TEM Characterization of Corrosion Products Formed on a Stainless Steel-Zirconium Alloy

1999 ◽  
Vol 608 ◽  
Author(s):  
J.S. Luo ◽  
D.P. Abraham
Keyword(s):  
Stainless Steel ◽  
Zirconium Alloy ◽  
Corrosion Products ◽  
Tem Characterization

TEM characterization of the artefacts induced by FIB in austenitic stainless steel

2010 ◽  
Vol 237 (3) ◽  
pp. 439-442 ◽  
Author(s):  
M. ANDRZEJCZUK ◽  
T. PŁOCIŃSKI ◽  
W. ZIELIŃSKI ◽  
K.J. KURZYDŁOWSKI
Keyword(s):  
Stainless Steel ◽  
Austenitic Stainless Steel ◽  
Tem Characterization

TEM characterization of proton-exchanged LiNbO3 optical waveguides

1986 ◽  
Vol 44 ◽  
pp. 480-481
Author(s):  
W. E. Lee
Keyword(s):  
Refractive Index ◽  
Benzoic Acid ◽  
Optical Waveguides ◽  
Total Internal Reflection ◽  
Index Of Refraction ◽  
Optical Measurements ◽  
Lithium Ions ◽  
Wide Channel ◽  
Tem Characterization

An optical waveguide consists of a several-micron wide channel with a slightly different index of refraction than the host substrate; light can be trapped in the channel by total internal reflection.Optical waveguides can be formed from single-crystal LiNbO3 using the proton exhange technique. In this technique, polished specimens are masked with polycrystal1ine chromium in such a way as to leave 3-13 μm wide channels. These are held in benzoic acid at 249°C for 5 minutes allowing protons to exchange for lithium ions within the channels causing an increase in the refractive index of the channel and creating the waveguide. Unfortunately, optical measurements often reveal a loss in waveguiding ability up to several weeks after exchange.

TEM characterization of WSix films

1994 ◽  
Vol 52 ◽  
pp. 848-849
Author(s):  
V. C. Kannan ◽  
S. M. Merchant ◽  
R. B. Irwin ◽  
A. K. Nanda ◽  
M. Sundahl ◽  
...  
Keyword(s):  
Integrated Circuits ◽  
Vapor Deposition ◽  
High Purity ◽  
Physical Vapor Deposition ◽  
Thermal Treatments ◽  
Rapid Thermal Anneal ◽  
Tungsten Silicide ◽  
Tem Characterization ◽  
Metal Silicides

Metal silicides such as WSi2, MoSi2, TiSi2, TaSi2 and CoSi2 have received wide attention in recent years for semiconductor applications in integrated circuits. In this study, we describe the microstructures of WSix films deposited on SiO2 (oxide) and polysilicon (poly) surfaces on Si wafers afterdeposition and rapid thermal anneal (RTA) at several temperatures. The stoichiometry of WSix films was confirmed by Rutherford Backscattering Spectroscopy (RBS). A correlation between the observed microstructure and measured sheet resistance of the films was also obtained.WSix films were deposited by physical vapor deposition (PVD) using magnetron sputteringin a Varian 3180. A high purity tungsten silicide target with a Si:W ratio of 2.85 was used. Films deposited on oxide or poly substrates gave rise to a Si:W ratio of 2.65 as observed by RBS. To simulatethe thermal treatments of subsequent processing procedures, wafers with tungsten silicide films were subjected to RTA (AG Associates Heatpulse 4108) in a N2 ambient for 60 seconds at temperatures ranging from 700° to 1000°C.

New horizons for the structural characterization of stainless steel slags by X-ray powder diffraction

2007 ◽  
Vol 2007 (suppl_26) ◽  
pp. 61-66 ◽  
Author(s):  
B. Peplinski ◽  
B. Adamczyk ◽  
G. Kley ◽  
K. Adam ◽  
F. Emmerling ◽  
...  
Keyword(s):  
Stainless Steel ◽  
Powder Diffraction ◽  
Structural Characterization ◽  
X Ray ◽  
New Horizons

Characterization of Hot-Steam Oxidation Tested Chromosiliconized Heat-Resistant Austenitic Stainless Steel

2012 ◽  
Vol 53 (6) ◽  
pp. 1090-1093 ◽  
Author(s):  
Yasuhiro Hoshiyama ◽  
Xiaoying Li ◽  
Hanshan Dong ◽  
Akio Nishimoto
Keyword(s):  
Stainless Steel ◽  
Austenitic Stainless Steel ◽  
Steam Oxidation ◽  
Heat Resistant
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