Fabrication of PZT Based Capacitor with SrRuO3 Electrode for Memory Device Applications

1998 ◽  
Vol 541 ◽  
Author(s):  
Ashok Kumar ◽  
H. Rahman ◽  
M. Shamsuzzoha
Keyword(s):  
Ferroelectric Properties ◽  
Ruthenium Oxide ◽  
Memory Device ◽  
Ferroelectric Material ◽  
Test System ◽  
X Ray Diffraction ◽  
Si Substrates ◽  
Transmission Electron ◽  
Device Applications

AbstractStrontium ruthenium oxide (SrRuO3) was deposited on Pt/(100)Si substrates at varying temperatures and 300 mTorr oxygen pressure using the pulsed laser deposition method and was found to be highly crystalline and textured when deposited over 450°C. After achieving highly crystalline SrRuO3 films, capacitors using the ferroelectric material - PZT (PbZr0.5Ti0.48O3) were successfully fabricated on Pt/(100)Si substrates. The ferroelectric properties of the films were determined by the RT66A Standardized Ferroelectric Test System. The structural properties of the films were analyzed by X-ray diffraction. Transmission electron microscopy was used to determine the crystallinity and quality of interfaces among different layers.

MO-CVD GaAs Grown by Direct Deposition on Si

1987 ◽  
Vol 91 ◽  
Author(s):  
S. M. Vernon ◽  
S. J. Pearton ◽  
J. M. Gibson ◽  
R. Caruso ◽  
C. R. Abernathy ◽  
...  
Keyword(s):  
Chemical Vapor ◽  
Gaas Layer ◽  
Threading Dislocation ◽  
X Ray Diffraction ◽  
Si Substrates ◽  
Transmission Electron ◽  
Activation Data ◽  
Threading Dislocation Density ◽  
Donor Activity

ABSTRACTGaAs layers were grown directly on misoriented (2° off (100)→[011]) Si substrates by Metalorganic Chemical Vapor Deposition. The threading dislocation density at the surface of 4 μm thick layers was typically 108cm−2, as determined by both preferential etching and transmission electron microscopy. Rapid thermal annealing (900°C, 10s) improved the crystalline quality of the GaAs near the heterointerface while allowing no detectable Si diffusion into this layer. Two deep electron traps were observed in the undoped GaAs, but were present at a low concentration (∼ 1013 cm−3 ). The (400) x-ray diffraction peak width from the GaAs was significantly reduced with increasing GaAs layer thickness, indicating improved material quality. This is supported by Si implant activation data, which shows higher net donor activity in thicker layers.

Formation of Si Nanocrystals in Thin SiO2 Films for Memory Device Applications

2010 ◽  
Vol 644 ◽  
pp. 101-104 ◽  
Author(s):  
Mario Curiel ◽  
Ivan Petrov ◽  
Nicola Nedev ◽  
Diana Nesheva ◽  
Mauro R. Sardela ◽  
...  
Keyword(s):  
Memory Device ◽  
X Ray Diffraction ◽  
Sio2 Matrix ◽  
Furnace Annealing ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Transmission Electron ◽  
Si Nanocrystals ◽  
Device Applications

X-ray Diffraction and Reflectivity, Transmission Electron Microscopy and Atomic Force Microscopy were applied to study the effect of thermal annealing on the properties of thin SiOx films (~ 15 nm) prepared by thermal evaporation of SiO in vacuum. It has been shown that furnace annealing at 1000 oC causes phase separation and formation of uniformly distributed Si nanocrystals into a SiO2 matrix. Clockwise hysteresis has been observed in the C-V curves measured and explained by assuming charging and discharging of the NCs with carriers, which tunnel from the Si substrate.

Structural and Optical Properties of InAsSbBi Grown by Molecular Beam Epitaxy on Offcut GaSb Substrates

Photonics ◽  
2021 ◽  
Vol 8 (6) ◽  
pp. 215
Author(s):  
Rajeev R. Kosireddy ◽  
Stephen T. Schaefer ◽  
Marko S. Milosavljevic ◽  
Shane R. Johnson
Keyword(s):  
Molecular Beam Epitaxy ◽  
Molecular Beam ◽  
Optical Quality ◽  
X Ray Diffraction ◽  
Interface Quality ◽  
Force Microscopy ◽  
Atomic Force ◽  
Transmission Electron ◽  
Lateral Variations

Three InAsSbBi samples are grown by molecular beam epitaxy at 400 °C on GaSb substrates with three different offcuts: (100) on-axis, (100) offcut 1° toward [011], and (100) offcut 4° toward [011]. The samples are investigated using X-ray diffraction, Nomarski optical microscopy, atomic force microscopy, transmission electron microscopy, and photoluminescence spectroscopy. The InAsSbBi layers are 210 nm thick, coherently strained, and show no observable defects. The substrate offcut is not observed to influence the structural and interface quality of the samples. Each sample exhibits small lateral variations in the Bi mole fraction, with the largest variation observed in the on-axis growth. Bismuth rich surface droplet features are observed on all samples. The surface droplets are isotropic on the on-axis sample and elongated along the [011¯] step edges on the 1° and 4° offcut samples. No significant change in optical quality with offcut angle is observed.

