Process Modeling and Integration of The Salicide Process Module for Sub-Half Micron Technology.

1995 ◽  
Vol 402 ◽  
Author(s):  
Pushkar P. Apte ◽  
Douglas A. Prinslow ◽  
Jorge A. Kittl ◽  
R. Scott list ◽  
Gordon Pollack
Keyword(s):  
Process Design ◽  
Integrated Circuit ◽  
Hierarchical Models ◽  
Technology Development ◽  
Cmos Technology ◽  
Technological Innovations ◽  
Capture Process ◽  
Significant Challenge ◽  
Metal Silicides ◽  
And Performance

AbstractMetal silicides have been used extensively in CMOS technology for reducing electrical resistance. As wafer-scale features have shrunk to the sub-half micron domain, obtaining a self-aligned silicide - or salicide - process that satisfies all requirements has become a significant challenge. One part of this challenge lies in developing the necessary scientific insights and technological innovations for the actual salicide process, while the other part lies in building a complete salicide process module which meets requirements of performance, reliability, ease of integration, control, etc. at the least possible cost and cycle-time for technology development. This second part is seldom addressed by researchers, and yet, is fundamentally important for successful application of any salicide technology to actual integrated circuit products. This paper presents a complete picture of the salicide module in the context of all the aforesaid components; and describes the use of abstraction and hierarchical models to capture process information and to facilitate process design. Prototype compact models for key wafer-state and performance outputs such as TiSi2 thickness and resistance are presented to demonstrate implementation of this process module.

scholarly journals Design and Characteristics of CMOS Inverter based on Multisim and Cadence

2021 ◽  
Vol 2108 (1) ◽  
pp. 012034
Author(s):  
Haoran Xu ◽  
Jianghua Ding ◽  
Jian Dang
Keyword(s):  
Metal Oxide ◽  
Analog Circuits ◽  
Integrated Circuit ◽  
Complementary Metal Oxide Semiconductor ◽  
Cmos Technology ◽  
Data Converters ◽  
Metal Oxide Semiconductor ◽  
Oxide Semiconductor ◽  
Cmos Inverter ◽  
And Performance

Abstract Known as complementary symmetrical metal oxide semiconductor (cos-mos), complementary metal oxide semiconductor is a metal oxide semiconductor field effect transistor (MOSFET) manufacturing process, which uses complementary and symmetrical pairs of p-type and n-type MOSFETs to realize logic functions. CMOS technology is used to build integrated circuit (IC) chips, including microprocessors, microcontrollers, memory chips (including CMOS BIOS) and other digital logic circuits. CMOS technology is also used in analog circuits, such as image sensors (CMOS sensors), data converters, RF circuits (RF CMOS), and highly integrated transceivers for various types of communications. Based on multisim 14.0 and cadence, the characteristics and performance of CMOS inverter are studied by simulation.

Process Design & Integration of Salicide and Source/Drain Process Modules for Improved Device Performance

1998 ◽  
Vol 525 ◽  
Author(s):  
Pushkar P. Apte ◽  
Sharad Saxena ◽  
Suraj Rao ◽  
Karthik Vasanth ◽  
Douglas A. Prinslow ◽  
...  
Keyword(s):  
Process Design ◽  
Integrated Circuit ◽  
High Performance ◽  
Performance Enhancement ◽  
Process Integration ◽  
Channel Length ◽  
Trade Offs ◽  
Design Integration ◽  
And Performance ◽  
Circuit Delays

ABSTRACTIn integrated circuit (IC) fabrication, understanding and optimizing process interactions and variability is critical for swift process integration and performance enhancement, especially at dimensions ≤0.25μm. We present here an approach to address this challenge, and we apply it to improve the process design for two critical modules in a typical CMOS IC process—salicide and source/drain. Together, these modules impact the silicide-to-diffusion contact resistance (Rc), and the gate sheet resistance (Rs); which, in turn, significantly affect transistor series resistance and circuit delays respectively. In our approach, we have investigated a process domain consisting of both silicide and source/drain process variables; and we have developed a quantitative framework for analysis and optimization, along with qualitative insight into underlying the physical mechanisms. We demonstrate that the transistor drive current (Id) improves by ≈5‥, and circuit performance, as measured by the figure-of-merit (FOM), by ≈4‥. This improvement is significant, and an added benefit is that other transistor characteristics such as effective channel length, off-current, substrate current etc. are affected minimally. Finally, we use this approach to optimize trade-offs such as Rc vs Rs and performance vs manufacturability; thus enabling manufacturable processes that meet the requirements for high performance.

