The Characterization of Alloyed NiGeAuAgAu Ohmic Contacts to AlInAs/GaInAs Heterostructure by Auger Electron Spectroscopy and Wavelength Dispersive X-Ray Analysis
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X Ray
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ABSTRACTIn a lattice-matched <100> InP/Ga0.47In0.53As/Al0.48In0.52As system used for modulation-doped field effect transistors (MODFETs), low resistance ohmic contacts to the two-dimensional electron gas have been fabricated using alloyed NiGeAuAgAu metallization. In this work we examine the use of Auger electron spectroscopy (AES) and wavelength dispersive x-ray spectroscopy (WDX) analyses for studying the metal-semiconductor interactions and their correlation with measured ohmic contact resistance.
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1986 ◽
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pp. 201-206
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