The Deposition, Fabrication and Characteristics of High Critical Temperature Devices
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ABSTRACTIn the first section of this paper the sputter deposition of thin films of YBa2Cu3O7−x is considered. In the second section low and high temperature heat treatments are discussed in the light of the thermodynamics of the material and in the third the development, fabrication and current-voltage (IV) characteristics of a variety of device structures are described, including the hysterctic characteristics of certain YBa2Cu3O7−x / YBa2Cu3O7−x devices that reveal Josephson supcrcurrcnt tunnelling.
2011 ◽
Vol 165
(2)
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pp. 250-255
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1998 ◽
Vol 78
(2)
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pp. 467-489
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2013 ◽
Vol 16
(4)
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2001 ◽
Vol 15
(05)
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pp. 511-526
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2003 ◽
Vol 17
(04n06)
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pp. 905-909
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1987 ◽
Vol 70
(10)
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pp. 2046-2054
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