Optical Properties Of Tantalum Oxide Films Deposited On BK7 Substrates By Excimer Laser Ablation

Thin amorphous films of tantalum oxide were grown on borosilicate crown glass substrates by KrF excimer pulsed laser ablation of a Ta2O5 target, in an oxygen environment. The deposition was performed at a temperature of 250 or 400 °C, while the oxygen pressure was set in the range 5 to 30 mTorr. The optical properties of the tantalum oxide coatings, as evaluated by reflectance/transmittance spectrophotometry, were found to be dependent on the oxygen gas pressure. At a pressure of 5 mTorr, absorbing films were obtained, with extinction coefficients above 10−2 (at λ=633 nm), along with an optical energy band-gap as low as 0.7 eV. At a pressure of 10 mTorr and above, the coatings had refractive indices up to 2.25 (at λ=633 nm), extinction coefficients below 10−4 (for λ>390 nm), and an optical energy band-gap in the range 3.9 to 4.0 eV.