Proof of Principle Study of Thickness Measurements Using Characteristic X-Ray Line Ratio Techniques

1990 ◽  
Author(s):  
Kerry W. Habiger ◽  
Charles Stein
Keyword(s):  
Line Ratio ◽  
X Ray ◽  
Thickness Measurements ◽  
Proof Of Principle

Analysis of electroless nickel thin films

1991 ◽  
Vol 49 ◽  
pp. 510-511 ◽  
Author(s):  
C. W. Price ◽  
E. F. Lindsey
Keyword(s):  
Thin Films ◽  
Inertial Confinement Fusion ◽  
Electroless Nickel ◽  
Inertial Confinement ◽  
Plating Bath ◽  
X Ray ◽  
Nickel Thin Films ◽  
Nickel Deposits ◽  
Confinement Fusion ◽  
Thickness Measurements

Thickness measurements of thin films are performed by both energy-dispersive x-ray spectroscopy (EDS) and x-ray fluorescence (XRF). XRF can measure thicker films than EDS, and XRF measurements also have somewhat greater precision than EDS measurements. However, small components with curved or irregular shapes that are used for various applications in the the Inertial Confinement Fusion program at LLNL present geometrical problems that are not conducive to XRF analyses but may have only a minimal effect on EDS analyses. This work describes the development of an EDS technique to measure the thickness of electroless nickel deposits on gold substrates. Although elaborate correction techniques have been developed for thin-film measurements by x-ray analysis, the thickness of electroless nickel films can be dependent on the plating bath used. Therefore, standard calibration curves were established by correlating EDS data with thickness measurements that were obtained by contact profilometry.

X-RAY STUDIES RELATED TO COATING THICKNESS MEASUREMENTS

1984 ◽  
Vol 45 (C2) ◽  
pp. C2-33-C2-36 ◽  
Author(s):  
D. A. Sewell ◽  
I. D. Hall ◽  
G. Love ◽  
J. P. Partridge ◽  
V. D. Scott
Keyword(s):  
Coating Thickness ◽  
X Ray ◽  
Thickness Measurements

scholarly journals NON-EQUILIBRIUM MODELING OF THE FE XVII 3C/3D LINE RATIO IN AN INTENSE X-RAY FREE-ELECTRON LASER EXCITED PLASMA

2015 ◽  
Vol 801 (1) ◽  
pp. L13 ◽  
Author(s):  
S. D. Loch ◽  
C. P. Ballance ◽  
Y. Li ◽  
M. Fogle ◽  
C. J. Fontes
Keyword(s):  
Free Electron ◽  
Free Electron Laser ◽  
Line Ratio ◽  
Equilibrium Modeling ◽  
X Ray ◽  
Non Equilibrium

The Thickness Measurements of Thin Bulk Film By X-Ray Method

1991 ◽  
pp. 567-575 ◽  
Author(s):  
Y. Hirose ◽  
N. Takano ◽  
Y. Nanayama ◽  
T. Mura
Keyword(s):  
Ray Method ◽  
X Ray ◽  
Bulk Film ◽  
Thickness Measurements

Detection of a metallic glass layer by x-ray diffraction

1986 ◽  
Vol 1 (5) ◽  
pp. 629-634 ◽  
Author(s):  
J.W. McCamy ◽  
M.J. Godbole ◽  
A.J. Pedraza ◽  
D.H. Lowndes
Keyword(s):  
Target Material ◽  
Amorphous Layer ◽  
Glass Layer ◽  
X Rays ◽  
Average Thickness ◽  
X Ray Diffraction ◽  
Near Surface ◽  
X Ray ◽  
Integrated Intensity ◽  
Thickness Measurements

A simple, precise method for obtaining the average thickness of an amorphous layer formed by any surface treatment has been developed. The technique uses an x-ray diffractoeter to measure the reduction in the integrated intensity of several diffracted x-ray lines due to the near surface amorphous layer. The target material for generation of x rays is selected so that the emitted x rays are strongly absorbed by the specimen. This method permits thickness measurements down to ∼ 100 nm. It has been tested on a specimen of Fe80B20 on which an amorphous layer was produced by pulsed XeCl (308 nm) laser irradiation; the amorphous layer thickness was found to be 1.34 (∼0.1) um.

scholarly journals Mass Spectral Signatures of Complex Post-Translational Modifications in Proteins: A Proof-of-Principle Based on X-ray Irradiated Vancomycin

2020 ◽  
Vol 31 (8) ◽  
pp. 1738-1743
Author(s):  
Marwa Abdelmouleh ◽  
Mathieu Lalande ◽  
Johnny El Feghaly ◽  
Violaine Vizcaino ◽  
André Rebelo ◽  
...  
Keyword(s):  
Post Translational Modifications ◽  
X Ray ◽  
Mass Spectral ◽  
Spectral Signatures ◽  
Proof Of Principle
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