Excimer Laser Applications: Polymer Etching and Metal Deposition

1986 ◽  
Vol 75 ◽  
Author(s):  
Michael Ritz ◽  
V. Srinivasan ◽  
S. V. Babu ◽  
Ramesh C. Patel
Keyword(s):  
Thin Films ◽  
Laser Radiation ◽  
Excimer Laser ◽  
Laser Pulses ◽  
Metal Deposition ◽  
Laser Applications ◽  
Preliminary Results ◽  
Copper Particles ◽  
Copper Formate ◽  
High Fluences

AbstractExcimer laser induced ablative decomposition of polyimide and poly(methylmethacrylate) at high fluences (> 1 J/cm2) is discussed. It is shown that 0.4 μm sized features can be imaged in polyimide using ArF laser pulses. Preliminary results from experiments in which copper particles (<1 μm in size) have been deposited by exposing thin films of a copper formate and glycerol paste to KrF laser radiation are presented.

Excimer Laser Interaction with Metals

1992 ◽  
Vol 285 ◽  
Author(s):  
W.W. Duley ◽  
G. Kinsman
Keyword(s):  
Experimental Data ◽  
Laser Radiation ◽  
Excimer Laser ◽  
Metal Surfaces ◽  
Laser Pulses ◽  
Radiative Properties ◽  
Uv Laser ◽  
Laser Interaction ◽  
Excimer Laser Radiation

ABSTRACTExcimer laser radiation may be used to process metal surfaces in a variety of novel ways. The simplest of these involves the use of UV laser pulses for ablation. Ablation occurs as the result of both vaporization and hydrodynamical effects. Experimental data related to these processes will be discussed. In addition, it will be shown how specific irradiation regimes can yield metal surfaces with unique radiative properties.

scholarly journals Nd:YAG fourth harmonic (266-nm) generation for corneal reshaping procedure: An ex-vivo experimental study

PLoS ONE ◽  
2021 ◽  
Vol 16 (11) ◽  
pp. e0260494
Author(s):  
Ibrahim Abdelhalim ◽  
Omnia Hamdy ◽  
Aziza Ahmed Hassan ◽  
Salah Hassab Elnaby
Keyword(s):  
Laser Radiation ◽  
Solid State ◽  
Excimer Laser ◽  
Ex Vivo ◽  
Laser Pulses ◽  
Medical Procedure ◽  
Corneal Tissue ◽  
Pulsed Lasers ◽  
Promising Alternative ◽  
193 Nm

Corneal reshaping is a common medical procedure utilized for the correction of different vision disorders relying on the ablation effect of the UV pulsed lasers, especially excimer lasers (ArF) at 193 nm. This wavelength is preferred in such medical procedures since laser radiation at 193 nm exhibits an optimum absorption by corneal tissue. However, it is also significantly absorbed by the water content of the cornea resulting in an unpredictability in the clinical results, as well as the high service and operation cost of the commercial ArF excimer laser device. Consequently, other types of solid-state UV pulsed lasers have been introduced. The present work investigates the ablation effect of solid-state laser at 266 nm in order to be utilized in corneal reshaping procedures. Different number of pulses has been applied to Polymethyl Methacrylate (PMMA) and ex-vivo rabbit cornea to evaluate the ablation effect of the produced laser radiation. PMMA target experienced ellipse-like ablated areas with a conical shape in the depth. The results revealed an almost constant ablation area regardless the number of laser pulses, which indicates the stability of the produced laser beam, whereas the ablation depth increases only with increasing the number of laser pulses. Examination of the ex-vivo cornea showed a significant tissue undulation, minimal thermal damage, and relatively smooth ablation surfaces. Accordingly, the obtained 266-nm laser specifications provide promising alternative to the traditional 193-nm excimer laser in corneal reshaping procedure.

UV Laser-Induced Metal Deposition on Semiconductors From Electroplating Solutions

1986 ◽  
Vol 75 ◽  
Author(s):  
Joseph Zahavi ◽  
Pehr E. Pehrsson
Keyword(s):  
Laser Radiation ◽  
Schottky Barrier ◽  
Excimer Laser ◽  
Pulse Energy ◽  
Metal Deposition ◽  
Uv Laser ◽  
Sample Characterization ◽  
Excimer Laser Radiation ◽  
193 Nm

AbstractWe have demonstrated metal deposition on semiconductors immersed in electroplating solution by exposure to UV laser radiation. N-type β-SiC and Si in gold or Pd/Ni electroplating solutions were exposed to 20 ns pulses of 193 nm or 248 nm excimer laser radiation. The energy per pulse was 20–100 mJ. Au and Pd/Ni metallizations deposited in lines and circles on SiC showed leaky Schottky barrier I-V characteristics. The thickness increased with increasing pulse energy or number. Both masked and maskless deposition were demonstrated without apparent damage to the substrate. Details of the process, potential mechanisms, and sample characterization are discussed.

