Radiative And Nonradiative Relaxation Of Excitons In GaN

1997 ◽  
Vol 482 ◽  
Author(s):  
A. Göldner ◽  
L. Eckey ◽  
A. Hoffmann ◽  
I. Broser ◽  
A. Alemu ◽  
...  

AbstractWe report on investigations of the excitonic quantum efficiency in GaN epilayers as function of buffer layer thickness, buffer layer material, sample thickness and residual oxygen content. These values are compared to that of GaN bulk material. The quantum efficiency of the free excitons rises with increasing buffer layer thickness, increasing sample thickness and decreasing residual oxygen content. The influence of oxygen on the quantum efficiency is stronger than that of the buffer layer thickness. Additionally, the homoepitaxial growth of GaN shows higher quantum efficiencies than the growth with an AIN buffer layer. In general, the observed quantum efficiencies in GaN epilayers are below 20% indicating the strong impact of nonradiative relaxation and recombination processes in the excitonic range. Only, GaN bulk material shows quantum efficiencies of 25 % for the free A-exciton XA and of 50 % for the donor-bound exciton complex D0,X).

2011 ◽  
Vol 11 (2) ◽  
pp. 1409-1412 ◽  
Author(s):  
Ah Ra Kim ◽  
Ju-Young Lee ◽  
Bo Ra Jang ◽  
Hong Seung Kim ◽  
Young Ji Cho ◽  
...  

2010 ◽  
Vol 19 (3) ◽  
pp. 036801 ◽  
Author(s):  
Wu Yu-Xin ◽  
Zhu Jian-Jun ◽  
Chen Gui-Feng ◽  
Zhang Shu-Ming ◽  
Jiang De-Sheng ◽  
...  

1994 ◽  
Vol 339 ◽  
Author(s):  
T. J. Kistenmacher ◽  
S. A. Ecelberger ◽  
W. A. Bryden

ABSTRACTIntroduction of a buffer layer to facilitate heteroepitaxy in thin films of the Group IIIA nitrides has had a tremendous impact on growth morphology and electrical transport. While AIN- and self-seeded growth of GaN has captured the majority of attention, the use of AIN-buffered substrates for InN thin films has also had considerable success. Herein, the properties of InN thin films grown by reactive magnetron sputtering on AIN-buffered (00.1) sapphire and (111) silicon are presented and, in particular, the evolution of the structural and electrical transport properties as a function of buffer layer sputter time (corresponding to thicknesses from ∼50Å to ∼0.64 μm) described. Pertinent results include: (a) for the InN overlayer, structural coherence and homogeneous strain normal to the (00.1) growth plane are highly dependent on the thickness of the AIN-buffer layer; (b) the homogeneous strain in the AIN-buffer layer is virtually nonexistent from a thickness of 200Å (where a significant X-ray intensity for (00.2)AIN is observed); and (c) the n-type electrical mobility for films on AIN-nucleated (00.1) sapphire is independent of AIN-buffer layer thickness, owing to divergent variations in carrier concentration and film resistivity. These effects are in the main interpreted as arising from a competition between the lattice mismatch of the InN overlayer with the substrate and with the AIN-buffer layer.


2004 ◽  
Vol 262 (1-4) ◽  
pp. 456-460 ◽  
Author(s):  
Yuantao Zhang ◽  
Guotong Du ◽  
Boyang Liu ◽  
HuiChao Zhu ◽  
Tianpeng Yang ◽  
...  

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