Synchrotron Radiation Hard X-Ray Microprobe by Multilayer Fresnel Zone Plate

1998 ◽  
Vol 524 ◽  
Author(s):  
S. Tamura ◽  
K. Ohtani ◽  
M. Yasumoto ◽  
K. Murali ◽  
N. Kamuo ◽  
...  
Keyword(s):  
Synchrotron Radiation ◽  
High Performance ◽  
Fresnel Zone ◽  
Deposition Process ◽  
Spot Size ◽  
Zone Plate ◽  
Fresnel Zone Plate ◽  
X Rays ◽  
Sputtering Deposition ◽  
X Ray

ABSTRACTA hard X-ray microbeam with submicrometer spot size from synchrotron radiation (SR) sources is expected to add a new dimension to various X-ray analysis methods. A Fresnel zone plate (FZP) is one of the promising focusing elements for X-rays. In order to develop high performance multilayer FZP for use in the hard X-ray region, Cu/Al concentric multilayers were fabricated by use of a DC sputtering deposition process. Lower Ar gas pressure or higher rotating speed of a wire substrate has been effective in forming smoother multilayer interfaces. From a focusing test of the Cu/Al FZP (100-zones) by the SR (λ= 0.154nm), microbeams of 1.5 μm φ and 0.8 μm φ have been achieved for the first- and third-order focal beams, respectively.

Multilayer Fresnel Zone Plate For 8KeV X-Ray by DC Magnetron Sputtering Deposition

1996 ◽  
Vol 441 ◽  
Author(s):  
S. Tamura ◽  
K. Mori ◽  
T. Maruhashi ◽  
K. Yoshida ◽  
K. Ohtani ◽  
...  
Keyword(s):  
High Performance ◽  
Fresnel Zone ◽  
Gas Pressure ◽  
Zone Plate ◽  
Fresnel Zone Plate ◽  
Zone Boundary ◽  
Sputtering Deposition ◽  
X Ray ◽  
Deposition Parameters ◽  
Ar Gas

AbstractHard X-ray microprobes from synchrotron radiation ( SR ) sources should be powerful tools for various fields of research. A Fresnel zone plate ( FZP ) is a promising focusing element for X-ray. In order to develop high performance multilayer FZP for use in hard X-ray region, Ag/C and Cu/Al concentric multilayers were prepared by some deposition parameters. A dependence of the zone boundary structures on the Ar gas pressure was observed: the multilayer prepared at lower Ar gas pressure had smoother zones. Substrate cooling did not improve the zone boundary structures. From the focusing test of the Cu/Al FZP by the SR, a microbeam of 1.3 μ m ø has been obtained for 8 KeV X-ray (λ =0.154nm).

Computer-Controlled Fabrication of Concentric Multilayer Fresnel Zone Plate for Synchrotron Radiation Hard X-Ray

2001 ◽  
Vol 700 ◽  
Author(s):  
Masato Yasumoto ◽  
Shigeharu Tamura ◽  
Nagao Kamijo ◽  
Yoshio Suzuki ◽  
Mitsuhiro Awaji ◽  
...  
Keyword(s):  
Control System ◽  
Synchrotron Radiation ◽  
Fresnel Zone ◽  
Computer Control ◽  
Zone Plate ◽  
Optical Parameters ◽  
Fresnel Zone Plate ◽  
Computer Control System ◽  
X Ray ◽  
Radiation Hard

AbstractA Fresnel zone plate (FZP) is a micro-focusing optical element of synchrotron radiation hard X-ray. Our developed multilayer FZP produced a sub-micron size spot at the hard X-ray energy and the focusing efficiency is about 25%. However the higher efficiency FZP is required to utilize the sub-micron probe in microscopy, diffraction and imaging applications. A kinoform FZP composed of gradient refractive index phase zones has the advantage of a high focusing efficiency compared to the conventional multilayer FZP. In order to fabricate the kinoform FZP, we developed a computer-control system. The developed computer-control system automatically operates whole combinatorial deposition processes of the kinoform FZP by inputting the optical parameters of the FZP (focal length, X-ray wavelength, number of zones, zone materials).

New approaches to fabrication of multilayer Fresnel zone plate for high-energy synchrotron radiation X-rays

Vacuum ◽  
2006 ◽  
Vol 80 (7) ◽  
pp. 823-827 ◽  
Author(s):  
Shigeharu Tamura ◽  
Masato Yasumoto ◽  
Nagao Kamijo ◽  
Yoshio Suzuki ◽  
Mitsuhiro Awaji ◽  
...  
Keyword(s):  
Synchrotron Radiation ◽  
Fresnel Zone ◽  
High Energy ◽  
Zone Plate ◽  
Fresnel Zone Plate ◽  
X Rays ◽  
New Approaches

