Deformation-Induced Dislocations in 4H-SiC and GaN

1999 ◽  
Vol 572 ◽  
Author(s):  
M. H. Hong ◽  
A. V. Samant ◽  
V. Orlov ◽  
B. Farber ◽  
C. Kisielowski ◽  
...  

ABSTRACTBulk single crystals of 4H-SiC have been deformed in compression in the temperature range 550–1300°C, whereas a GaN thin film grown on a (0001) sapphire substrate was deformed by Vickers indentation in the temperature range 25–800°C. The TEM observations of the deformed crystals indicate that deformation-induced dislocations in 4H-SiC all lie on the (0001) basal plane but depending on the deformation temperature, are one of two types. The dislocations induced by deformation at temperatures above ∼1 100°C are complete, with a Burgers vector, b, of but are all dissociated into two partials bounding a ribbon of stacking fault. On the other 3 hand, the dislocations induced by deformation in the temperature range 550<T<∼ 1100°C were predominantly single leading partials each dragging a stacking fault behind them. From the width of dissociated dislocations in the high-temperature deformed crystals, the stacking fault energy of 4H-SiC has been estimated to be 14.7±2.5 mJ/m2. Vickers indentations of the [0001]-oriented GaN film produced a dense array of dislocations along the three 〈1120〉 directions at all temperatures. The dislocations were slightly curved with their curvature increasing as the deformation temperature increased. Most of these dislocations were found to have a screw nature with their b parallel to 〈1120〉. Also, within the resolution of the weak-beam method, they were not found to be dissociated. Tilting experiment show that these dislocations lie on the {1100} prism plane rather than the easier (0001) glide plane.

1999 ◽  
Vol 5 (S2) ◽  
pp. 736-737
Author(s):  
Zhigang Mao ◽  
Stuart McKeraan ◽  
C. Barry Carter ◽  
Wei Yang ◽  
Scott A. McPherson

The possible dislocations and slip systems in the wurtzite structure are the same as in hcp structure [1]. The Burgers vectors of these dislocations are . The dislocations can lie on either the (0001) basal plane or prism planes. The dislocations lie on pyramidal planes. TEM studies have revealed that there are predominately three types of dislocations in a wurtzite GaN epilayer which has not been grown by selective overgrowth (e. g. [2, 3]). The majority of the dislocations are threading dislocations with Burgers vector which appear randomly in the epilayer, they result from the growth errors during the growth process. The other two types of dislocation are halflpops with a [0001] or Burgers vector. The [0001] dislocation half-loop lies on the prism plane and the dislocation half-loop lies on the (0001) basal plane which usually appears near the epilayer/substrate interface.


1990 ◽  
Vol 213 ◽  
Author(s):  
M. Yoshida ◽  
T. Takasugi

ABSTRACTB2-type CoTi single crystals which exhibit the yield strength anomaly were deformed at various temperatures and on various compression axis in order to investigate the deformation microstructures. The morphological feature and Burgers vectors of the activated dislocations were investigated by means of transmission electron microscopy. At a low temperature of 300 K, relatively straight dislocations with the <001>-type Burgers vector were observed. They consisted of the mixed components of edge and screw, and strongly tended to form the dipoles. At a temperature of 773 K where the yield stress increases with increasing temperature, the screw components of dislocations with a <001>-type Burgers vector were dominant and showed peculiar morphology revealing the pinning or cross slip. However, the examination using the weak-beam method could not show the evidence of any dissociation. At a high temperature of 973 K above the peak temperature, the Burgers vectors of activated dislocations were determined to be a <001>- type for compressive orientation axes close to [111] and [011] whereas a <110>-type for orientation axis close to [001]. These dislocation microstructures were discussed in correlation with the yield strength anomaly observed in these intermetallics.


2000 ◽  
Vol 622 ◽  
Author(s):  
M. H. Hong ◽  
P. Pirouz ◽  
P. M. Tavernier ◽  
D. R. Clarke

ABSTRACTVickers hardness tests on {0001} and (1120) faces of a relatively thick GaN film grown on a (0001) sapphire substrate have been performed in the temperature range 25-1200°C. The microstructure of the plastic zone around the indentation sites has been investigated by transmission electron microscopy (TEM). At room temperature, the hardness was measured to be 12.3 GPa on the basal plane, and 11.1 GPa on the prism plane. The hardness decreases gradually with increasing temperature up to ∼800°C and then shows a plateau between ∼800 and ∼1050°C after which it decreases again above ∼1100°C. In contrast to the rather straight dislocations produced by room-temperature indentation of the (0001) face, the dislocations generated by indenting the (1120) face at room temperature were curved and in the shape of half-loops emanating from the indentation sites on the prism planes. Such dislocations were not dissociated within the resolution of weak-beam TEM.


