Very high hole concentrations in C-doped InGaAs using new sources with APOMVPE

1997 ◽  
Vol 485 ◽  
Author(s):  
A. Tandon ◽  
R. M. Cohen
Keyword(s):  
High Temperature ◽  
Structural Change ◽  
Carrier Concentration ◽  
Hole Concentration ◽  
X Ray Diffraction ◽  
Hydrogen Atoms ◽  
Carbon Doped ◽  
High Temperature Anneal ◽  
Order Of Magnitude ◽  
P Type

AbstractNew sources have been used to grow the first carbon doped, highly p-type InxGa1-xAs (0.2>x>0.7) epilayers on InP substrates by atmospheric pressure organometallic vapor phase epitaxy (APOMVPE). Excellent morphology was obtained simultaneously with high hole concentrations at growth temperatures near 450 °C. High hole concentrations of 1.6×1019 – 8.7×1019 cm−3 (the highest reported to date for APOMVPE), and the corresponding room temperature hole mobilities of 65 – 25 cm2/s, respectively, have been obtained from Hall measurements. X-ray diffraction is consistent with excellent crystal quality. Annealing at temperatures of T=400–500 °C in the presence of either nitrogen or hydrogen was found to change the carrier concentration by only 0–15%. However, after annealing at T=650 °C, irreversible changes occurred in the InGaAs. After a high temperature anneal, reversible order of magnitude changes in the hole concentration was obtained upon further annealing at low temperatures, depending upon the ambient. These results conclusively show that hydrogen does not passivate C acceptor ions in InGaAs. Since changes in the carrier concentration become substantial and reversible only after high temperature annealing, the results strongly suggest that a structural change occurred in the crystal at high temperatures. We consider it likely that this structural change is the precipitation of carbon out of a supersaturated solid solution, and that hydrogen atoms associated with these precipitates act as donors which compensate the hole concentration.

Defect Complexes and Non-Equilibrium Processes Underlying the P-Type Doping of GaN

1998 ◽  
Vol 537 ◽  
Author(s):  
Fernando A. Reboredo ◽  
Sokrates T. Pantelides
Keyword(s):  
High Temperature ◽  
Experimental Evidence ◽  
First Principles ◽  
Final Anneal ◽  
First Principles Calculations ◽  
Defect Complexes ◽  
Equilibrium Processes ◽  
Open Questions ◽  
High Temperature Anneal ◽  
P Type

AbstractIt is well known that hydrogen plays a key role in p-type doping of GaN. It is believed that H passivates substitutional Mg during growth by forming a Mgs-N-Hi complex; in subsequent annealing, H is removed, resulting in p-type doping. Several open questions have remained, however, such as experimental evidence for other complexes involving Mg and H and difficulties in accounting for the relatively high-temperature anneal needed to remove H. We present first principles calculations in terms of which we show that the doping process is in fact significantly more complex. In particular, interstitial Mg plays a major role in limiting p-type doping. Overall, several substitutional/interstitial complexes form and can bind H, with vibrational frequencies that account for hitherto unidentified observed lines. We predict that these defects, which limit doping efficiency, can be eliminated by annealing in an atmosphere of H and N prior to the final anneal that removes H.

Carbon Incorporation in Gaas grown by UHVCVD Using Trimethylgallium and Arsine

1992 ◽  
Vol 281 ◽  
Author(s):  
Seong-Ju Park ◽  
Jeong-Rae Ro ◽  
Jae-Ki Sim ◽  
El-Hang Lee
Keyword(s):  
Growth Rates ◽  
Hole Concentration ◽  
High Vacuum ◽  
Chemical Vapor ◽  
Ultra High Vacuum ◽  
Chemical Beam Epitaxy ◽  
Hydrogen Atoms ◽  
Carbon Incorporation ◽  
Significant Drop ◽  
P Type

