41.3: 5° SiOx Deposition Alignment: A Possible Solution for the Low Power LCDs Using Low-Frequency Applied Voltage Waveforms
2010 ◽
Vol 18
(3)
◽
pp. 206
◽
Keyword(s):
HEMTs for low-power and low-frequency noise 4.2 K cryoelectronics : fabrication and characterization
1998 ◽
Vol 08
(PR3)
◽
pp. Pr3-131-Pr3-134
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Keyword(s):
2019 ◽
Vol E102.C
(4)
◽
pp. 269-275
◽
2013 ◽
Vol 475-476
◽
pp. 1624-1628
2018 ◽
Vol 14
(2)
◽
pp. 266-274
◽
Keyword(s):
Keyword(s):
2019 ◽
Vol 9
(1)
◽
pp. 6687-6693
Keyword(s):