A New Parameter Predicating Gm for Ultra Thin Nitrided Gate Oxide

2003 ◽  
Vol 765 ◽  
Author(s):  
Mitsuaki Hori ◽  
Naoyoshi Tamura ◽  
Masataka Kase ◽  
Hiroko Sakuma ◽  
Hiroyuki Ohota ◽  
...  
Keyword(s):  
Nitric Oxide ◽  
Photoelectron Spectroscopy ◽  
High Performance ◽  
Gate Dielectric ◽  
Gate Oxide ◽  
Cmos Technology ◽  
X Ray ◽  
Plasma Nitridation ◽  
Secondary Ions ◽  
Physical Thickness

AbstractWe propose a new parameter predicating transconductance (Gm) of the gate dielectric of nitrided SiO2 with the physical thickness below 1.1 nm for high-performance transistors. The 6 different type of nitrided SiO2 are formed using the plasma nitridation or nitric oxide (NO) gas annealing in conditions to adjust a optical thickness ranging 0.96 to 1.19 nm. The material property of nitrided SiO2 are analyzed by secondary ions mass spectroscopy (SIMS) and x-ray photoelectron spectroscopy (XPS). The MOSFET are fabricated using these gate dielectric and 90 nm generation CMOS technology. Then we find a good correlation between the maximum of Gm and the percentage of amount of N(SiN3)3 substructure at the total amount of NSi3 structure measured by XPS, rather than the total dose of nitrogen measured by SIMS.

Nitrogen (N2) Implantation to Suppress Growth of Interfacial Oxide in Mocvd Bst and Sputtered Bst Films

1999 ◽  
Vol 567 ◽  
Author(s):  
Renee Nieh ◽  
Wen-Jie Qi ◽  
Yongjoo Jeon ◽  
Byoung Hun Lee ◽  
Aaron Lucas ◽  
...  
Keyword(s):  
Photoelectron Spectroscopy ◽  
Interfacial Layer ◽  
Gate Dielectric ◽  
Nitrogen Concentration ◽  
Chemical Vapor ◽  
Future Generation ◽  
Oxide Thickness ◽  
Layer Growth ◽  
X Ray ◽  
Bst Films

ABSTRACTBa0.5Sr0.5TiO3 (BST) is one of the high-k candidates for replacing SiO2 as the gate dielectric in future generation devices. The biggest obstacle to scaling the equivalent oxide thickness (EOT) of BST is an interfacial layer, SixOy, which forms between BST and Si. Nitrogen (N2) implantation into the Si substrate has been proposed to reduce the growth of this interfacial layer. In this study, capacitors (Pt/BST/Si) were fabricated by depositing thin BST films (50Å) onto N2 implanted Si in order to evaluate the effects of implant dose and annealing conditions on EOT. It was found that N2 implantation reduced the EOT of RF magnetron sputtered and Metal Oxide Chemical Vapor Deposition (MOCVD) BST films by ∼20% and ∼33%, respectively. For sputtered BST, an implant dose of 1×1014cm−;2 provided sufficient nitrogen concentration without residual implant damage after annealing. X-ray photoelectron spectroscopy data confirmed that the reduction in EOT is due to a reduction in the interfacial layer growth. X-ray diffraction spectra revealed typical polycrystalline structure with (111) and (200) preferential orientations for both films. Leakage for these 50Å BST films is on the order of 10−8 to 10−5 A/cm2—lower than oxynitrides with comparable EOTs.

scholarly journals Novel Carbon Dots Derived from Glycyrrhizae Radix et Rhizoma and Their Anti-Gastric Ulcer Effect

Molecules ◽  
2021 ◽  
Vol 26 (6) ◽  
pp. 1512
Author(s):  
Yuhan Liu ◽  
Meiling Zhang ◽  
Jinjun Cheng ◽  
Yue Zhang ◽  
Hui Kong ◽  
...  
Keyword(s):  
Gastric Ulcer ◽  
Photoelectron Spectroscopy ◽  
Carbon Dots ◽  
High Performance ◽  
Raw264.7 Cells ◽  
Mice Model ◽  
X Ray ◽  
Glycyrrhizae Radix ◽  
Transmission Electron ◽  
High Resolution Tem

