An Enhanced Photoresponse at Dislocation Subgrain Boundaries Revealed by X-Ray Topography of Polysilicon Solar Cells
Keyword(s):
ABSTRACTAn enhanced photoresponse at dislocation subgrain boundaries (in comparison with grain boundaries and dislocation-associated twin boundaries) is attributed to an increased junction depth at their positions relative to the value of the minority carrier diffusion length, Ln. For reasonably pure material, Ln is determined by the dislocation density. The dislocation microstructure of polysilicon solar cells is advantageously studied by means of the several x-ray topography techniques.
1982 ◽
Vol 21
(Part 2, No. 9)
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pp. L558-L560
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