Delamination of Poylmer Coatings from Metal Substrates: Submicroscopic and Molecular Aspects

2002 ◽  
Vol 734 ◽  
Author(s):  
M. Rohwerder ◽  
E. Hornung ◽  
Xing-Wen Yu

Delamination of organic coatings from metal surfaces can occur in a number of different ways, e.g. as pure cathodic delamination, as Filiform corrosion or a mixture of these. In fact, in most technical systems the pure cases are the exception and, of course, delamination is usually very slow. It has been shown that in fast delaminating systems the length scales may range between several 100 μm and several millimetres, while in systems which show slow delamination the reaction zones can be confined to submicroscopic distances [1]. This underlines the importance of investigation methods with submicroscopic resolution. As a very promising new technique Scanning Kelvin Probe Force Microscopy (SKPFM) was applied for the investigation of cathodic delamination and filiform corrosion on a submicroscopic scale [1, 2]. Indeed, these first investigations have shown that SKPFM gives basically the same information as the standard Scanning Kelvin Probe (SKP), but with a much improved resolution. It could be shown, for instance, that the extension of the reaction zone seems to be much narrower than would have to be assumed from the SKP measurements. Based on the knowledge about the different delamination types that was obtained from investigations with the standard SKP [3–12] the SKPFM should be the ideal tool to get information on the submicroscopic scale. However, SKPFM alone is not sufficient for revealing the underlying fundamental mechanisms; of even higher importance is the knowledge of the molecular and mesoscopic structure at the buried interface. In this paper a design for suitable model samples is proposed and first results are presented.

2011 ◽  
Vol 19 (1) ◽  
pp. 48-53 ◽  
Author(s):  
Bekir Salgin ◽  
Dirk Vogel ◽  
Diego Pontoni ◽  
Heiko Schröder ◽  
Bernd Schönberger ◽  
...  

A wide range of high-performance X-ray surface/interface characterization techniques are implemented nowadays at every synchrotron radiation source. However, these techniques are not always `non-destructive' because possible beam-induced electronic or structural changes may occur during X-ray irradiation. As these changes may be at least partially reversible, anin situtechnique is required for assessing their extent. Here the integration of a scanning Kelvin probe (SKP) set-up with a synchrotron hard X-ray interface scattering instrument for thein situdetection of work function variations resulting from X-ray irradiation is reported. First results, obtained on bare sapphire and sapphire covered by a room-temperature ionic liquid, are presented. In both cases a potential change was detected, which decayed and vanished after switching off the X-ray beam. This demonstrates the usefulness of a SKP forin situmonitoring of surface/interface potentials during X-ray materials characterization experiments.


Author(s):  
H.N. McMurray ◽  
A.J. Coleman ◽  
G. Williams ◽  
Andreas Afseth ◽  
G.M. Scamans

PhysChemComm ◽  
2001 ◽  
Vol 4 (6) ◽  
pp. 26 ◽  
Author(s):  
G. Williams ◽  
H. N. McMurray ◽  
D. Hayman ◽  
P. C. Morgan

2007 ◽  
Vol 154 (7) ◽  
pp. C339 ◽  
Author(s):  
H. N. McMurray ◽  
A. J. Coleman ◽  
G. Williams ◽  
A. Afseth ◽  
G. M. Scamans

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