Mechanical and Tribological Properties of Zrc/Vc Alloy Films Deposited by Sputtering and Pulsed Laser Deposition

1997 ◽  
Vol 505 ◽  
Author(s):  
W. F. Brock ◽  
J. E. Krzanowski ◽  
R. E. Leuchtner ◽  
L. J. Legore ◽  
D. J. Frankel
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Elevated Temperatures ◽  
Heavy Atom ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Crystallographic Structure ◽  
Processing Parameter ◽  
Wear Properties ◽  
Background Gas

ABSTRACTA study has been conducted on ZrC/VC alloy thin films prepared by both pulsed laser deposition (PLD) and RF magnetron sputtering. The phase formation, wear properties, and hardness of these thin films were examined. An alloy target comprised of 36% VC and 64% ZrC (atomic %) was used to deposit films at 200°, 2000°, and 400° C. The nominal film thickness was 0.6 μm. X-ray diffraction (XRD) analysis revealed these films were solid-solution alloys and showed a preference for (100) orientation for sputter-deposited films and a (110) orientation for laser deposition. More highly oriented films were obtained at elevated temperatures as evidenced by rocking curve measurements on the PLD films. The FWHM of the peaks ranged from 2.2° to 8.3° for films deposited at 400° C and 20° C, respectively.Using time-of-flight quadmpole mass spectrometry (TOFQMS), we performed plume diagnostics to measure particle energies and the thermalization effects of the background gas. In vacuum, typical ion energies ranged from ˜5–100 eV while the neutral atoms had kinetic energies from ˜1–5 eV. Our measurements show that the background gas can be used to selectively thermalize low mass components in the plume. From measured kinetic energies and collision effects of the gas, the changes in crystallographic structure of the alloy with pressure appear to result from collision-induced effects from condensation of the Zr atoms. This ‘heavy’ atom effect may be an important new processing parameter with which to adjust film morphology and crystal texture.

Pulsed Laser Deposition of SrBi2Ta2O9 Thin Films for Nonvolatile Memory Applications

1995 ◽  
Vol 397 ◽  
Author(s):  
S. Werner ◽  
D. Thomas ◽  
S.K. Streiffer ◽  
O. Auciello ◽  
Angus I. Kingon
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Nonvolatile Memory ◽  
Elevated Temperatures ◽  
Sol Gel ◽  
Pulsed Laser ◽  
Hysteresis Loops ◽  
Laser Deposition ◽  
Polarization Electric Field ◽  
Memory Applications

ABSTRACTFerroelectric SrBi2Ta2U9 (SBT) thin films were synthesized by pulsed laser deposition (PLD) on platinized silicon substrates held at different substrate temperatures, from targets with different compositions. It was necessary to anneal films deposited at low temperature (525°C) at elevated temperatures in an oxygen atmosphere in order to achieve properties comparable to SBT thin films grown by the sol-gel technique. Polarization – electric field hysteresis loops showed saturation in the 2-5 V range with a remnant polarization 2Pr = 8-13 µC/cm2. Capacitors showed negligible fatigue up to 1010 switching cycles.

Advances in the Growth of SrS Thin Films by Pulsed Laser Deposition

1998 ◽  
Vol 508 ◽  
Author(s):  
A. Piqué ◽  
R. C. Y. Auyeung ◽  
D. B. Chrisey ◽  
B. Justus ◽  
A. Huston ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Data Storage ◽  
Pulsed Laser ◽  
Optical Data Storage ◽  
Laser Deposition ◽  
Optical Data ◽  
Glass Substrates ◽  
Deposition Parameters ◽  
Background Gas

AbstractHigh quality luminescent thin films of strontium sulfide (SrS) doped with rare earths have been grown using Pulsed Laser Deposition (PLD). SrS films ranging in thicknesses from 0.05 to 2 µm. were deposited on MgO (001) and glass substrates. Deposition parameters such as growth temperature and H2S background gas pressure were varied and their effect on the structure, morphology and luminescence of the films was evaluated. The PLD grown films all showed texture and were highly oriented when deposited on MgO substrates as determined by their XRD spectra. Optical microscopy, SEM and AFM analysis were used to study the films' surface morphology. The thermally and optically stimulated luminescence properties of these films were evaluated as well. The data indicates that these materials may be useful for optical data storage applications.

Nanostructured Gold Thin Films Prepared by Pulsed Laser Deposition

2004 ◽  
Vol 19 (3) ◽  
pp. 950-958 ◽  
Author(s):  
Eric Irissou ◽  
Boris Le Drogoff ◽  
Mohammed Chaker ◽  
Michel Trudeau ◽  
Daniel Guay
Keyword(s):  
Thin Films ◽  
Kinetic Energy ◽  
Pulsed Laser Deposition ◽  
Crystallite Size ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Nanostructured Gold ◽  
The Mean ◽  
Gold Thin Films ◽  
Background Gas

A structural and morphological study of nanostructured gold thin films prepared by pulsed laser deposition in the presence of several inert background gases (Ar, He, and N2) and at various pressures (from 10 mTorr to 1 Torr) and target-to-substrate distances (from 1 to 10 cm) is presented. Structural and morphological analyses were undertaken using semiquantitative x-ray diffraction, scanning tunneling microscopy, and transmission electron microscopy. For each set of deposition conditions, the kinetic energy of the neutral gold species [Au(I)] present in the plasma plume was determined by time-of-flight emission spectroscopy and used to characterize the plasma dynamics. It is shown that all films exhibit a transition from highly [111] oriented to polycrystalline as the Au(I) kinetic energy decreases. The polycrystalline phase ratio is close to 0% for Au(I) kinetic energy larger than approximately 3.0 eV/atom and approximately 86 ± 10% for Au(I) kinetic energy smaller than approximately 0.30 eV/atom, irrespective of the background gas atmosphere. The mean crystallite size of both phases and the mean roughness of the films also follow a unique relation with the Au(I) kinetic energy, independently of the nature of the background gas, and nanocrystalline films with crystallite size as small as 12 nm are obtained for Au(I) kinetic energy smaller than 0.3 eV/atom.