ABSTRACTWe present results of a study on the effect of unprecracked arsine(AsH3) and trimethylgallium(TMGa) on carbon incorporation in UHVCVD(Ultra High Vacuum Chemical Vapor Deposition) grown GaAs epilayers on GaAs(100). Three distinct temperature-dependent regions of growth rates were identified as growth temperature was increased from 570 to 690°C. The growth rates were also strongly dependent on V/III ratio in a range of 5 to 30, which clearly indicates that the growth rate is determined by the amount of arsenic adsorbed on the surface at low V/III ratio and adsorption of TMGa or decomposition process at high V/III ratio. Hall concentration measurements and low temperature photoluminescence data show that the films are all p-type and their impurity concentrations are reduced by two orders of magnitude compared to those of epilayers grown by CBE(Chemical Beam Epitaxy) which employs TMGa and arsenic(precracked arsines) as source materials. Our results indicate that the hydrogen atoms dissociated from adsorbed arsine may remove hydrocarbon species resulting in a significant drop in hole concentration.

Optically Transparent of N-ZnO/p-NiO Heterojunction for Ultraviolet Photodetector Application

2011 ◽  
Vol 687 ◽  
pp. 711-715 ◽  
Author(s):  
Shu Yi Tsai ◽  
Min Hsiung Hon ◽  
Yang Ming Lu
Keyword(s):  
Zno Films ◽  
X Ray Diffraction ◽  
Glass Substrates ◽  
Voltage Curve ◽  
Current Voltage ◽  
Current Voltage Curve ◽  
Order Of Magnitude ◽  
Uv Visible ◽  
Diode Behavior ◽  
P Type

Transparent p–n heterojunction diodes consisting of n-type ZnO and p-type NiO thin films were prepared on glass substrates by r.f. magnetron sputtering. The structural and optical properties of the n-ZnO/p-NiO heterojunction were characterized by X-ray diffraction (XRD), UV–visible spectroscopy, Hall measurement, and I-V photocurrent measurements. The XRD shows that ZnO films are highly crystalline in nature with preferred orientation along the (0 0 2) orientation. The optical transmittances of ZnO and NiO films are 87% and 80%, respectively. The current–voltage curve of the heterojunction demonstrates obvious rectifying diode behavior in a dark environment. The lowest of leakage current is 7.73x10−8 A/cm2 for n-ZnO/p-NiO heterojunction diode. Upon UV irradiation, it was found that the detector current was increased by more than one order of magnitude. It was also found that the corresponding time constant for turn-on transient was τon = 27.9 ms while that for turn-off transient was τoff= 62.8 ms.

Electrical and Optical Properties of Carbon Doped Cubic GaN Epilayers Grown Under Extreme Ga Excess

2003 ◽  
Vol 798 ◽  
Author(s):  
D. J. As ◽  
D. G. Pacheco-Salazar ◽  
S. Potthast ◽  
K. Lischka
Keyword(s):  
Optical Properties ◽  
Hole Concentration ◽  
Hole Mobility ◽  
Growth Conditions ◽  
Rf Plasma ◽  
Electrical And Optical Properties ◽  
Carbon Doped ◽  
Cubic Gan ◽  
Hall Effect Measurements ◽  
P Type

ABSTRACTP-type doping of cubic GaN by carbon is reported with maximum hole concentration of 2 6.1×1018cm-3and hole mobility of 23.5 cm /Vs at room temperature, respectively. The cubic GaN:C was grown by rf-plasma assisted molecular beam epitaxy (MBE) under Ga-rich growth conditions on a semiinsulating GaAs (001) substrate (3 inches wafer). E-beam evaporation of a graphite rode with an C-flux of 1×1012cm-2s-1was used for C-doping of the c-GaN. Optical microscopy, Hall-effect measurements and photoluminescence were performed to investigate the morphological, electrical and optical properties of cubic GaN:C. Under Ga-rich growth conditions most part of the carbon atoms were incorporated substitutially on N-site giving p-type conductivity. Our results verify that effective p-type doping of c-GaN can be achieved under extrem Ga excess.

