in NFL mainly come from the aerial image, material chemistry, and process. Importantly, the complicated decay characteristics of surface plasmon waves are demonstrated to be the main optical contributor. Because the evanescent mode of surface plasmon polaritons (SPPs) and quasi-spherical waves (QSWs) decay in the lateral direction, they can induce a small image log-slope and low photoresist contrast, leading to a large LER. We introduce an analytical model and demonstrate the relationship between LER and CD to estimate the pattern quality in NFL. We expect that these results can provide alternative approaches to further improve pattern uniformity and resolution, which can lead to advanced nanopatterning results in NFL.

Information capacity and bandwidth limitations in the SEM

1989 ◽  
Vol 47 ◽  
pp. 84-85
Author(s):  
D. C. Joy ◽  
R. D. Bunn
Keyword(s):  
Signal To Noise Ratio ◽  
Critical Dimension ◽  
Information Capacity ◽  
Acquisition Time ◽  
Signal To Noise ◽  
Sem Image ◽  
Probe Size ◽  
Minimum Number ◽  
Noise Ratio ◽  
Signal Channel

The information available from an SEM image is limited both by the inherent signal to noise ratio that characterizes the image and as a result of the transformations that it may undergo as it is passed through the amplifying circuits of the instrument. In applications such as Critical Dimension Metrology it is necessary to be able to quantify these limitations in order to be able to assess the likely precision of any measurement made with the microscope.The information capacity of an SEM signal, defined as the minimum number of bits needed to encode the output signal, depends on the signal to noise ratio of the image - which in turn depends on the probe size and source brightness and acquisition time per pixel - and on the efficiency of the specimen in producing the signal that is being observed. A detailed analysis of the secondary electron case shows that the information capacity C (bits/pixel) of the SEM signal channel could be written as :

Comparison of sensitivity of the refractometric methods of frustrated total internal reflection and surface plasmon resonance

2020 ◽  
pp. 44-49
Author(s):  
I. N. Pavlov
Keyword(s):  
Surface Plasmon Resonance ◽  
Surface Plasmon ◽  
Plasmon Resonance ◽  
Total Internal Reflection ◽  
Resonance Method ◽  
Internal Reflection ◽  
Optical Methods ◽  
Thin Boundary Layer ◽  
Experimental Conditions ◽  
Frustrated Total Internal Reflection

Two optical methods, namely surface plasmon resonance imaging and frustrated total internal reflection, are described in the paper in terms of comparing their sensitivity to change of refractive index of a thin boundary layer of an investigated medium. It is shown that, despite the fact that the theoretically calculated sensitivity is higher for the frustrated total internal reflection method, and the fact that usually in practice the surface plasmon resonance method, on the contrary, is considered more sensitive, under the same experimental conditions both methods show a similar result.

Conversion of surface plasmon polaritons into photons: visual observation

2011 ◽  
Vol 181 (3) ◽  
pp. 305 ◽  
Author(s):  
V.B. Zon ◽  
B.A. Zon ◽  
V.G. Klyuev ◽  
A.N. Latyshev ◽  
D.A. Minakov ◽  
...  
Keyword(s):  
Surface Plasmon ◽  
Surface Plasmon Polaritons ◽  
Visual Observation ◽  
Plasmon Polaritons

Surface Plasmon Resonance Based Sensitive Immunosensor for Benzaldehyde Detection

2010 ◽  
Vol 130 (7) ◽  
pp. 269-274 ◽  
Author(s):  
Takeshi Onodera ◽  
Takuzo Shimizu ◽  
Norio Miura ◽  
Kiyoshi Matsumoto ◽  
Kiyoshi Toko
Keyword(s):  
Surface Plasmon Resonance ◽  
Surface Plasmon ◽  
Plasmon Resonance

Surface Plasmon-Coupled Polarized Emission of N-Acetyl-L-Tryptophanamide

2004 ◽  
Author(s):  
Ignacy Gryczynski ◽  
Joanna Malicka ◽  
Joanna Lukomska ◽  
Zygmunt Gryczynski ◽  
Joseph R. Lakowicz
Keyword(s):  
Surface Plasmon ◽  
Polarized Emission
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