Two- and three-Dimensional Refractive Index Lattices Formed by Laterally Patterned Porous Silicon Layers
Keyword(s):
N Doping
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AbstractPorous silicon was used to fabricate refractive index lattices. Patterned n-doping and/ or substrate etching were used to introduce lateral periodicity. By anodizing p-type substrate with an n-doped area, we realized large refractive index contrast two-dimensional lattices with underlying cladding layer. The anodization process showed an effect specific to the small dimensional patterning and this effect has significant influence on the formed refractive index structure.
Keyword(s):
2020 ◽
Vol 34
(32)
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pp. 2050250
Keyword(s):
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2009 ◽
Vol 6
(7)
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pp. 1721-1724
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2006 ◽
Vol E89-C
(9)
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pp. 1276-1282
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2003 ◽
Vol 67-68
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pp. 670-675
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