Structural and Electrical Properties of Phosphorous-Doped Amorphous Diamond

1997 ◽  
Vol 498 ◽  
Author(s):  
S. M. Camphausen ◽  
A. F. Myers ◽  
S. P. Bozeman ◽  
J. J. Cuomo
Keyword(s):  
Electrical Properties ◽  
Room Temperature ◽  
Carbon Films ◽  
Hard Carbon ◽  
Graphite Target ◽  
Amorphous Films ◽  
Carbon Species ◽  
Structural And Electrical Properties ◽  
Phosphorus Doped ◽  
Cathodic Arc

ABSTRACTHard carbon films can be prepared by the condensation of energetic carbon species at or below room temperature. These amorphous films are primarily tetrahedrally coordinated and contain high fractions of sp3 bonds leading to the terminology amorphous diamond. These films have been successfully doped with phosphorus up to 1 at.%, by other researchers by using a phosphorus doped graphite target. We have also investigated evaporated phosphorus in conjuction with a filtered cathodic arc to incorporate phosphorus into the films and have successfully incorporated phosphorus up to 40 at.% into our films using this technique. XPS showed that some of the phosphorus was clustered. PEELS revealed that with an incorporation of 40 at.% of phosphorus, the sp3 content was approximately 20%.

scholarly journals Characterization and Performance of Carbon Films Deposited by Plasma and Ion Beam Based Techniques

1994 ◽  
Vol 354 ◽  
Author(s):  
K.C. Walter ◽  
H. Kung ◽  
T. Levine ◽  
J.T. Tesmer ◽  
P. Kodali ◽  
...  
Keyword(s):  
Wear Rate ◽  
Surface Area ◽  
Ion Beam ◽  
Carbon Films ◽  
The Self ◽  
Line Of Sight ◽  
Rf Power ◽  
Hard Carbon ◽  
Self Bias ◽  
Cathodic Arc

AbstractPlasma and ion beam based techniques have been used to deposit carbon-based films. The ion beam based method, a cathodic arc process, used a magnetically mass analyzed beam and is inherently a line-of-sight process. Two hydrocarbon plasma-based, non-line-of-sight techniques were also used and have the advantage of being capable of coating complicated geometries. The self-bias technique can produce hard carbon films, but is dependent on rf power and the surface area of the target. The pulsed-bias technique can also produce hard carbon films but has the additional advantage of being independent of rf power and target surface area. Tribological results indicated the coefficient of friction is nearly the same for carbon films from each deposition process, but the wear rate of the cathodic arc film was five times less than for the self-bias or pulsed-bias films. Although the cathodic arc film was the hardest, contained the highest fraction of sp3 bonds and exhibited the lowest wear rate, the cathodic arc film also produced the highest wear on the 440C stainless steel counterface during tribological testing. Thus, for tribological applications requiring low wear rates for both counterfaces, coating one surface with a very hard, wear resistant film may detrimentally affect the tribological behavior of the counterface.

Electrical Properties of Diamond-like Carbon Films Deposited Using a Filtered Cathodic Arc System

2001 ◽  
Vol 40 (Part 1, No. 2A) ◽  
pp. 777-782 ◽  
Author(s):  
Yan-Way Li ◽  
Chia-Fu Chen ◽  
Yu-Jen Tseng
Keyword(s):  
Electrical Properties ◽  
Carbon Films ◽  
Diamond Like Carbon ◽  
Cathodic Arc

Electrical Properties of Hard Carbon Films

1988 ◽  
Vol 131 ◽  
Author(s):  
Walter Varhue ◽  
Kiril Pandelisev ◽  
Brian Shinseki
Keyword(s):  
Electrical Properties ◽  
Optical Band Gap ◽  
Carbon Films ◽  
Operating Conditions ◽  
Hard Carbon ◽  
Ion Energy ◽  
Preparation Conditions ◽  
Amorphous Medium ◽  
Bonding Ratio ◽  
Species Production

ABSTRACTThe electrical resistivity, optical band gap and activation energy for electrical conduction have been determined as a function of preparation conditions. The operating conditions for the glow discharge reactor have been interpreted in terms of ion energy and reactive species production. The change in the electrical properties could not be explained as a percentage of [SP3] versus [SP2] bonding ratio. Rather, these two species are embedded in an amorphous medium which determines the materials electrical properties.

scholarly journals Structural and electrical properties of nanostructured silicon carbon films

2010 ◽  
Vol 2 (1) ◽  
pp. 3-7 ◽  
Author(s):  
G. Ambrosone ◽  
D.K. Basa ◽  
U. Coscia ◽  
L. Santamaria ◽  
N. Pinto ◽  
...  
Keyword(s):  
Electrical Properties ◽  
Carbon Films ◽  
Nanostructured Silicon ◽  
Silicon Carbon ◽  
Structural And Electrical Properties

FIELD EMISSION FROM CARBON FILMS GROWN BY THE CATHODIC ARC PROCESS

2000 ◽  
Vol 14 (02n03) ◽  
pp. 301-307 ◽  
Author(s):  
W. I. MILNE ◽  
J. ROBERTSON ◽  
B. S. SATYANARAYANA ◽  
A. HART
Keyword(s):  
Field Emission ◽  
Room Temperature ◽  
Deposition Process ◽  
Carbon Films ◽  
Deposition Parameters ◽  
Bonding Ratio ◽  
Cluster Beams ◽  
Cathodic Arc ◽  
Tetrahedrally Bonded

By using the catholic vacuum are deposition process, carbon films with variable sp 3/ sp 2 bonding ratio can be deposited on a variety of substrates at room temperature. The morphology of the films can be varied from the mirror like smooth tetrahedrally bonded carbon (ta-C) films through nanocluster to fibrous type carbon by altering the deposition parameters. This paper reviews the work carried out on Field Emission from such carbon films and compares the results with those on nanocluster films prepared using supersonic cluster beams. Threshold fields as low as 1 V /μ m with emission site densities of up to 104-105/ cm 2 have been obtained.

Study of Structural and Electrical Properties of Phosphorus-Doped p-Type ZnO Thin Films

2010 ◽  
Vol 49 (4) ◽  
pp. 041103 ◽  
Author(s):  
Yipeng Wang ◽  
Jianqing Zhou ◽  
Qian Lu ◽  
Lilong Liu ◽  
Xin Zhang ◽  
...  
Keyword(s):  
Thin Films ◽  
Electrical Properties ◽  
Zno Thin Films ◽  
Structural And Electrical Properties ◽  
P Type ◽  
Phosphorus Doped
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