Glycyrrhizae Radix et Rhizoma (GRR) is one of the commonly used traditional Chinese medicines in clinical practice, which has been applied to treat digestive system diseases for hundreds of years. GRR is preferred for anti-gastric ulcer, however, the main active compounds are still unknown. In this study, GRR was used as precursor to synthesize carbon dots (CDs) by a environment-friendly one-step pyrolysis process. GRR-CDs were characterized by using transmission electron microscopy, high-resolution TEM, fourier transform infrared, ultraviolet-visible and fluorescence spectroscopy, X-ray photoelectron spectroscopy, X-ray diffraction and high-performance liquid chromatography. In addition, cellular toxicity of GRR-CDs was studied by using CCK-8 in RAW264.7 cells, and the anti-gastric ulcer activity was evaluated and confirmed using mice model of acute alcoholic gastric ulcer. The experiment confirmed that GRR-CDs were the spherical structure with a large number of active groups on the surface and their particle size ranged from 2 to 10 nm. GRR-CDs had no toxicity to RAW264.7 cells at concentration of 19.5 to 5000 μg/mL and could reduce the oxidative damage of gastric mucosa and tissues caused by alcohol, as demonstrated by restoring expression of malondialdehyde, superoxide dismutase and nitric oxide in serum and tissue of mice. The results indicated the explicit anti-ulcer activity of GRR-CDs, which provided a new insights for the research on effective material basis of GRR.

Interaction of nitric oxide with Ru(II) complexes of deuteroporphyrindimethylester derivatives

2009 ◽  
Vol 13 (01) ◽  
pp. 35-40 ◽  
Author(s):  
Rudy Martin ◽  
Roberto Cao ◽  
Ana M. Esteva ◽  
Franz-Peter Montforts
Keyword(s):  
Nitric Oxide ◽  
Photoelectron Spectroscopy ◽  
Gold Electrode ◽  
Charge Transfer Band ◽  
Bathochromic Shift ◽  
Considerable Change ◽  
Cathodic Peak ◽  
X Ray ◽  
Polycrystalline Gold ◽  
Self Assembled

A new ruthenium(II) porphyrin disulphide derivative, [ Ru ( Pds )( CO )], was obtained from ruthenium(II)(carbonyl)deuteroporphyrin(IX), [ Ru ( DPdc )( CO )] and cystamine. The interaction of this complex with nitric oxide was studied spectrophotometrically and a bathochromic shift of the charge transfer band and considerable change in the α and β bands of the complex were observed. According to the IR spectrum, the product of this interaction is [ Ru ( DmDP )( NO +)( NO 2-)]. [ Ru ( Pds )( CO )] was then self-assembled on polycrystalline gold and characterized by X-ray photoelectron spectroscopy. [ Ru ( Pds )( CO )] was also self-assembled on gold electrode beads and its interaction with nitric oxide in aqueous solution was studied by cyclic voltammetry. A shift in the ruthenium redox process and a new irreversible cathodic peak at -0.59 V were observed, both indicating coordination of NO .

Oxidation of Si(100) in nitric oxide at low pressures: An x-ray photoelectron spectroscopy study

1997 ◽  
Vol 70 (1) ◽  
pp. 63-65 ◽  
Author(s):  
A. Kamath ◽  
D. L. Kwong ◽  
Y. M. Sun ◽  
P. M. Blass ◽  
S. Whaley ◽  
...  
Keyword(s):  
Nitric Oxide ◽  
Photoelectron Spectroscopy ◽  
Spectroscopy Study ◽  
X Ray ◽  
Low Pressures

Use of anti-solvent to enhance thermoelectric response of hybrid-halide perovskite thin films

