Charge Carrier Absorption in Doped Microcrystalline Silicon Films

1996 ◽  
Vol 452 ◽  
Author(s):  
M. Heintze ◽  
E. Lotter ◽  
C.-D. Abel ◽  
M. B. Schubert
Keyword(s):  
Chemical Vapor ◽  
Transport Parameters ◽  
Infrared Transmission ◽  
Microcrystalline Silicon ◽  
Very High Frequency ◽  
Silicon Thin Films ◽  
Carrier Absorption ◽  
Transmission Measurements ◽  
Very High ◽  
Infrared Data

AbstractThe infrared absorption in doped microcrystalline silicon thin films is analyzed by modelling the complex permittivity as the sum of the contributions resulting from interband transitions and from absorption by charge carriers. Their density and the drift mobility within grains is described by free carrier motion according to the Drude theory. However, for a good fit to experimental data a small trapping energy, reflecting the effect of grain boundaries, is included in the model. By comparing results obtained from the analysis of infrared data with conductivity and Hall measurements in films grown in a very high frequency (VHF) plasma and by hot-wire chemical vapor deposition (CVD), we show that infrared transmission measurements provide a simple access to transport parameters in these films.

Microstructure and Electric Transport Characteristic of Microcrystalline Silicon Films Fabricated by Very High Frequency Plasma Enhanced Chemical Vapor Deposition

2010 ◽  
Vol 663-665 ◽  
pp. 600-603
Author(s):  
Xiang Wang ◽  
Rui Huang ◽  
Jie Song ◽  
Yan Qing Guo ◽  
Chao Song ◽  
...  
Keyword(s):  
High Frequency ◽  
Volume Fraction ◽  
Chemical Vapor ◽  
Microcrystalline Silicon ◽  
Very High Frequency ◽  
Hydrogen Flow ◽  
Transmission Electron ◽  
High Frequency Plasma ◽  
Frequency Plasma ◽  
Very High

Microcrystalline silicon (μc-Si:H) film deposited on silicon oxide in a very high frequency plasma enhanced chemical vapor deposition with highly H2 dilution of SiH4 has been investigated by Raman spectroscopy and high resolution transmission electron microscopy. Raman spectroscopy results show that the crystalline volume fraction increases with increasing the hydrogen flow rate and for the hydrogen flow rate of 160 sccm, the crystalline volume fraction reaches to 67.5%. Nearly parallel columnar structures with complex microstructure are found from cross-sectional transmission electron microscopy images of the film. The temperature depend dark conductivity and activation energy are studied in order to investigate the electronic transport processes in the nc-Si films.

Effect of deposition rate on the growth mechanism of microcrystalline silicon thin films using very high frequency PECVD

Optik ◽  
2019 ◽  
Vol 180 ◽  
pp. 104-112 ◽  
Author(s):  
Xinli Li ◽  
Ruimin Jin ◽  
Lihua Li ◽  
Jingxiao Lu ◽  
Yongjun Gu ◽  
...  
Keyword(s):  
Thin Films ◽  
Deposition Rate ◽  
Growth Mechanism ◽  
High Frequency ◽  
Microcrystalline Silicon ◽  
Very High Frequency ◽  
Silicon Thin Films ◽  
Very High
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