Improved Spray-Pyrolysis Deposition System for Polycrystalline Conductive SnO2 Thin Films

1995 ◽  
Vol 403 ◽  
Author(s):  
V. Foglietti ◽  
A. Galbato ◽  
A. Bearzotti ◽  
A. Galloppa ◽  
P. Maltese

AbstractBismuth-doped tin oxide films have been deposited using a new spray-pyrolysis deposition system. Among the properties are the possibility of depositing thin films over very large areas with good uniformity and the relatively small cost compared with other types of deposition systems. The apparatus is divided in two major parts, the aerosol chamber and the deposition chamber. The deposition chamber consists of a flat rotating hot plate that can house substrates up to 18 cm in diameter. Deposition temperature ranges from 290 °C to 350 °C. The SEM pictures show a phase transition from amorphous to polycrystalline which also strongly affects the transport properties of the film. The high values of the surface resistivity obtained are consistent with those ones required to develop an analog grey scale ferroelectric liquid crystal display. The sample shows a 20% uniformity in the value of surface resistivity over an area of 140 cm2, and the results obtained until now show a satisfactory reproducibility. Bismuth and Tin concentration versus deposition temperature have been determined by ICP mass spectrometry. Our work is supported by the ESPRIT project “PROFELICITA”.

2015 ◽  
Vol 773-774 ◽  
pp. 652-656
Author(s):  
Noor Sakinah Khalid ◽  
Soo Ren How ◽  
Jais Lias ◽  
Mohd Khairul Ahmad

Fluorine doped tin oxide (FTO) thin films were prepared at different deposition temperatures using the spray pyrolysis deposition (SPD) technique. The deposition temperature were ranging from 250°C °C to 450°C and the precursor used was 0.5M of SnCl4.5H2O and 1.527M of NH4F completely dissolved in distilled water. It was observed that the conductivity of the FTO thin film increased with increasing of deposition temperature. At 450°C, it was shown the conductivity became smaller. Surface morphologies of FTO thin films at different deposition temperature had shown that the growth of crystallite particles and its distributions were totally affected by the deposition temperature. The transmittance of FTO thin films was over 80% within the wavelength from 300 nm - 800 nm. Thus, the best deposition temperature to be used is around 350°C to 400°C for depositing the FTO film.


Author(s):  
Sofea Nabila Hazmin ◽  
F. S. S. Zahid ◽  
N. S. M. Sauki ◽  
M. H. Mamat ◽  
M. N. Amalina

<span>This paper presents the physical and optical properties of AZO thin films on Teflon substrate at low deposition temperature by spray pyrolysis. In this study, the effect of different process parameters such as spray time and substrate to nozzle distance on the physical and optical characteristic of aluminium doped zinc oxide (AZO) deposited on Teflon substrates was investigated. The AZO thin films were successfully deposited onto Teflon substrate by spray pyrolysis technique at low deposition temperature. The physical analysis by X-ray diffraction (XRD) shows that the deposited Teflon substrate films have a preferred orientation along the direction (100) and (101). Optical measurements were conducted using Jasco/V-670 Ex Uv-Vis-NIR Spectrophotometer model to confirms that in visible ray it is possible to get good reflectance of AZO films with a reflection of 80%. The values of band gaps Eg were calculated from the spectra of UV-Visible reflectance that were vary between 3.06 and 3.14 eV. </span>


2010 ◽  
Vol 75 ◽  
pp. 197-201
Author(s):  
Concepción Mejía-García ◽  
José Luis López-López ◽  
Elvia Díaz-Valdés ◽  
Claudia Verónica Vázquez-Vera

We present a statistical study of the crystalline phase distribution in Pb-Ca-Ba-Cu-O precursor films grown by spray pyrolysis technique, with thickness and composition suitable to incorporate Hg by the sealed quartz tube technique in a subsequent treatment. A series of 9 precursor thin films were deposited on MgO substrates. Interdependence among deposition temperature, solution concentration, annealing temperature and annealed time and the effect in the relative percentage of each precursor phases was studied, applying a fractional factorial design 3IV-II. Chemical composition was obtained from atomic absorption measurements. Crystalline phase identification was performed by X-ray diffraction technique (XRD) and the quantification of each one was carried out by Rietveld method. The BaPbO3, Ba4Pb3O10 ternary phases were obtained at 810°C, and the BaCuO2 phase was got between 835°C and 860°C. Deposition temperature and molarity of the solution have clear influence on the thickness of the film. The effect of deposition temperature on the film composition was observed. Introduction


1996 ◽  
Vol 11 (3) ◽  
pp. 433-436 ◽  
Author(s):  
S López ◽  
S Granados ◽  
A Ortíz

2002 ◽  
Vol 110 (1286) ◽  
pp. 916-920 ◽  
Author(s):  
Akio TAKAYAMA ◽  
Kazumasa KONDO ◽  
Masayuki OKUYA ◽  
Shoji KANEKO

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