Structural transitions and electrical conductivity of C60 films at high temperature

1996 ◽  
Vol 11 (8) ◽  
pp. 2071-2075 ◽  
Author(s):  
Jinlong Gong ◽  
Guobin Ma ◽  
Guanghua Chen
Keyword(s):  
Electrical Conductivity ◽  
High Temperature ◽  
Room Temperature ◽  
X Ray Diffraction ◽  
Energy Band Gap ◽  
Defect States ◽  
Order Of Magnitude ◽  
Fcc Phase ◽  
New Phase ◽  
C60 Films

X-ray diffraction analysis on C60 films shows that besides fcc phase, there also exists hcp phase, as well as a new crystalline phase with interplanar spacing (d-spacing) of planes parallel to the substrate 0.95 nm. The new phase may relate to the intercrystalline packed C60 molecules between fcc crystallites. The room temperature electrical conductivity of C60 films is found to be in the range of 10−5–10−8 (Ω · cm)−1. The room temperature conductivities of C60 films annealed at temperatures above 473 K are lower by one order of magnitude than those at temperatures below 463 K. This is because the interconnection between the fcc crystallites is weakened due to the disappearance of the new intercrystalline phase and the subsequent heightening of the intercrystalline potential barrier. From the measurement on the conductivity versus time when the film is maintained at a constant temperature, we identified the increase of conductivity is the result of the decrease of hcp phase, while the decrease of conductivity is due to the decrease of the new intercrystalline phase. Because the structures of the films become highly ordered, and defect states in the energy band gap decrease on annealing at high temperature, the conductivity activation energy increases.

scholarly journals Studies on Carbon as Alternative P-Type Dopant for Gallium Nitride

1999 ◽  
Vol 4 (S1) ◽  
pp. 526-531 ◽  
Author(s):  
U. Birkle ◽  
M. Fehrer ◽  
V. Kirchner ◽  
S. Einfeldt ◽  
D. Hommel ◽  
...  
Keyword(s):  
Thermal Activation ◽  
Atomic Layer ◽  
Typical Feature ◽  
Acceptor Pair ◽  
Carbon Doped ◽  
Order Of Magnitude ◽  
Donor Acceptor ◽  
Donor Acceptor Pair ◽  
P Type ◽  
Carbon Concentrations

GaN layers were grown by molecular beam epitaxy and doped with carbon of nominal concentrations ranging from 1016 cm−3 to 1020 cm−3. The incorporation of carbon leads to a reduction of the background electron concentration by one order of magnitude but the material remains n-type. For high carbon concentrations a re-increase of the carrier concentration is observed which is related to selfcompensation. Investigations of the donor-acceptor-pair luminescence show that doping with carbon is accompanied by the generation of a new donor exhibiting a thermal activation energy of about 55 meV. Layers grown by atomic layer epitaxy are marked by an increased intensity of the donor-acceptor-pair band luminescence which is attributed to the enforced incorporation of carbon onto the nitrogen sublattice. The yellow luminescence is found to be a typical feature of all carbon doped layers in contrast to nominally undoped samples.

Synthesis and High Temperature Thermoelectric Properties of Alkaline-Earth Metal Hexaborides MB6 (M=Ca, Sr, Ba)

2003 ◽  
Vol 793 ◽  
Author(s):  
Masatoshi Takeda ◽  
Yosuke Kurita ◽  
Keisuke Yokoyama ◽  
Takahiro Miura ◽  
Tsuneo Suzuki ◽  
...  
Keyword(s):  
Electrical Conductivity ◽  
High Temperature ◽  
Seebeck Coefficient ◽  
Carrier Concentration ◽  
Thermoelectric Properties ◽  
Alkaline Earth ◽  
Earth Metal ◽  
Thermoelectric Device ◽  
Alloying Effect ◽  
P Type