The weak-beam method of electron microscopy (Cockayne, Ray & Whelan 1969, 1970) has been used to investigate the dissociation of dislocations in silicon. Total dislocations with a/2<110> Burgers vectors were found to be dissociated into Shockley partial dislocations, with a separation of 7.5 +0.6 nm (75 + 6 Å) for the pure edge orientation and 4.1 +0.6 nm (41+ 6 Å) for the pure screw orientation. The intrinsic stacking-fault energy, calculated from the measured dissociation width using anisotropic elasticity theory, is 51 + 5 mJ m -2 (51 + 5 erg cm -2 ). The method has also been used to image partial dislocations at threefold dislocation nodes in silicon. All nodes in the specimens examined were found to be extended, and of about the same size, indicating that the intrinsic and extrinsic stacking-fault energies are comparable. Measurements of the radii of curvature of partial dislocations at the nodes gave a value of 50+15 mJ m -2 (50+15 erg cm -2 ) for the intrinsic stacking fault energy, using the method of Whelan (1959) as modified by Brown & Thölén (1964). Dislocations in silicon specimens annealed at a high temperature were found to be constricted along segments of the dislocation line. Evidence is presented which suggests that the constricted segments have climbed out of the slip plane.


1984 ◽  
Vol 48 (5) ◽  
pp. 455-460
Author(s):  
Kun-ichi Miyazawa ◽  
Du-bin Cheng ◽  
Hideo Saito ◽  
Minoru Mori ◽  
Yoichi Ishida

Weak-beam electron microscopy has been applied to study the dissociation of dislocations in a type II a diamond. Dislocations with Burgers vector ½[11̅0] on (111) glide planes have been found to be dissociated into two Shockley partials, with separations between 2.5 and 4.3 nm, and extended nodes and dissociated dipoles have also been observed. The stacking fault energy has been determined from the mean and distribution of the separ­ations of the partials to be 279 ± 41 mJ m -2 . The behaviour of dislocations in diamond appears to be similar to that of dislocations in Ge and Si.


Author(s):  
K. Z. Botros ◽  
S. S. Sheinin

The main features of weak beam images of dislocations were first described by Cockayne et al. using calculations of intensity profiles based on the kinematical and two beam dynamical theories. The feature of weak beam images which is of particular interest in this investigation is that intensity profiles exhibit a sharp peak located at a position very close to the position of the dislocation in the crystal. This property of weak beam images of dislocations has an important application in the determination of stacking fault energy of crystals. This can easily be done since the separation of the partial dislocations bounding a stacking fault ribbon can be measured with high precision, assuming of course that the weak beam relationship between the positions of the image and the dislocation is valid. In order to carry out measurements such as these in practice the specimen must be tilted to "good" weak beam diffraction conditions, which implies utilizing high values of the deviation parameter Sg.


Author(s):  
J.A. Lambert ◽  
P.S. Dobson

The defect structure of ion-implanted silicon, which has been annealed in the temperature range 800°C-1100°C, consists of extrinsic Frank faulted loops and perfect dislocation loops, together with‘rod like’ defects elongated along <110> directions. Various structures have been suggested for the elongated defects and it was argued that an extrinsically faulted Frank loop could undergo partial shear to yield an intrinsically faulted defect having a Burgers vector of 1/6 <411>.This defect has been observed in boron implanted silicon (1015 B+ cm-2 40KeV) and a detailed contrast analysis has confirmed the proposed structure.


Author(s):  
Y. Ishida ◽  
H. Ishida ◽  
K. Kohra ◽  
H. Ichinose

IntroductionA simple and accurate technique to determine the Burgers vector of a dislocation has become feasible with the advent of HVEM. The conventional image vanishing technique(1) using Bragg conditions with the diffraction vector perpendicular to the Burgers vector suffers from various drawbacks; The dislocation image appears even when the g.b = 0 criterion is satisfied, if the edge component of the dislocation is large. On the other hand, the image disappears for certain high order diffractions even when g.b ≠ 0. Furthermore, the determination of the magnitude of the Burgers vector is not easy with the criterion. Recent image simulation technique is free from the ambiguities but require too many parameters for the computation. The weak-beam “fringe counting” technique investigated in the present study is immune from the problems. Even the magnitude of the Burgers vector is determined from the number of the terminating thickness fringes at the exit of the dislocation in wedge shaped foil surfaces.


2000 ◽  
Vol 5 (S1) ◽  
pp. 97-103
Author(s):  
Kathleen A. Dunn ◽  
Susan E. Babcock ◽  
Donald S. Stone ◽  
Richard J. Matyi ◽  
Ling Zhang ◽  
...  

Diffraction-contrast TEM, focused probe electron diffraction, and high-resolution X-ray diffraction were used to characterize the dislocation arrangements in a 16µm thick coalesced GaN film grown by MOVPE LEO. As is commonly observed, the threading dislocations that are duplicated from the template above the window bend toward (0001). At the coalescence plane they bend back to lie along [0001] and thread to the surface. In addition, three other sets of dislocations were observed. The first set consists of a wall of parallel dislocations lying in the coalescence plane and nearly parallel to the substrate, with Burgers vector (b) in the (0001) plane. The second set is comprised of rectangular loops with b = 1/3 [110] (perpendicular to the coalescence boundary) which originate in the coalescence boundary and extend laterally into the film on the (100). The third set of dislocations threads laterally through the film along the [100] bar axis with 1/3<110>-type Burgers vectors These sets result in a dislocation density of ∼109 cm−2. High resolution X-ray reciprocal space maps indicate wing tilt of ∼0.5º.


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