Microstructural and Ferroelectric Properties of a Chemical Solution Deposited Epitaxial PbZr0.5 Ti0.5O3 Thin Film on a SrRuO3/SrTiO3 Substrate

1999 ◽  
Vol 14 (4) ◽  
pp. 1190-1193 ◽  
Author(s):  
J. H. Kim ◽  
A. T. Chien ◽  
F. F. Lange ◽  
L. Wills
Keyword(s):  
Thin Film ◽  
Ferroelectric Properties ◽  
Chemical Solution ◽  
X Ray Diffraction ◽  
Solution Deposition ◽  
Chemical Solution Deposition Method ◽  
Transmission Electron ◽  
Saturation Polarization ◽  
Pzt Thin Film ◽  
Relationship Of

Epitaxial PbZr0.5Ti0.5O3 (PZT) thin films were grown on top of a SrRuO3 epitaxial electrode layer on a (100) SrTiO3 substrate by the chemical solution deposition method at 600 °C. The microstructure of the PZT thin film was investigated by x-ray diffraction and transmission electron microscopy, and the ferroelectric properties were measured using the Ag/PZT/SRO capacitor structure. The PZT thin film has the epitaxial orientational relationship of (001) [010]PZT ║ (001) [010]SRO ║ (001) [010]STO with the substrate. The remnant (Pr ) and saturation polarization (Ps) density were measured to be Pr ~ 51.4 µC/cm2 and Ps ~ 62.1 µC/cm2 at 5 V, respectively. Ferroelectric fatigue measurements show that the net-switching polarization begins to drop (to 98% of its initial value) after 7 × 108 cycles.

Influence of LaNiO3 as an Electrode on the Properties of Ferroelectric Oxides

2000 ◽  
Vol 623 ◽  
Author(s):  
R. Kalare ◽  
M. Vedawyas ◽  
A. Kumar
Keyword(s):  
Ferroelectric Properties ◽  
Ferroelectric Thin Film ◽  
Memory Device ◽  
Epitaxial Films ◽  
Laser Deposition ◽  
Oxide Materials ◽  
X Ray Diffraction ◽  
X Ray ◽  
Potential Electrode ◽  
Ferroelectric Oxides

AbstractAn electrode plays an important role in realising a ferroelectric thin film as a potential memory device. We have investigated LaNiO3 (LNO) as a potential electrode material and evaluated the ferroelectric properties of oxide materials like strontium bismuth tantalate (SBT) and barium titanate(BT). We have successfully deposited epitaxial films of LNO on Pt coated Si(100) and LaAlO3 (LAO) substrates using the pulsed excimer laser deposition technique. We are able to grow high quality SBT and BT films on top of this LNO layer. The X-ray diffraction revealed the epitaxy of the LNO, SBT and BT films. The ferroelectric properties of SBTand BT were investigated using the RT66A ferroelectric tester.

Residue-Free Suspended Graphene Transferred by Perforated Template

2021 ◽  
Author(s):  
sangmin kim ◽  
Choong-Kwang Lee ◽  
Sung-Uk Yoon ◽  
Kyung-Shik Kim ◽  
Yun Hwangbo
Keyword(s):  
2D Materials ◽  
Si Substrates ◽  
Polymer Templates ◽  
Transmission Electron ◽  
Powerful Approach ◽  
Device Applications ◽  
Thermal Annealing Process ◽  
Specific Position ◽  
Transfer Method ◽  
Subsequent Thermal Annealing

Abstract A residue-free transfer method for graphene is proposed in this study, especially for the fabrication of suspended structures. Using perforated polymer templates, graphene can be precisely transferred onto the specific position in the perforated target SiO2/Si substrates without the need for polymer removal and the subsequent thermal annealing process. The surface of the transferred graphene by the proposed method was analyzed and corroborated via Raman spectroscopy, Fourier transform infrared spectroscopy, transmission electron microscopy. The results of these analyses suggest that the graphene surface has no polymeric residues resulting from the transfer process. The proposed method provides a powerful approach for the transfer of 2D materials and it enables the exploitation of their suspended structures for device applications as well as the physical characterizations without worry on the effect of contaminants.

Epitaxial Growth of Aluminum Nitride on Sapphire and Silicon

1994 ◽  
Vol 358 ◽  
Author(s):  
K. Dovidenko ◽  
S. Oktyabrsky ◽  
J. Narayan ◽  
M. Razeghi
Keyword(s):  
Epitaxial Growth ◽  
Substrate Surface ◽  
Wide Band ◽  
X Ray Diffraction ◽  
Wide Band Gap ◽  
High Quality ◽  
Microstructural Characteristics ◽  
X Ray ◽  
Si Substrates ◽  
Transmission Electron

ABSTRACTThe microstructural characteristics of wide band gap semiconductor, hexagonal A1N thin films on Si(100), (111), and sapphire (0001) and (10ī2) were studied by transmission electron microscopy (TEM) and x-ray diffraction. The films were grown by MOCVD from TMA1 + NH3 + N2 gas mixtures. Different degrees of film crystallinity were observed for films grown on α-A12O3 and Si substrates in different orientations. The epitaxial growth of high quality single crystalline A1N film on (0001) α-Al2O3 was demonstrated with a dislocation density of about 2*10 10cm−2 . The films on Si(111) and Si(100) substrates were textured with the c-axis of A1N being perpendicular to the substrate surface.