2022 ◽  
Author(s):  
Shrikant SAINI ◽  
Izuki Matsumoto ◽  
Sakura Kishishita ◽  
Ajay Kumar Baranwal ◽  
Tomohide Yabuki ◽  
...  
Keyword(s):  
Thin Films ◽  
Electrical Conductivity ◽  
Photoelectron Spectroscopy ◽  
High Performance ◽  
Cost Effective ◽  
Performance Tuning ◽  
Charge Carrier Density ◽  
X Ray ◽  
Thermoelectric Energy Harvesting ◽  
Halide Perovskite

Abstract Hybrid halide perovskite has been recently focused on thermoelectric energy harvesting due to the cost-effective fabrication approach and ultra-low thermal conductivity. To achieve high performance, tuning of electrical conductivity is a key parameter that is influenced by grain boundary scattering and charge carrier density. The fabrication process allows tuning these parameters. We report the use of anti-solvent to enhance the thermoelectric performance of lead-free hybrid halide perovskite, CH3NH3SnI3, thin films. Thin films with anti-solvent show higher connectivity in grains and higher Sn+4 oxidation states which results in enhancing the value of electrical conductivity. Thin films were prepared by a cost-effective wet process. Structural and chemical characterizations were performed using x-ray diffraction, scanning electron microscope, and x-ray photoelectron spectroscopy. The value of electrical conductivity and the Seebeck coefficient were measured near room temperature. The high value of power factor (1.55 µW/m.K2 at 320 K) was achieved for thin films treated with anti-solvent.

scholarly journals Towards chemically neutral carbon cleaning processes: plasma cleaning of Ni, Rh and Al reflective optical coatings and thin Al filters for free-electron lasers and synchrotron beamline applications

2018 ◽  
Vol 25 (6) ◽  
pp. 1642-1649 ◽  
Author(s):  
Harol Moreno Fernández ◽  
Marco Zangrando ◽  
Guillaume Sauthier ◽  
Alejandro R. Goñi ◽  
Vincent Carlino ◽  
...  
Keyword(s):  
Photoelectron Spectroscopy ◽  
Free Electron ◽  
Inductively Coupled Plasma ◽  
High Performance ◽  
Extreme Ultraviolet ◽  
Filter Material ◽  
Gas Mixture ◽  
Carbon Contamination ◽  
X Ray ◽  
Chemical Surface

The choice of a reflective optical coating or filter material has to be adapted to the intended field of application. This is mainly determined by the required photon energy range or by the required reflection angle. Among various materials, nickel and rhodium are common materials used as reflective coatings for (soft) X-ray mirrors. Similarly, aluminium is one of the most commonly used materials for extreme ultraviolet and soft X-ray transmission filters. However, both of these types of optics are subject to carbon contamination, which can be increasingly problematic for the operation of the high-performance free-electron laser and synchrotron beamlines. As an attempt to remove this type of contamination, an inductively coupled plasma source has been used in conjunction with N2/O2/H2 and N2/H2 feedstock gas plasmas. Results from the chemical surface analysis of the above materials before and after plasma treatment using X-ray photoelectron spectroscopy are reported. It is concluded that a favorable combination of an N2/H2 plasma feedstock gas mixture leads to the best chemical surface preservation of Ni, Rh and Al while removing the carbon contamination. However, this feedstock gas mixture does not remove C contamination as rapidly as, for example, an N2/O2/H2 plasma which induces the surface formation of NiO and NiOOH in Ni and RhOOH in Rh foils. As an applied case, the successful carbon removal from ultrathin Al filters previously used at the FERMI FEL1 using an N2/H2 plasma is demonstrated.

