Mechanisms and Kinetics of Electrochemical Intercalation of Oxygen into Nd2NiO4+δ

1998 ◽  
Vol 548 ◽  
Author(s):  
H. Fritze ◽  
H. L. Tuller ◽  
J. Berthold ◽  
B. Schultrich
Keyword(s):  
Quartz Crystal ◽  
Transport Model ◽  
Compositional Analysis ◽  
Mass Change ◽  
Oxygen Stoichiometry ◽  
Excess Oxygen ◽  
Cyclic Voltammograms ◽  
Electrochemical Intercalation ◽  
Kinetics Of

ABSTRACTOverstoichiometric insertion of oxygen into thin films of Nd2NiO4+δwas performed electrochemically at room temperature (RT) in order to obtain an in-situ compositional analysis of the process. Thin Nd2NiO4+δlayers were deposited onto resonators of a Quartz Crystal Microbalance (QCM) by Pulsed Laser Deposition (PLD). Cyclic voltammograms showed oxidation and reduction peaks typical for these oxides. The change in oxygen stoichiometry was determined by in-situ QCM measurements during potential step experiments. The resulting maximum mass change was on the order of 50 ng and corresponded to a maximum excess oxygen content of δ = 0.12 in Nd2NiO4+δ. The time dependence of the mass change was described by a transport model which leads to oxygen diffusion coefficients in the range from 2.10−12 to 10−11 cm2/s depending on δ and the direction of the reaction.

In situ high temperature X-ray diffraction study of the kinetics of phase separation in the uranium-plutonium mixed oxide (U0.55Pu0.45)O2-x

2014 ◽  
Vol 1645 ◽  
Author(s):  
Romain VAUCHY ◽  
Renaud.C. BELIN ◽  
Anne-Charlotte ROBISSON ◽  
Fiqiri HODAJ
Keyword(s):  
Phase Separation ◽  
Room Temperature ◽  
Mixed Oxides ◽  
Oxygen Stoichiometry ◽  
X Ray Diffraction ◽  
Fundamental Interest ◽  
X Ray ◽  
Uranium Plutonium ◽  
Kinetics Of

ABSTRACTUranium-plutonium mixed oxides incorporating high amounts of plutonium are considered for future nuclear reactors. For plutonium content higher than 20%, a phase separation occurs, depending on the temperature and on the oxygen stoichiometry. This phase separation phenomenon is still not precisely described, especially at high plutonium content. Here, using an original in situ fast X-ray diffraction device dedicated to radioactive materials, we evidenced a phase separation occurring during rapid cooling from 1773 K to room temperature at the rate of 0.05 and 2 K per second for a (U0.55Pu0.45)O2-x compound under a reducing atmosphere. The results show that the cooling rate does not impact the lattice parameters of the obtained phases at room temperature but their fraction. In addition to their obvious fundamental interest, these results are of utmost importance in the prospect of using uranium-plutonium mixed oxides with high plutonium content as nuclear fuels.

scholarly journals Studying the effects of bismuth on the electrochemical properties of lead dioxide layers by using the in situ EQCM technique

2020 ◽  
Vol 24 (11-12) ◽  
pp. 2733-2739
Author(s):  
Balázs Broda ◽  
György Inzelt
Keyword(s):  
Sulfuric Acid ◽  
Quartz Crystal ◽  
Lead Dioxide ◽  
Electrochemical Quartz Crystal Microbalance ◽  
Lead Sulfate ◽  
Acid Media ◽  
Sulfuric Acid Solutions ◽  
Kinetics Of ◽  
Thick Lead

Abstract The charge-discharge characteristics and the aging mechanism of PbO2 layers doped with bismuth in contact with sulfuric acid solutions were studied by using combined cyclic voltammetry and electrochemical quartz crystal microbalance (EQCM) techniques. For this purpose, thick lead dioxide layers (non-doped and doped with Bi) were electrodeposited on gold substrate from aqueous solutions of Pb(NO3)2 dissolved in nitric acid and they were investigated in sulfuric acid media. Based on the electrochemical and the mass change responses, it is concluded that during the electrodeposition, bismuth influences the structure of the PbO2 formed. Bi(III) also inhibits the oxidation of lead sulfate and affects the reduction kinetics of lead dioxide. During successive cyclization (aging), the presence of bismuth accelerates the hydration of PbO2.

Oxidation Kinetics of Yba2Cu3OT7-x Thin Films in the Presence of Atomic Oxygen and Molecular Oxygen by In-Situ Resistivity Measurement

1991 ◽  
Vol 230 ◽  
Author(s):  
K. Yamamoto ◽  
B. M. Lairson ◽  
J. C. Bravman ◽  
T. H. Geballe
Keyword(s):  
Thin Films ◽  
Molecular Oxygen ◽  
Atomic Oxygen ◽  
Resistivity Measurement ◽  
Oxygen Stoichiometry ◽  
Ambient Conditions ◽  
Kinetics Of Oxidation ◽  
Thermally Activated ◽  
Kinetics Of

AbstractThe kinetics of oxidation in Yba2Cu3O7-x thin films in the presence of molecular and atomic oxygen ambients have been studied. The resistivity of c-axis, a-axis, and mixed a+c axis oriented films, deposited in-situ by off-axis magnetron sputtering, was measured as a function of time subsequent to a change in the ambient conditions. The oxidation process is shown to be thermally activated and can be characterized by a diffusion model with an activation energy which varies from approximately 1.2eV in the presence of molecular oxygen to 0.6eV for a flux of 2×1015 oxygen atoms/cm2sec. In both cases, diffusivity is found to be insensitive to oxygen stoichiometry, but the rate of oxidation is found to be sensitive to the microstructure and orientation of the films.