Ion Beam Synthesis of Luminescent SI and GE Nanocrystals in a Silicon Dioxide Matrix

1993 ◽  
Vol 316 ◽  
Author(s):  
H.A. Atwater ◽  
K.V. Shcheglov ◽  
S.S. Wong ◽  
K.J. Vahala ◽  
R.C. Flagan ◽  
...  
Keyword(s):  
Ion Beam ◽  
Optoelectronic Device ◽  
Structural Defects ◽  
Si Substrates ◽  
Localized State ◽  
Transmission Electron ◽  
Ion Beam Synthesis ◽  
Theoretical Predictions ◽  
Device Applications ◽  
Ge Nanocrystals

ABSTRACTIon beam synthesis of Si and Ge nanocrystals in an SiO2 matrix is performed by precipitation from supersaturated solid solutions created by ion implantation. Films of SiO2 on (100) Si substrates are implanted with Si and Ge at doses 1 × 1016/cm2 - 5 × 1016/cm2. Implanted samples are subsequently annealed to induce precipitation of Si and Ge nanocrystals. Raman spectroscopy and high-resolution transmission electron microscopy indicate a correlation between visible room-temperature photoluminescence and the formation of diamond cubic nanocrystals approximately 2–5 nm in diameter in annealed samples. As-implanted but unannealed samples do not exhibit luminescence. Rutherford backscattering spectra indicate a steepening of implanted Ge profiles upon annealing. Photoluminescence spectra are correlated with annealing temperatures, and compared with theoretical predictions for various possible luminescence mechanisms, such as radiative recombination of quantum-confined excitons, as well as possible localized state luminescence related to structural defects in SiO2. Potential optoelectronic device applications are also discussed.

Ge Growth on Nanostructured Silicon Surfaces

2005 ◽  
Vol 862 ◽  
Author(s):  
Ganesh Vanamu ◽  
Abhaya K. Datye ◽  
Saleem H. Zaidi
Keyword(s):  
Electron Microscopy ◽  
Dislocation Density ◽  
Full Width Half Maximum ◽  
Defect Density ◽  
Chemical Vapor ◽  
Silicon Surfaces ◽  
X Ray Diffraction ◽  
Etch Pit ◽  
Transmission Electron

AbstractWe report highest quality Ge epilayers on nanoscale patterned Si structures. 100% Ge films of 10 μm are deposited using chemical vapor deposition. The quality of Ge layers was examined using scanning electron microscopy (SEM), transmission electron microscopy (TEM), and high-resolution x-ray diffraction (HRXRD) measurements. The defect density was evaluated using etch pit density measurements. We have obtained lowest dislocation density (5×105 cm-2) Ge films on the nanopatterned Si structures. The full width half maximum peaks of the reciprocal space maps of Ge epilayers on the nanopatterned Si showed 93 arc sec. We were able to get rid of the crosshatch pattern on the Ge surface grown on the nanopatterned Si. We also showed that there is a significant improvement of the quality of the Ge epilayers in the nanopatterned Si compared to an unpatterned Si. We observed nearly three-order magnitude decrease in the dislocation density in the patterned compared to the unpatterned structures. The Ge epilayer in the patterned Si has a dislocation density of 5×105 cm-2 as compared to 6×108 cm-2 for unpatterned Si.

Growth of MBE-Codeposited IrSi3 on Si(111) and Si(100)

1994 ◽  
Vol 299 ◽  
Author(s):  
Gary A. Gibson ◽  
Davis A. Lange ◽  
Charles M. Falco
Keyword(s):  
Ion Beam ◽  
Silicide Phase ◽  
X Ray Diffraction ◽  
X Ray ◽  
Low Energy Electron Diffraction ◽  
Growth Modes ◽  
Transmission Electron ◽  
Low Energy Electron

AbstractWe have used Molecular Beam Epitaxy (MBE) to successfully grow films that are predominantly IrSi3 on both Si(111) and Si(100) substrates by codeposition of Si and Ir in a 3:1 ratio. Bragg-Brentano and Seemann-Bohlin x-ray diffraction reveal that polycrystalline IrSi3 films form as low as 450 °C. This is the lowest temperature yet reported for growth of this iridium silicide phase. These x-ray diffraction techniques, along with Transmission Electron Microscope (TEM) diffraction and in situ Low Energy Electron Diffraction (LEED), show that at higher deposition temperatures codeposition can form IrSi3 films on Si(111) that consist predominantly of a single epitaxial growth orientation. Ion beam channeling and x-ray rocking curves show that the epitaxial quality of IrSi3 films deposited on Si(111) is superior to that of IrSi3 films deposited on Si(100). We also present evidence for several new epitaxial IrSi3 growth modes on Si(111) and Si(100).

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