Model Based Temperature Control in RTP Yielding ±0.1 °C accuracy on A 1000 °C, 2 second, 100 °C/s Spike Anneal
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ABSTRACTA Model Based Control method is presented for accurate control of RTP systems. The model uses 4 states: lamp filament temperature, wafer temperature, quartz temperature and TC temperature. A set of 4 first order, nonlinear differential equations describes the model. Feedback is achieved by updating the model, based on a comparison between actual (measured) system response and modeled system response.
2020 ◽
Vol 25
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1994 ◽
Vol 116
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pp. 6-15
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1980 ◽
Vol 78
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pp. 64-64
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