Preparation And Characterization Of Carbon Nitride Thin Films By Electron Cyclotron Resonance (Ecr) Sputtering Method

1998 ◽  
Vol 555 ◽  
Author(s):  
Yoshifumi Aoi ◽  
Youji Tani ◽  
Masaaki Hisa ◽  
Eiji Kamijo
Keyword(s):  
Substrate Temperature ◽  
Photoelectron Spectroscopy ◽  
Cyclotron Resonance ◽  
Carbon Nitride ◽  
Electron Cyclotron Resonance ◽  
Electron Cyclotron ◽  
X Ray ◽  
Ecr Plasma ◽  
Plasma Sputtering ◽  
Gas Atmosphere

AbstractCrystalline carbon nitride films were deposited by electron cyclotron resonance (ECR) plasma sputtering method using a carbon target and a nitrogen gas atmosphere. The deposited films were characterized by X-ray photoelectron spectroscopy (XPS), Raman spectroscopy, and X-ray diffraction (XRD). Nitrogen content of the deposited film was varied with substrate selfbias potential and substrate temperature. Bonding states of nitrogen and carbon in the deposited filns were different according to the substrate temperature, sp3 C-N bonds were observed for the film deposited at 600 °C. Crystallization of carbon nitride thin film was observed hen the deposition was carried out an elevated substrate temperature.

High-Resolution Soft X-Ray Emission Spectra of Crystalline Carbon Nitride Films Deposited by Electron Cyclotron Resonance Sputtering

1999 ◽  
Vol 38 (Part 1, No. 9A) ◽  
pp. 5143-5147 ◽  
Author(s):  
Yasuji Muramatsu ◽  
Youji Tani ◽  
Yoshifumi Aoi ◽  
Eiji Kamijo ◽  
Takahiro Kaneyoshi ◽  
...  
Keyword(s):  
High Resolution ◽  
Cyclotron Resonance ◽  
Carbon Nitride ◽  
Electron Cyclotron Resonance ◽  
Emission Spectra ◽  
Electron Cyclotron ◽  
X Ray

Surface precipitates on single crystal LiNbO3 after dry-etching by CHF3 plasma

1998 ◽  
Vol 13 (3) ◽  
pp. 527-529 ◽  
Author(s):  
Kaori Shima ◽  
Naoki Mitsugi ◽  
Hirotoshi Nagata
Keyword(s):  
Photoelectron Spectroscopy ◽  
Cyclotron Resonance ◽  
Auger Electron ◽  
Electron Cyclotron Resonance ◽  
Machining Process ◽  
Optical Modulators ◽  
X Ray ◽  
Ecr Plasma ◽  
Etched Surface ◽  
Dry Etch

The CHF3 electron cyclotron resonance (ECR) plasma etched LiNbO3 (LN) surface was analyzed chemically and crystallographically to investigate the dry-etch machining process for LN crystal, which was recently needed to obtain broader-band optical modulators. The etched surface was entirely covered with amorphous-like precipitates having ~70 nm diameter. These precipitates (or a part of them) were thought to be LiF from Auger electron and x-ray photoelectron spectroscopy. The results indicated that the LiF was formed and remained on the etched surface while the Nb was almost completely removed.

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