Multilayer Fresnel zone plate for high-energy X-ray by DC sputtering deposition

Vacuum ◽  
2002 ◽  
Vol 66 (3-4) ◽  
pp. 495-499 ◽  
Author(s):  
Shigeharu Tamura ◽  
Masato Yasumoto ◽  
Toshiyuki Mihara ◽  
Nagao Kamijo ◽  
Yoshio Suzuki ◽  
...  
Keyword(s):  
Fresnel Zone ◽  
High Energy ◽  
Zone Plate ◽  
Fresnel Zone Plate ◽  
Sputtering Deposition ◽  
X Ray ◽  
Dc Sputtering

scholarly journals Large field-of-view X-ray imaging by using a Fresnel zone plate

2012 ◽  
Vol 30 (1) ◽  
pp. 87-93 ◽  
Author(s):  
Xiao-Fang Wang ◽  
Jin-Yu Wang ◽  
Xiao-Hu Chen ◽  
Xin-Gong Chen ◽  
Lai Wei
Keyword(s):  
High Resolution ◽  
Fresnel Zone ◽  
Numerical Study ◽  
Field Of View ◽  
Zone Plate ◽  
Large Field ◽  
Fresnel Zone Plate ◽  
X Rays ◽  
X Ray ◽  
X Ray Imaging

AbstractTo diagnose the implosion of a laser-driven-fusion target such as the symmetry, the hydrodynamic instability at the interface, a high-resolution, large field-of-view kilo-electron-volt X-ray imaging is required. A Kirkpatrick-Baez (K-B) microscope is commonly used, but its field of view is limited to a few hundred microns as the resolution decreases rapidly with the increase of the field of view. A higher resolution could be realized by using a Fresnel zone plate (FZP) for imaging. Presented in this work is a numerical study on the imaging properties of an FZP at Ti-Kα wavelength of 0.275 nm, and a comparison to a K-B imager. It is found that the FZP can realize not only a resolution better than 1 µm, but also a field-of-view larger than 20 mm when the FZP is illuminated by X-rays of spectral bandwidth less than 1.75%. These results indicate the feasibility of applying the FZP in high-resolution, large field-of-view X-ray imaging.

Direct-write X-ray lithography using a hard X-ray Fresnel zone plate

2015 ◽  
Vol 22 (3) ◽  
pp. 781-785 ◽  
Author(s):  
Su Yong Lee ◽  
Do Young Noh ◽  
Hae Cheol Lee ◽  
Chung-Jong Yu ◽  
Yeukuang Hwu ◽  
...  
Keyword(s):  
Proximity Effect ◽  
Fresnel Zone ◽  
Lateral Spread ◽  
Zone Plate ◽  
Fresnel Zone Plate ◽  
Direct Write ◽  
X Rays ◽  
X Ray ◽  
Better Than ◽  
Outermost Zone

Results are reported of direct-write X-ray lithography using a hard X-ray beam focused by a Fresnel zone plate with an outermost zone width of 40 nm. An X-ray beam at 7.5 keV focused to a nano-spot was employed to write arbitrary patterns on a photoresist thin film with a resolution better than 25 nm. The resulting pattern dimension depended significantly on the kind of underlying substrate, which was attributed to the lateral spread of electrons generated during X-ray irradiation. The proximity effect originated from the diffuse scattering near the focus and electron blur was also observed, which led to an increase in pattern dimension. Since focusing hard X-rays to below a 10 nm spot is currently available, the direct-write hard X-ray lithography developed in this work has the potential to be a promising future lithographic method.

Suppression of Corrugated Boundaries in Multilayer Fresnel Zone Plate for Hard X-Ray Synchrotron Radiation Using Cylindrical Slit

2001 ◽  
Vol 40 (Part 1, No. 7) ◽  
pp. 4747-4748 ◽  
Author(s):  
Masato Yasumoto ◽  
Shigeharu Tamura ◽  
Nagao Kamijo ◽  
Yoshio Suzuki ◽  
Mitsuhiro Awaji ◽  
...  
Keyword(s):  
Synchrotron Radiation ◽  
Fresnel Zone ◽  
Zone Plate ◽  
Fresnel Zone Plate ◽  
X Ray

Focusing efficiency of a multilayer Fresnel zone plate for hard X-ray fabricated by DC sputtering deposition

Vacuum ◽  
2000 ◽  
Vol 59 (2-3) ◽  
pp. 553-558 ◽  
Author(s):  
Shigeharu Tamura ◽  
Kensuke Murai ◽  
Nagao Kamijo ◽  
Kunio Yoshida ◽  
Hiroshi Kihara ◽  
...  
Keyword(s):  
Fresnel Zone ◽  
Zone Plate ◽  
Fresnel Zone Plate ◽  
Sputtering Deposition ◽  
X Ray ◽  
Dc Sputtering

scholarly journals High-energy x-ray nanotomography introducing an apodization Fresnel zone plate objective lens

2021 ◽  
Vol 92 (2) ◽  
pp. 023701 ◽  
Author(s):  
Akihisa Takeuchi ◽  
Kentaro Uesugi ◽  
Masayuki Uesugi ◽  
Hiroyuki Toda ◽  
Kyosuke Hirayama ◽  
...  
Keyword(s):  
Fresnel Zone ◽  
High Energy ◽  
Zone Plate ◽  
Objective Lens ◽  
Fresnel Zone Plate ◽  
X Ray
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