Electrodeposited WO3 Thin Films

1996 ◽  
Vol 451 ◽  
Author(s):  
E. A. Meulenkamp ◽  
R. J. J. de Groot ◽  
J. M. L. de Vries
Keyword(s):  
Thin Films ◽  
Mass Transport ◽  
Deposition Technique ◽  
Electrochromic Devices ◽  
Solution Composition ◽  
Deposition Parameters ◽  
Tungstate Solution ◽  
Wo3 Thin Films

ABSTRACTThe electrodeposition of WO3 thin films from peroxy-tungstate solution is discussed. The emphasis is on the feasibility of this deposition technique for production of electrochromic devices. Therefore, the influence of deposition parameters (solution composition, electrodeposition potential, mass transport, etc.) on the properties of WO3 was studied. Furthermore, it was investigated whether electrodeposition of WO3 offers unique possibilities as compared to WO3 deposition by other techniques.

Luminescent Characteristics of Pulsed Laser Deposited Epitaxial Eu-Doped Y2O3 Films

1999 ◽  
Vol 574 ◽  
Author(s):  
D. Kumar ◽  
K. G. Cho ◽  
Zhang Chen ◽  
V. Craciun ◽  
P. H. Holloway ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Epitaxial Growth ◽  
Yttrium Oxide ◽  
Lattice Mismatch ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Deposition Technique ◽  
Deposition Parameters

AbstractThe growth, structural and cathodoluminescent (CL) properties of europium activated yttrium oxide (Eu:Y2O3) thin films are reported. The Eu:Y2O3 films were grown in-situ using a pulsed laser deposition technique. Our results show that Eu:Y2O3 films can grow epitaxially on (100) LaAlO3 substrates under optimized deposition parameters. The epitaxial growth of Eu:Y2O3 films on LaAlO3, which has a lattice mismatch of ∼ 60 %, is explained by matching of the atom positions in the lattices of the film and the substrate after a rotation. CL data from these films are consistent with highly crystalline Eu:Y2O3 films with an intense CL emission at 611 nm.

Mechanistic insights into the dry prelithiated WO3 thin films in electrochromic devices

2021 ◽  
Vol 373 ◽  
pp. 115814
Author(s):  
Zhenhua Wang ◽  
Liaolin Zhang ◽  
Hongliang Zhang ◽  
Ran Jiang ◽  
Lingyan Liang ◽  
...  
Keyword(s):  
Thin Films ◽  
Electrochromic Devices ◽  
Wo3 Thin Films

Characterization of pulsed laser deposited WO3 thin films for electrochromic devices

1999 ◽  
Vol 153 (1) ◽  
pp. 1-9 ◽  
Author(s):  
A Rougier ◽  
F Portemer ◽  
A Quédé ◽  
M El Marssi
Keyword(s):  
Thin Films ◽  
Pulsed Laser ◽  
Electrochromic Devices ◽  
Wo3 Thin Films

scholarly journals Tungsten Oxide Based Hydrogen Gas Sensor Prepared by Advanced Magnetron Sputtering

2021 ◽  
Vol 6 (1) ◽  
pp. 5
Author(s):  
Nirmal Kumar ◽  
Stanislav Haviar ◽  
Jiří Rezek ◽  
Jiří Čapek ◽  
Pavel Baroch
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Tungsten Oxide ◽  
Gas Sensor ◽  
Rf Sputtering ◽  
Hydrogen Gas ◽  
Deposition Parameters ◽  
Copper Tungstate ◽  
The Individual ◽  
Wo3 Thin Films

