A Unified Treatment of The Thermal Donor Hierarchies in Silicon and Germanium
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ABSTRACTThe hierarchies of thermal donor binding energies produced by annealing oxygen-containing silicon or germanium at ca. 450°C are explained by using a generalized perturbation model which involves a standard repulsion parameter for the interaction between agglomerating oxygen atoms and the shallow donor electrons. This model is capable of fitting the ground state ladders for both charge states of the thermal donors in both Si and Ge, since differences between the two ladders can–ee explained entirely by the change in the electron-effective-mass and dielectric constant of the host.
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2012 ◽
Vol 15
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pp. 211-218
2010 ◽
Vol 162
(1-2)
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pp. 34-39
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1990 ◽
Vol 5
(11)
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pp. 1136-1137
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2011 ◽
Vol 406
(11)
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pp. 2116-2120
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