Study of in situ adsorption kinetics of polyelectrolytes and liposomes using quartz crystal microbalance: Influence of experimental layout

2015 ◽  
Vol 86 (6) ◽  
pp. 063901 ◽  
Author(s):  
A. A. Duarte ◽  
L. M. G. Abegão ◽  
J. H. F. Ribeiro ◽  
J. P. Lourenço ◽  
P. A. Ribeiro ◽  
...  
Keyword(s):  
Quartz Crystal Microbalance ◽  
Adsorption Kinetics ◽  
Quartz Crystal ◽  
In Situ Adsorption ◽  
Kinetics Of

scholarly journals Tuning and in situ monitoring of surface-initiated, atom-transfer radical polymerization of acrylamide derivatives in water-based solvents

2019 ◽  
Vol 10 (29) ◽  
pp. 3933-3942 ◽  
Author(s):  
Joydeb Mandal ◽  
Rok Simic ◽  
Nicholas D. Spencer
Keyword(s):  
Atomic Force Microscopy ◽  
Quartz Crystal ◽  
Polymer Brush ◽  
In Situ Monitoring ◽  
Colloidal Probe ◽  
Force Microscopy ◽  
Atomic Force ◽  
Water Based ◽  
Kinetics Of

SI-ATRP kinetics of acrylamide derivatives is studied in situ using a quartz crystal microbalance with dissipation (QCM-D). The effect of growth kinetics on polymer-brush dispersity have been examined using colloidal-probe atomic force microscopy.

Kinetics of in situ desorption of dye molecules on sensitized TiO2 nanoparticles in a high concentration solution: ion parasitic adsorption process and mass reference

2018 ◽  
Vol 20 (32) ◽  
pp. 20856-20862 ◽  
Author(s):  
Weiqing Liu ◽  
Fei Liu ◽  
Yujing Liu ◽  
Yuqian Ai
Keyword(s):  
Tio2 Nanoparticles ◽  
Adsorption Process ◽  
Mass Change ◽  
Dye Molecules ◽  
High Concentration ◽  
Desorption Process ◽  
Dye Sensitized ◽  
High Concentration Solution ◽  
Kinetics Of

This paper applies a method to study the in situ mass change responses on dye-sensitized TiO2 films in different potential ranges, and explore the dye desorption process in depth and in detail.

Influence of the supersaturation on the nucleation-growth process of scale electrodeposition by in situ observation through a transparent quartz crystal microbalance

2004 ◽  
Vol 49 (2) ◽  
pp. 145-152 ◽  
Author(s):  
O. Devos ◽  
C. Gabrielli ◽  
B. Tribollet
Keyword(s):  
Growth Process ◽  
Quartz Crystal ◽  
Pure Water ◽  
In Situ Observation ◽  
Nucleation Process ◽  
Mass Measurements ◽  
Kinetics Of ◽  
Scale Deposition ◽  
Nucleation Growth

An original technique allowed three in situ measurements to be obtained simultaneously, i.e. electrochemical and mass measurements and a microscope image of the interface between electrode and solution. The nucleation-growth process of CaCO3 deposition was investigated by varying different parameters which influenced the supersaturation coefficient, the Ca2+ concentration, pH and convection of the carbonically pure water near the substrate. The results showed that the variation of the scaling rate was due, for the two first cases, to an influence of the nucleation process whereas for the last case, the kinetics of scale deposition were modified by a shift of the growth rate.

In situ study of electron beam-induced chemical vapor deposition of Au in an environmental TEM

1995 ◽  
Vol 53 ◽  
pp. 256-257
Author(s):  
J. Drucker ◽  
R. Sharma ◽  
J. Kouvetakis ◽  
K.H.J. Weiss
Keyword(s):  
Electron Beam ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Quantum Effect ◽  
Line Drawing ◽  
Chemical Vapor ◽  
Environmental Cell ◽  
Engineering Changes ◽  
Kinetics Of

Patterning of metals is a key element in the fabrication of integrated microelectronics. For circuit repair and engineering changes constructive lithography, writing techniques, based on electron, ion or photon beam-induced decomposition of precursor molecule and its deposition on top of a structure have gained wide acceptance Recently, scanning probe techniques have been used for line drawing and wire growth of W on a silicon substrate for quantum effect devices. The kinetics of electron beam induced W deposition from WF6 gas has been studied by adsorbing the gas on SiO2 surface and measuring the growth in a TEM for various exposure times. Our environmental cell allows us to control not only electron exposure time but also the gas pressure flow and the temperature. We have studied the growth kinetics of Au Chemical vapor deposition (CVD), in situ, at different temperatures with/without the electron beam on highly clean Si surfaces in an environmental cell fitted inside a TEM column.

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