Reactive Sputtering Deposition of Titanium Oxide Films By Means of An RF Triode Sputtering Source

1985 ◽  
Vol 60 ◽  
Author(s):  
Toru Yamashita ◽  
J. W. Robinson ◽  
H. Yamauchi
Keyword(s):  
Thin Films ◽  
Phase Diagram ◽  
Surface Layer ◽  
Titanium Oxide ◽  
Deposition Rate ◽  
Oxide Films ◽  
Reactive Sputtering ◽  
Sputtering Deposition ◽  
Xps Study ◽  
Titanium Oxide Films

AbstractTiOx thin films were fabricated by means of a reactive sputtering technique in an rf triode sputtering-deposition unit. The deposition rate was studied in detail. A ‘phase diagram’ of TiOx was determined. XPS study showed the formation of a Ti02 surface layer on TiOx thin films. Oxygen was removed by the Ar+ bombardment on Ti02 to yield Ti203.

Preparation of Rare-Earth Element Doped Titanium Oxide Thin Films and Photocatalysis Properties

2007 ◽  
Vol 336-338 ◽  
pp. 1946-1948 ◽  
Author(s):  
X.L. Jia ◽  
Y. Wang ◽  
R.S. Xin ◽  
Quan Li Jia ◽  
Hai Jun Zhang
Keyword(s):  
Thin Films ◽  
Rare Earth ◽  
Titanium Oxide ◽  
Rare Earth Element ◽  
Earth Element ◽  
Sol Gel ◽  
Oxide Films ◽  
Nanocrystalline Tio2 ◽  
Preparation Conditions ◽  
Titanium Oxide Films

Rare-earth doped porous nanocrystalline TiO2 films were prepared via sol-gel method. The effect of preparation conditions on the properties of the resulting thin films, such as structure, surface topography and photocatalysis properties was analyzed. It indicated that appropriate doping of rare-earth element improves the photocatalysis ability of the thin titanium oxide films. The thin titanium oxide films have good photocatalysis properties in visible light region because of the red shift of energy level. It also revealed that uni-doped of cobalt is better than that of cobalt and lanthanum, while co-doping of cerium, cobalt and lanthanum may cause the best photocatalysis properties.

Formation of Transparent Nanoporous Titanium Oxide Films on Glass Substrates Using an Anodization Process

2012 ◽  
Vol 16 ◽  
pp. 113-118 ◽  
Author(s):  
Elena Manea ◽  
Cosmin Obreja ◽  
Munizer Purica ◽  
Adrian Dinescu ◽  
Florin Comanescu ◽  
...  
Keyword(s):  
Thin Films ◽  
Titanium Oxide ◽  
Glass Substrate ◽  
Anatase Phase ◽  
Oxide Films ◽  
Nanoporous Structure ◽  
Tio2 Thin Films ◽  
Glass Substrates ◽  
Anodization Process ◽  
Titanium Oxide Films

We report on an experimental study on transparent nanoporous titanium oxide films on glass substrates using an anodization process. Ti thin films of 50-90 nm have been deposited on glass substrate by dc sputtering (1.8210-3 Pa, 100 W) followed by a thermal treatment of 500°C for 30 min. in order to improve the adhesion to the glass substrate. Then an anodization process was applied in order to obtain TiO2 thin nanoporous layers using a cell consisted of three electrodes and aqueous electrolyte solution of 1% NH4F concentration, monoethyleneglycol and DI water. After anodization the samples were annealed at 450°C for 45 min using nitrogen gas. The layers have a nanoporous structure with pore dimensions in the range of 50-80 nm. FTIR and micro-Raman spectroscopy were used to identify the crystalline phase of the TiO2 layers. Raman scattering spectra clearly identify the anatase phase on the basis of Eg modes at ~ 146 cm-1 of the TiO2. The FTIR spectrum showed only the peak at 614 cm−1 which can be associated with the characteristic vibrational mode of TiO2 anatase. The optical properties of TiO2 thin films have been determined by ellipsometric measurements in the spectral range (0.2-0.8 μm) and a value of 2.41-2.45 was obtain for refractive index at 632 nm. Spectrophotometric measurements showed a transmittance over 70% and an optical band gap of 3.3-3.5 eV was determined.

Microcrystal Structures in Titanium Oxide Films Produced by Pulsed UV-Laser Irradiation

2001 ◽  
Vol 40 (Part 2, No. 10A) ◽  
pp. L1054-L1057 ◽  
Author(s):  
Yo Ichikawa ◽  
Kentaro Setsune ◽  
Syun-ichiro Kawashima ◽  
Koichi Kugimiya
Keyword(s):  
Laser Irradiation ◽  
Titanium Oxide ◽  
Oxide Films ◽  
Uv Laser ◽  
Titanium Oxide Films

Surface characterization of titanium oxide films synthesized by ion beam enhanced deposition

1997 ◽  
Vol 310 (1-2) ◽  
pp. 29-33 ◽  
Author(s):  
Feng Zhang ◽  
S. Jin ◽  
Yingjun Mao ◽  
Zhihong Zheng ◽  
Yu Chen ◽  
...  
Keyword(s):  
Titanium Oxide ◽  
Surface Characterization ◽  
Ion Beam ◽  
Oxide Films ◽  
Titanium Oxide Films
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