193-NM Excimer Laser-Assisted Etching of Polysilicon

1986 ◽  
Vol 76 ◽  
Author(s):  
K. D. Armacost ◽  
S. V. Babu ◽  
S. V. Nguyen ◽  
J. F. Rembetski
Keyword(s):  
Surface Tension ◽  
Laser Radiation ◽  
Surface Temperature ◽  
Excimer Laser ◽  
Laser Heating ◽  
Temperature Gradients ◽  
High Fluences ◽  
Etch Rates ◽  
193 Nm

ABSTRACT193-nm excimer laser-assisted etching of polysilicon was studied in vacuum and in the presence of Ar, CF3 Br, CF2 Cl2, and NF3. In inert atmospheres (vacuum, Ar) exposure to the laser led to jagged profiles at high fluences (>350 mJ/(cm2-pulse)) resulting from surface temperature gradients. At lower fluences, a resolidified Si-SiO2 lump was formed by thermal and surface tension gradients induced by laser heating. In the presence of 193-nm radiation, CF3Br showed some propensity to etch polysilicon, while CF2Cl2 did not show any appreciable etching.Etch experiments were also performed in the presence of NF3 Maximum etch rates of 0.6 A/pulse were obtained for pressures greater than 500 torr and fluences exceeding 200 mJ/(cm2-pulse). An adsorptive etch mechanism is proposed, where NF3 molecules diffuse to the surface, adsorb and then react after absorbing laser radiation. Etching of micron profiles in polysilicon was also examined.

scholarly journals Nonlinear Optical Response of Reflective MXene Molybdenum Carbide Films as Saturable Absorbers

Nanomaterials ◽  
2020 ◽  
Vol 10 (12) ◽  
pp. 2391
Author(s):  
Jiang Wang ◽  
Yonggang Wang ◽  
Sicong Liu ◽  
Guangying Li ◽  
Guodong Zhang ◽  
...  
Keyword(s):  
Thin Films ◽  
Molybdenum Carbide ◽  
Modulation Depth ◽  
Pulsed Laser ◽  
Laser Pulses ◽  
Average Output ◽  
Laser Applications ◽  
Short Pulses ◽  
Saturable Absorbers ◽  
Silver Mirror

Molybdenum carbide (Mo2C) is a two-dimensional (2D) MXene material which makes it a promising photoelectric material. In this study, reflective type MXene Mo2C thin films were coated on a silver mirror by a magnetron sputtering method and were subsequently used in a passively Q-switched solid-state pulsed laser generator at the central wavelengths of 1.06 and 1.34 μm, respectively. The fabricated thin films of reflective type MXene Mo2C exhibited large modulation depth of 6.86% and 5.38% at the central wavelengths of 1064 and 1342 nm, respectively. By inserting the Mo2C saturable absorbers (SAs) into V-shaped Nd:YAG laser, short pulses were generated having a pulse duration, pulse energy, and average output power of 254 ns, 2.96 μJ, and 275 mW, respectively, at a wavelength of 1.06 μm. Similarly, shorter laser pulses were obtained in Nd:YVO4 laser at 1.34 μm. Our results illustrated potential of the 2D MXene Mo2C films for laser applications.

Permanent holographic recording in indium oxide thin films using 193 nm excimer laser radiation

1999 ◽  
Vol 69 (3) ◽  
pp. 333-336 ◽  
Author(s):  
S. Pissadakis ◽  
S. Mailis ◽  
L. Reekie ◽  
J.S. Wilkinson ◽  
R.W. Eason ◽  
...  
Keyword(s):  
Thin Films ◽  
Laser Radiation ◽  
Excimer Laser ◽  
Indium Oxide ◽  
Holographic Recording ◽  
Oxide Thin Films ◽  
Excimer Laser Radiation ◽  
193 Nm

Submicrometer resolution of contact printing by pulsed excimer laser radiation in thin films As2S3

1996 ◽  
Author(s):  
Lolita G. Rotkina ◽  
N. A. Kaliteevskaia ◽  
Ruben P. Seisyan ◽  
D. V. Smirnov ◽  
S. Babushkin ◽  
...  
Keyword(s):  
Thin Films ◽  
Laser Radiation ◽  
Excimer Laser ◽  
Contact Printing ◽  
Excimer Laser Radiation
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