True Formation Resistivity Determination: Fast and Simple Process to Eliminate Polarization Horn Effect on Resistivity Measurements Using Azimuthal LWD Propagation Tool

2015 ◽  
Author(s):  
Hsu-Hsiang Wu ◽  
Yumei Tang
2021 ◽  
Author(s):  
Airat Mingazov ◽  
Andrey Zhidkov ◽  
Marat Nukhaev

Abstract Multidepth electromagnetic logging tool is considered as traditional measurements of formation resistivity estimation while drilling. When considering data in wells with high angles trajectory, more than 70 degrees, the resistivity measurements could be affected by several factors associated with geological conditions and logging tool specifications. As the result, during water saturation estimation formation properties could be distorted, which will lead to significant effect of reservoir properties assessment and the design of the horizontal well completion. Within the framework of this paper, various methods of influence on the resistivity readings will be considered, especially with cross boundary effects and reservoir formations with anisotropy. At the same time, propagation resistivity logging technologies while drilling with interpretation and boundary propagation technologies will be observed, which has tilted azimuthal oriented receivers for geosteering service of horizontal wells and additionally helps with take into account of boundary enflurane on standard resistivity logging.


2012 ◽  
Author(s):  
Michael Bittar ◽  
Hsu-Hsiang Wu ◽  
Shanjun Li ◽  
Mohammed Bayrakdar

Author(s):  
N. E. Paton ◽  
D. de Fontaine ◽  
J. C. Williams

The electron microscope has been used to study the diffusionless β → β + ω transformation occurring in certain titanium alloys at low temperatures. Evidence for such a transformation was obtained by Cometto et al by means of x-ray diffraction and resistivity measurements on a Ti-Nb alloy. The present work shows that this type of transformation can occur in several Ti alloys of suitable composition, and some of the details of the transformation are elucidated by means of direct observation in the electron microscope.Thin foils were examined in a Philips EM-300 electron microscope equipped with a uniaxial tilt, liquid nitrogen cooled, cold stage and a high resolution dark field device. Selected area electron diffraction was used to identify the phases present and the ω-phase was imaged in dark field by using a (101)ω reflection. Alloys were water quenched from 950°C, thinned, and mounted between copper grids to minimize temperature gradients in the foil.


Author(s):  
W. E. King

A side-entry type, helium-temperature specimen stage that has the capability of in-situ electrical-resistivity measurements has been designed and developed for use in the AEI-EM7 1200-kV electron microscope at Argonne National Laboratory. The electrical-resistivity measurements complement the high-voltage electron microscope (HVEM) to yield a unique opportunity to investigate defect production in metals by electron irradiation over a wide range of defect concentrations.A flow cryostat that uses helium gas as a coolant is employed to attain and maintain any specified temperature between 10 and 300 K. The helium gas coolant eliminates the vibrations that arise from boiling liquid helium and the temperature instabilities due to alternating heat-transfer mechanisms in the two-phase temperature regime (4.215 K). Figure 1 shows a schematic view of the liquid/gaseous helium transfer system. A liquid-gas mixture can be used for fast cooldown. The cold tip of the transfer tube is inserted coincident with the tilt axis of the specimen stage, and the end of the coolant flow tube is positioned without contact within the heat exchanger of the copper specimen block (Fig. 2).


2018 ◽  
Vol 1 (1) ◽  
pp. 21-25
Author(s):  
R Revathi ◽  
R Karunathan

Indium Telluride thin films were prepared by thermal evaporation technique. Films were annealed at 573K under vacuum for an hour. Both as-deposited and annealed films were used for characterization. The structural parameters were discussed on the basis of annealing effect for a film of thickness 1500 Å. Optical analysis was carried out on films of different thicknesses for both as - deposited and annealed samples. Both the as- deposited and annealed films exhibit direct and allowed transition. Electrical resistivity measurements were made in the temperature range of 303-473 K using Four-probe method. The calculated resistivity value is of the order of 10-6 ohm meter. The activation energy value decreases with increasing film thickness. The negative temperature coefficient indicates the semiconducting nature of the film.


Author(s):  
Michael Thiel ◽  
◽  
Michael Bower ◽  
Dzevat Omeragic ◽  

1967 ◽  
Vol 6 (47) ◽  
pp. 599-606 ◽  
Author(s):  
Hans Röthlisberger

A brief description of the resistivity method is given, stressing the points which are of particular importance when working on glaciers. The literature is briefly reviewed.


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