ABSTRACTPolycrystalline alkaline-earth hexaborides (MB6: M =Ca, Sr, Ba) were synthesized and their thermoelectric and transport properties were examined to discuss their possibility as high temperature thermoelectric materials. Hall measurements showed that carrier concentration of the BaB6 was the highest among the three hexaborides and that of CaB6 was the lowest. Substitution of part of the alkaline earth metals with one of the others changed the carrier concentration of the hexaboride. As the carrier concentration increased, Seebeck coefficient increased and electrical conductivity decreased. These results suggest that the thermoelectric properties of the divalent hexaborides depend largely on the carrier concentration, and optimum carrier concentration which gives maximum power factor was estimated to be approximately 2x1026 m−3. Consequently, such a substitution enables us to control Seebeck coefficient and electrical conductivity of the hexaborides, and will also be effective to reduce the lattice heat conduction due to the alloying effect. A thermoelectric device was fabricated using SrB6 and boron carbide thin films as n-type and p-type elements, respectively. To the best of our knowledge, this is the first demonstration of a thermoelectric device composed of only boron-rich solids.

Hydrogenation of Gallium Nitride

1993 ◽  
Vol 325 ◽  
Author(s):  
M. S. Brandt ◽  
N. M. Johnson ◽  
R. J. Molnar ◽  
R. Singh ◽  
T. D. Moustakas
Keyword(s):  
Comparative Study ◽  
Conduction Band ◽  
Room Temperature ◽  
Hole Concentration ◽  
Conduction Band Edge ◽  
Order Of Magnitude ◽  
Si Doped ◽  
Donor State ◽  
P Type ◽  
Mg Doped

AbstractA comparative study of the effects of hydrogen in n-type (unintentionally and Si-doped) as well as p-type (Mg-doped) MBE-grown GaN is presented. Hydrogenation above 500°C reduces the hole concentration at room temperature in the p-type material by one order of magnitude. Three different microscopic effects of hydrogen are suggested: Passivation of deep defects and of Mg-acceptors due to formation of hydrogen-related complexes and the introduction of a hydrogenrelated donor state 100 meV below the conduction band edge.

Raman Scattering by Lo Pronon-Plasmon Coupled Mode in Heavily Carbon Doped P-Type InGsAs

1993 ◽  
Vol 325 ◽  
Author(s):  
Ming Qi ◽  
Jinsheng Luo ◽  
Junichi Shirakashi ◽  
Eisuke Tokumitsu ◽  
Shinji Nozaki ◽  
...  
Keyword(s):  
Raman Scattering ◽  
Molecular Beam ◽  
Hole Concentration ◽  
Dominant Role ◽  
Peak Position ◽  
Carbon Doped ◽  
Coupled Mode ◽  
Metalorganic Molecular Beam Epitaxy ◽  
P Type ◽  
Doping Case

AbstractThe Raman scattering from LO phonon–plasmon coupled (LOPC) mode in heavily carbon doped p–type InxGa1–xAs grown by metalorganic molecular beam epitaxy (MOMBE) was studied experimentally. Only one LOPC mode appears between the GaAs–like and InAs–like LO modes was observed. The peak position of the LOPC mode is near the GaAs–like TO mode frequency, and is not sensitive to the hole concentration. The intensity of the mode increases with increasing the carrier concentration while the two LO modes decrease and become unvisible under the higher doping level. The hole concentration dependence of the linewidth and intensity of the LOPC mode is very similar to that in p–type GaAs. It was shown that the plasmon damping effect plays a dominant role in the p–type doping case.

scholarly journals High temperature thermoelectric properties of Zn-doped Eu5In2Sb6

2015 ◽  
Vol 3 (40) ◽  
pp. 10518-10524 ◽  
Author(s):  
Sevan Chanakian ◽  
Umut Aydemir ◽  
Alex Zevalkink ◽  
Zachary M. Gibbs ◽  
Jean-Pierre Fleurial ◽  
...  
Keyword(s):  
High Temperature ◽  
Carrier Concentration ◽  
Thermoelectric Properties ◽  
Zintl Phase ◽  
P Type

The Zintl phase Eu5In2−xZnxSb6 (x = 0, 0.025, 0.05, 0.1, 0.2) with optimized p-type carrier concentration displays a zT of up to 0.4 at ∼660 K.

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