The Relationship Between Emission Spectroscopy and Optical Properties of Amorphous Carbon Films
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ABSTRACTEmission from CH and H radicals was monitored during the deposition of amorphous carbon films in a capacitively coupled rf glow discharge. Both the spectral and spatial distributions of the emission were studied. The relative intensity of the CH and H emission was found to be sensitive to changes in discharge parameters. Preliminary results indicate a correlation between the ratios of the CH to H emission intensities and the optical properties of the deposited films.
1990 ◽
Vol 41
(5)
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pp. 545-548
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2002 ◽
Vol 16
(06n07)
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pp. 1096-1100
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1999 ◽
Vol 28
(1)
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pp. 226-230
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2001 ◽
Vol 10
(3-7)
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pp. 1132-1136
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1998 ◽
Vol 109
(1)
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pp. 23-28
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2019 ◽
Vol 25
(S2)
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pp. 1754-1755
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