Towards the Optimization of AMT Barrel Reactors for Silicon Epitaxy
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ABSTRACTIn this work, the epitaxial silicon deposition by SiHCl3-hydrogen mixtures in a AMT 7700 barrel reactor was analyzed through a detailed model where a three dimensional flow dynamic was solved by reduction to a two dimensional geometry under cylindrical coordinates. The model was used to investigate the role of the reactor geometry and of the process parameters on the axial deposition uniformity. A comparison with industrial experimental data was also performed.
2021 ◽
Vol 2057
(1)
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pp. 012027
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2018 ◽
Vol 388
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pp. 114-123
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2015 ◽
Vol 42
(24)
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pp. 10,663-10,670
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2001 ◽
Vol 3
(4)
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pp. 28
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