Ab-Initio Pseudopotential Calculations of Boron Diffusion in Silicon
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ABSTRACTIn this work we investigate boron diffusion as a function of the Fermi-level position in crystalline silicon using ab-initio calculations and the nudged elastic band method to optimize diffusion paths. Based on our results, a new mechanism for B diffusion mediated by Si self-interstitials is proposed. We find a two-step diffusion process for all Fermi-level positions, which suggests a kick-out with a directly following kick-in process without extensive B diffusion on interstitial sites in-between. Our activation energy of 3.47 – 3.75 eV and diffusion-length exponent of -0.55 to -0.18 eV are in excellent agreement with experiment.
2016 ◽
Vol 2016
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pp. 1-9
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2006 ◽
Vol 18
(7)
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pp. 775-780
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2011 ◽
Vol 172-174
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pp. 1022-1027
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