Carbon monoxide oxidation by nitric oxide on iridium (111) studied by x-ray and uv-photoelectron spectroscopy

1977 ◽  
Vol 1 (1) ◽  
pp. 25-32 ◽  
Author(s):  
P.A. Zhdan ◽  
G.K. Boreskov ◽  
A.I. Boronin ◽  
A.P. Schepelin ◽  
W.F. Egelhoff ◽  
...  
Keyword(s):  
Nitric Oxide ◽  
Carbon Monoxide ◽  
Photoelectron Spectroscopy ◽  
Carbon Monoxide Oxidation ◽  
X Ray ◽  
Uv Photoelectron Spectroscopy

scholarly journals Fabrication of Strontium Bismuth Oxides as Novel Battery-Type Electrode Materials for High-Performance Supercapacitors

2018 ◽  
Vol 2018 ◽  
pp. 1-10 ◽  
Author(s):  
Yinghui Han ◽  
Le Li ◽  
Yunpeng Liu ◽  
Xue Li ◽  
Xiaohan Qi ◽  
...  
Keyword(s):  
Photoelectron Spectroscopy ◽  
High Performance ◽  
Electrode Materials ◽  
Specific Capacity ◽  
Structural Features ◽  
High Electron ◽  
Strontium Content ◽  
X Ray ◽  
Bismuth Oxides ◽  
Improved Performance

A simple and efficient process method for the preparation of strontium bismuth oxides (SBOs) via an impregnation-calcination method is presented. The synthesized active materials are characterized using X-ray diffraction, scanning electron microscopy, and X-ray photoelectron spectroscopy. The electrochemical performance of the as-synthesized SBO samples is observed to decrease gradually as the strontium content is increased from 25% to 50%. The SBO sample with a Sr/Bi ratio of 1 : 3 shows the highest specific capacitance of 1228.7 F g−1 (specific capacity of 204.8 mAh g−1) at a current density of 1 A g−1 and a good cycling stability (75.1%) over 3000 charge-discharge cycles. The improved performance of the supercapacitors can be attributed to the unique structural features resulting from the addition of appropriate portions of Sr, which supports high electron conductivity and rapid ion/electron transport within the electrode and at the electrode/electrolyte interface. All the results show that the SBOs have considerable potential for use as high-performance battery-type electrodes in supercapacitors.

scholarly journals Photocatalytic degradation of deoxynivalenol over dendritic-like α-Fe2O3 under visible light irradiation

Toxins ◽  
2019 ◽  
Vol 11 (2) ◽  
pp. 105 ◽  
Author(s):  
Huiting Wang ◽  
Jin Mao ◽  
Zhaowei Zhang ◽  
Qi Zhang ◽  
Liangxiao Zhang ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Visible Light ◽  
Photocatalytic Degradation ◽  
Visible Light Irradiation ◽  
Photoelectron Spectroscopy ◽  
High Performance ◽  
Synthesis Method ◽  
Light Irradiation ◽  
Trichothecene Mycotoxin ◽  
X Ray

Deoxynivalenol (DON) is a secondary metabolite produced by Fusarium, which is a trichothecene mycotoxin. As the main mycotoxin with high toxicity, wheat, barley, corn and their products are susceptible to contamination of DON. Due to the stability of this mycotoxin, traditional methods for DON reduction often require a strong oxidant, high temperature and high pressure with more energy consumption. Therefore, exploring green, efficient and environmentally friendly ways to degrade or reduce DON is a meaningful and challenging issue. Herein, a dendritic-like α-Fe2O3 was successfully prepared using a facile hydrothermal synthesis method at 160 °C, which was systematically characterized by X-ray diffraction (XRD), high-resolution transmission electron microscopy (HRTEM), scanning electron microscopy (SEM), and X-ray photoelectron spectroscopy (XPS). It was found that dendritic-like α-Fe2O3 showed superior activity for the photocatalytic degradation of DON in aqueous solution under visible light irradiation (λ > 420 nm) and 90.3% DON (initial concentration of 4.0 μg/mL) could be reduced in 2 h. Most of all, the main possible intermediate products were proposed through high performance liquid chromatography-mass spectrometry (HPLC-MS) after the photocatalytic treatment. This work not only provides a green and promising way to mitigate mycotoxin contamination but also may present useful information for future studies.

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