Reactive Cluster Epitaxy: CoSi2 Nanoparticles on (111) Si

2000 ◽  
Vol 619 ◽  
Author(s):  
C.G. Zimmermann ◽  
M. Yeadon ◽  
M. Kleinschmit ◽  
R.S. Averback ◽  
J.M. Gibson

ABSTRACTThe formation of epitaxial CoSi2 islands of nanoscopic dimensions is reported using the technique of reactive cluster deposition. Co clusters in the size range 5-50nm were synthesized by sputtering a high purity Co target inside a UHV sputtering chamber. The clusters were then deposited on the reconstructed Si (111) surface. Upon annealing the particles reacted with the Si substrate to form epitaxial CoSi2.Our observations were made using a JEOL 200CX transmission electron microscope modified for in-situ sputtering and ultrahigh vacuum conditions.

2006 ◽  
Vol 46 ◽  
pp. 111-119 ◽  
Author(s):  
Lih Juann Chen ◽  
Wen Wei Wu ◽  
C.H. Liu

In situ ultrahigh vacuum transmission electron microscope (TEM) is a powerful tool to investigate the dynamic changes of nanostructures on silicon. By observing growth and phase transitions in situ, understanding of their mechanisms can be used to model relevant processes. With the precise knowledge of the changes occurred on an atomic level, accurate control of the growth process can be achieved. The dynamical changes occurred on the nano scale are often unexpected, which also underscores the importance of the approach. In this presentation, we highlight two examples to demonstrate the unique capability of in situ TEM to study the dynamical changes. The examples include collective movement of Au nanoparticles and directed movement of Au-Si droplets on Si bi-crystal.


Author(s):  
M.L. McDonald ◽  
J.M. Gibson

Interest in ultrahigh vacuum (UHV) specimen environments in the transmission electron microscope (TEM) has grown considerably in recent years. The possibility of in-situ studies of atomically clean surfaces has been demonstrated by Yagi et.al., Wilson & Petroff & others. Most designs have involved a side entry specimen holder with cryopumping in the pole piece and are not easily compatible with ultrahigh resolution(UHR) due to size and stability requirements. We have designed a differentially pumped UHV specimen chamber for the JEOL 200CX (UHRTEM). It is intended to allow examination of clean thin specimens at pressures below 10-9 torr with a point to point resolution of 2.5 Å. Provisions for in-situ heating, cooling & deposition have been made. A unique part of this design is the relatively large volume sample chamber held at UHV (figsl&2). This design allows characterization of the atmosphere to which the sample is exposed & cleaning & preparation of samples out of the pole piece which is believed to be necessary for UHRTEM. Another possibility with this design is the transfer of a sample into the TEM from other chambers by use of a transfer case without exposing the sample to an atmosphere above 10-9 torr. Extra ports have been provided to accommodate future experiments.


2009 ◽  
Vol 15 (S2) ◽  
pp. 1220-1221
Author(s):  
LJ Chen ◽  
W-W Wu

Extended abstract of a paper presented at Microscopy and Microanalysis 2009 in Richmond, Virginia, USA, July 26 – July 30, 2009


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