Violet Luminescence from Ge+-Implanted SiO2 Film on Si Substrate
Keyword(s):
AbstractThe SiO2 films thermally grown on crystalline Si were implanted with Ge ions at 60 keV with doses of l×1015 cm-2 and l×1016 cm-2, followed by thermal annealing at various temperatures. Under an ultraviolet excitation of 240 nm, the films exhibit intense violet luminescence with a peak at 396 nm. This peak is ascribed to the T1 → S0 transition in GeO formed during implantation and annealing. After 1100°C annealing, Ge clusters were formed in an SiO2 matrix and a PL peak at 840 nm, due to the quantum confinement effect, which was measured at low temperature (77 K).
2017 ◽
Vol 703
◽
pp. 466-476
◽
2007 ◽
Vol 128
◽
pp. 53-58
◽
2001 ◽
Vol 182
(3-4)
◽
pp. 251-257
◽
Keyword(s):
2015 ◽
Vol 17
(19)
◽
pp. 12833-12840
◽
Keyword(s):
1992 ◽
Vol 01
(04)
◽
pp. 683-698
◽