In this study, we demonstrate the advantages of two advanced sputtering techniques for the preparation of a thin-film conductometric gas sensor. We combined tungsten oxide (WO3) thin films with other materials to achieve enhanced sensorial behavior towards hydrogen. Thin films of WO3 were prepared using the DC and HiPIMS technique, which allowed us to tune the phase composition and crystallinity of the oxide by changing the deposition parameters. The second material was then added on-top of these films. We used the copper tungstate CuWO4 in the form of nano-islands deposited by reactive rf sputtering and Pd particles formed during conventional dc sputtering. The specimens were tested for their response to a time-varied hydrogen concentration in synthetic air at various temperatures. The sensitivity and response time were evaluated. The performance of the individual films is presented as well as the details of the synthesis. Advanced magnetron techniques (such as HiPIMS) allowed us to tune the property of the film to improve its sensorial behavior. The method is compatible with the silicon electronics industry and consists of a few steps that do not require any wet technique, and the films can be used in an as-deposited state. Therefore, sensorial nanostructured materials prepared using magnetron sputtering are very suitable for use in miniaturized electronic devices.

Electrochromism and Photochromism of WO3 Thin Films

1994 ◽  
Vol 369 ◽  
Author(s):  
C. Lefrou ◽  
O. Marrot ◽  
F. Garot
Keyword(s):  
Thin Films ◽  
Steady State ◽  
Insertion Reaction ◽  
Electrochromic Devices ◽  
Rest Potential ◽  
Photochromic Effect ◽  
Ion Conducting ◽  
Wo3 Thin Films ◽  
Sun Light ◽  
Ion Conducting Polymer

AbstractA photochromic effect is observed in WO3-based electrochromic devices with an ion-conducting polymer as electrolyte. Upon exposure to sun light, the electrochromic cells become blue. This is due to a change of color of the WO3 electrode. The photoeffect on this layer is due to a simultaneous insertion reaction (reduction) of the WO3 material and a photooxidation of water contained in the polymer. It is reversible and therefore not destructive for the complete device. The study of the transmittance and rest potential as a function of the time of exposure to light shows that a steady state is reached in c.a. 10 hours. The addition of U.V.-cut filters changes the reached steady-state, indicating that the photochromic effect is dependent upon the structure of the WO3 material.

Detailed transmittance analysis of high-performance SnO2-doped WO3 thin films in UV–Vis region for electrochromic devices

2020 ◽  
Vol 31 (21) ◽  
pp. 19074-19084
Author(s):  
Ali Olkun ◽  
Suat Pat ◽  
Nihan Akkurt ◽  
Reza Mohammadigharehbagh ◽  
Uğur Demirkol ◽  
...  
Keyword(s):  
Thin Films ◽  
High Performance ◽  
Electrochromic Devices ◽  
Wo3 Thin Films

WO3 Thin Films Active in the IR Region

2008 ◽  
Vol 55 ◽  
pp. 30-35
Author(s):  
Katherine Sauvet ◽  
Laurent Sauques ◽  
Olivier Durand ◽  
Jacques Perrière ◽  
Jean Bernard Ledeuil ◽  
...  
Keyword(s):  
Thin Films ◽  
Radio Frequency ◽  
Single Layer ◽  
Liquid Electrolyte ◽  
Chamber Pressure ◽  
Film Morphology ◽  
Electrochromic Devices ◽  
Electrochromic Properties ◽  
Wo3 Thin Films ◽  
Deposition Conditions

This paper reports the enhancement of the electrochromic properties in the infrared, IR, region of radio frequency sputtered WO3 thin films thanks to a careful optimization of the deposition conditions. From the combination of various techniques of characterization, the optical performances, in particular, the contrast in reflectance between the inserted state and the deinserted one, upon cycling in H3PO4 liquid electrolyte, are correlated to the film morphology and composition. Films, grown in higher chamber pressure, exhibiting a lower density and a O/W ratio higher than 3, show the most promising behavior. Finally, first trends on the incorporation of the WO3 single layer in full electrochromic devices are discussed.

Novel electrochromic devices based on complementary nanocrystalline TiO2 and WO3 thin films

1999 ◽  
Vol 350 (1-2) ◽  
pp. 269-275 ◽  
Author(s):  
Pierre Bonhôte ◽  
Eric Gogniat ◽  
Michael Grätzel ◽  
P.V Ashrit
Keyword(s):  
Thin Films ◽  
Electrochromic Devices ◽  
Nanocrystalline Tio2 ◽  
Wo3 Thin Films
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