Investigation of a-Si:H PH(1)N Color Detector Operation

1998 ◽  
Vol 507 ◽  
Author(s):  
M. Topiĉ ◽  
F. Smole ◽  
J. Furlan

ABSTRACTUsing numerical simulator, the operational principle of two-terminal a-Si:H based three-color detectors with the multi-layer multi-bandgap PIN or PIIiN structure is investigated. Two different approaches, which lead to bias-controlled three-color detection, are described and evaluated in terms of spectral response, rejection ratio, color suppression, illumination intensity and bias-light. For both PIIN and PIIN structure, bias-light dependence and intensity dependence is investigated. Numerical simulation results showed strong negative correlation between color separation and bias-light sensitivity. The importance of the transparent conducting oxide for the three-color detection limits is demonstrated.

1996 ◽  
Vol 420 ◽  
Author(s):  
T. Neidlinger ◽  
M. B. Schubert ◽  
G. Schmid ◽  
H. Brummack

AbstractIn order to overcome the intrinsic speed limitation of amorphous silicon nipin color sensors we present an alternative way of achieving bias-controlled spectral sensitivity of two-terminal thin film devices, piin structures with appropriate band gap and thickness of their single layers can be used as photodetectors that are able to sequentially extract different color signals. Color separation is achieved by controlling the absorption and electric field profile across these piin devices, and thanks to the differences in electron and hole transport properties. Because in contrast to nipin devices there is no need for reverting readout voltages for color separation, this type of sensors can be operated at much higher readout frequencies. Spectral response and bias voltage transients have been analysed up to 20kHz, and preliminiary data are presented on the optimization of speed, dynamic range and color separation by varying bandgap and thickness of p- and i-layers. Furthermore a three-color sensor has been realized by introducing an additional intrinsic layer.


1986 ◽  
Vol 70 ◽  
Author(s):  
Chris Walker ◽  
Russell Hollingsworth ◽  
Joe del Cueto ◽  
Arun Madan

The use of transparent conducting oxides (TCO) as electrical contacts in a-Si:H solar cells has stimulated interest in the multitude of effects that these layers have on a-Si:H solar cell performance. The study of a-Si:H p-i-n junctions using a TCO contact involves many factors such as, interdiffusion, transmission, reflection, and resistivity. In this paper, we attempt to distinguish between these factors through the role they play in determining the solar cell device performance. Devices were characterized via dark and illuminated current vs. voltage (I-V) measurements, and spectral response. It was found that the properties of the TCO have an important role in influencing FF and Jsc in the devices.


2018 ◽  
Vol 2 (4) ◽  
Author(s):  
D. Ali ◽  
M. Z. Butt ◽  
C. Coughlan ◽  
D. Caffrey ◽  
I. V. Shvets ◽  
...  

1989 ◽  
Vol 54 (21) ◽  
pp. 2088-2090 ◽  
Author(s):  
B. Drevillon ◽  
Satyendra Kumar ◽  
P. Roca i Cabarrocas ◽  
J. M. Siefert

2011 ◽  
Vol 264-265 ◽  
pp. 754-759 ◽  
Author(s):  
Bakri Jufriadi ◽  
Agus Geter E. Sutjipto ◽  
R. Othman ◽  
R. Muhida

AZO is an ideal replacement transparent conducting oxide (TCO) for ITO to all corresponding applications. The typical applications include: transparent electrodes for solar cells, flat panel displays, LCD electrodes, electro-magnetic compatibility (RF-EMI shielding) coatings, touch panel transparent contacts, static discharge dissipation. The production of useful and commercially attractive thin films using different deposition processes is very important parameter to investigate. A systematic study of the sputtering condition and their influenced on electrical and structural were studied. In this work, AZO films were deposited by RF magnetron sputtering at 200 °C. The result shows that the deposited time has influenced the characteristic of deposited AZO films. For a longer deposition time, thin film shows a uniform grain growth. The resistivity found minimum at the deposition time of 45 minutes. It can be considered that by reducing of the grain boundaries which enable the electron carries to conduct smoothly.


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