Metal-Organic Chemical Vapour Deposition of II-VI Semiconductor Thin Films Using Single-Source Approach

2002 ◽  
Vol 730 ◽  
Author(s):  
Mohammad Afzaal ◽  
David Crouch ◽  
Paul O'Brien ◽  
Jin-Ho Park

AbstractThin films of CdS and CdSe have been deposited on glass substrates by low pressure metal-organic chemical vapour deposition (LP-MOCVD) using Cd[(EPiPr2)2N]2 (E = S, Se) as single-source precursors. These air-stable precursors are volatile, making them suitable for the deposition of thin films. As-deposited films were crystalline metal chalcogenides, as confirmed by X-ray powder diffraction (XRD), and their morphologies were studied by scanning electron microscopy (SEM).

2006 ◽  
Vol 16 (10) ◽  
pp. 966-969 ◽  
Author(s):  
Shivram S. Garje ◽  
Jamie S. Ritch ◽  
Dana J. Eisler ◽  
Mohammad Afzaal ◽  
Paul O'Brien ◽  
...  

2009 ◽  
Vol 7 (5) ◽  
pp. 929-932
Author(s):  
A. Mzerd ◽  
A. Aboulfarah ◽  
A. Arbaoui ◽  
N. Hassanain ◽  
M. Abd-Lefdil ◽  
...  

2000 ◽  
Vol 62 (2) ◽  
pp. 179-182 ◽  
Author(s):  
B Aboulfarah ◽  
A Mzerd ◽  
A Giani ◽  
A Boulouz ◽  
F Pascal-Delannoy ◽  
...  

2019 ◽  
Vol 683 ◽  
pp. 128-134 ◽  
Author(s):  
Adelaida Huerta-Barberà ◽  
Esther de Prado ◽  
Maria del Carmen Martínez-Tomás ◽  
Saïd Agouram ◽  
Elias Muñoz ◽  
...  

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