Pulsed Laser Deposition of Cluster-Assembled Thin Films with Controlled Nanostructure

2005 ◽  
Vol 901 ◽  
Author(s):  
Andrea Li Bassi ◽  
Carlo Spartaco Casari ◽  
Fabio Di Fonzo ◽  
Alessandro Bailini ◽  
Matteo Fusi ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Film Surface ◽  
Specific Area ◽  
Laser Deposition ◽  
Scanning Tunneling ◽  
Tunneling Microscopy ◽  
Compact Structure ◽  
Background Gas

AbstractThin films synthesized by assembling clusters present interesting chemical and physical properties and a large specific surface, and are appealing for functional applications (e.g. sensing and catalysis). Also, clusters supported on surfaces are interesting both for nanocatalysis applications and for fundamental research. By means of pulsed laser deposition (PLD) in a background atmosphere we can induce cluster aggregation in the ablation plume and control the deposition kinetic energy of the clusters. These phenomena depend on the plume expansion dynamics and their influence on the properties of the deposited films has been investigated as a function of the background gas mass and pressure. The control of these parameters permits variation of the film surface morphology, from a compact structure with a very smooth surface, to a film with a controlled roughness at the nanoscale, to an open, low density meso- and nanostructure characterized by a high fraction of voids and by a large specific area. Thin films of WOx, TiOx, Pd/PdO, and Ag were deposited and characterized by atomic force microscopy (AFM), scanning electron microscopy (SEM) and Raman spectroscopy. Post-deposition annealing permits control of the crystalline degree of the films, which in the case of tungsten and titanium oxide is found to depend on the original nanostructure, while a different degree of oxidation can be induced by controlling the amount of oxygen in the deposition chamber. In-situ scanning tunneling microscopy (STM) was employed to study the first stages of growth of W films on different substrates. This opens the possibility to tailor the material properties through the control of the building nano-units.

Structural, chemical and electrical properties of CdS thin films fabricated by pulsed laser deposition using varying background gas pressure

2019 ◽  
Vol 682 ◽  
pp. 24-28 ◽  
Author(s):  
V.H. Martínez-Landeros ◽  
N. Hernandez-Como ◽  
G. Gutierrez-Heredia ◽  
M.A. Quevedo-Lopez ◽  
F.S. Aguirre-Tostado
Keyword(s):  
Thin Films ◽  
Electrical Properties ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Gas Pressure ◽  
Laser Deposition ◽  
Cds Thin Films ◽  
Background Gas

scholarly journals Study of LIPSS formation on bismuth thin films deposited by Pulsed Laser Deposition

2018 ◽  
Vol 31 (2) ◽  
pp. 39-43
Author(s):  
Adela Reyes-Contreras ◽  
Marco Antonio Camacho López ◽  
Lorena Romero-Salazar ◽  
Enrique Camps
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Periodic Structures ◽  
Pulsed Laser ◽  
Laser Wavelength ◽  
Laser Deposition ◽  
Crystallographic Structure ◽  
Glass Substrates ◽  
Low Energies ◽  
Different Characteristics

In this work, we report the fabrication of bismuth thin films on glass substrates by Pulsed Laser Deposition. A focused beam of a Nd:YAG laser (9 ns, 10 Hz, 1064 and 532 nm) was utilized to carry out the ablation of a high purity Bi target. The per pulse laser fluence was varied between 0.95 and 1.35 J/cm2, depending on the laser wavelength used. The deposits were characterized by SEM and XRD to analyze the surface morphology of thin films and their crystalline structure, respectively. The SEM micrographs showed differences in roughness, which increased with the laser wavelength. The diffractograms revealed the formation of Bi thin films with a polycrystalline structure or with a preferential orientation, depending on the mean kinetic energy of the plasma ions. The as deposited bismuth thin films were irradiated with a non-focused laser beam at low energies below the ablation threshold. In the laser treated area, it could be observed the formation of periodic structures, known as LIPSS (laser induced periodic surface structures). Depending on the crystallographic structure of the irradiated film, the formed LIPSS showed different characteristics, such as width and shape.

Room-temperature cathodoluminescence of n-type ZnO thin films grown by pulsed laser deposition in N2, N2O, and O2 background gas

2005 ◽  
Vol 486 (1-2) ◽  
pp. 205-209 ◽  
Author(s):  
M. Lorenz ◽  
H. Hochmuth ◽  
J. Lenzner ◽  
T. Nobis ◽  
G. Zimmermann ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Room Temperature ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Zno Thin Films ◽  
Background Gas
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