Morphology of Low Temperature Carbon Films Prepared by VHF CVD: Correlation with Field Emission
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AbstractThe effect of deposition parameters and substrate on the morphology of carbon films prepared in VHF plasma at low temperature has been studied by Atomic Force Microscopy. Carbon films demonstrating superior emission characteristics were the smoothest, but not all of the smoothest films demonstrated good emission. Significant influence of pre-growth treatment of the substrate surface on the emission characteristics of the films was found.
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1999 ◽
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1991 ◽
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2016 ◽
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pp. 093113
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