Enhancements of Non-contact Measurements of Electrical Waveforms on the Proximity of a Signal Surface Using Groups of Pulses

2002 ◽  
Author(s):  
Fenglei Du ◽  
Greg Bridges ◽  
D.J. Thomson ◽  
Rama R. Goruganthu ◽  
Shawn McBride ◽  
...  
Keyword(s):  
Integrated Circuits ◽  
Integrated Circuit ◽  
Signal To Noise Ratio ◽  
Electrostatic Force ◽  
Single Pulse ◽  
Electric Signal ◽  
Measurement Instruments ◽  
Cycle Times ◽  
Force Microscopy ◽  
And Performance

Abstract With the ever-increasing density and performance of integrated circuits, non-invasive, accurate, and high spatial and temporal resolution electric signal measurement instruments hold the key to performing successful diagnostics and failure analysis. Sampled electrostatic force microscopy (EFM) has the potential for such applications. It provides a noninvasive approach to measuring high frequency internal integrated circuit signals. Previous EFMs operate using a repetitive single-pulse sampling approach and are inherently subject to the signal-to-noise ratio (SNR) problems when test pattern duty cycle times become large. In this paper we present an innovative technique that uses groups of pulses to improve the SNR of sampled EFM systems. The approach can easily provide more than an order-ofmagnitude improvement to the SNR. The details of the approach are presented.

A Case Study of Defects Due to Process-Design Interaction in Nano Scale Technology

2007 ◽  
Author(s):  
Hung-Sung Lin ◽  
Ying-Chin Hou ◽  
Juimei Fu ◽  
Mong-Sheng Wu ◽  
Vincent Huang ◽  
...  
Keyword(s):  
Liquid Crystal ◽  
Circuit Design ◽  
Process Design ◽  
Integrated Circuit ◽  
Photon Emission ◽  
Integrated Circuit Design ◽  
Nano Scale ◽  
Leakage Path ◽  
Related Defect

Abstract The difficulties in identifying the precise defect location and real leakage path is increasing as the integrated circuit design and process have become more and more complicated in nano scale technology node. Most of the defects causing chip leakage are detectable with only one of the FA (Failure Analysis) tools such as LCD (Liquid Crystal Detection) or PEM (Photon Emission Microscope). However, due to marginality of process-design interaction some defects are often not detectable with only one FA tool [1][2]. This paper present an example of an abnormal power consumption process-design interaction related defect which could only be detected with more advanced FA tools.

SOFTSKILL FORMATION: AS A ROLE CHARACTER ON ETHICAL VALUES AND PERFORMANCE

2018 ◽  
Vol 5 (2) ◽  
pp. 7-8
Author(s):  
Lusy Tunik Muharlisiani
Keyword(s):  
Character Education ◽  
Technology Development ◽  
Negative Impact ◽  
Active Role ◽  
Daily Activities ◽  
Ethical Values ◽  
New Paradigm ◽  
Digital Era ◽  
Individual Character ◽  
And Performance

Formation to build character in the digital era in the world of education through the development of ethical values and performance support to form the foundation of individual characters expected. Developments in the digital era influence individual lifestyles and patterns of relationships so as to form a new paradigm for helping human needs in carrying out the duties and expectations. The purpose of building character besides having benefits also have a negative impact can be described in the attitudes and behavior of individuals, which occurs demoralisasasi. The method used in building individual character that balance the mind / creativity, feeling / sense of, and willingness / intention in executing their daily duties. The result is an imbalance in the event over them in carrying out daily activities using irrational thoughts, dishonest, irresponsible, did not have a good work ethic. How to cope with the character education should play an active role in shaping the students to have a good character, capable of being honest, responsible, disciplined, passionate, creative and communication skills to achieve success both socially and career aligned with technology development is very fast and sophisticated. The characters develop their conclusion to follow up the results of studies showing that the majority of a person in carrying out daily activities always use excessive feelings so that there is an imbalance between thought, feeling and will

РАЗРАБОТКА СВЧ МОНОЛИТНЫХ ИНТЕГРАЛЬНЫХ СХЕМ МИЛЛИМЕТРОВОГО ДИАПАЗОНА НА ОСНОВЕ GAAS ДЛЯ ПРИМЕНЕНИЯ В СОВРЕМЕННЫХ ИНФОРМАЦИОННОКОММУНИКАЦИОННЫХ СИСТЕМАХ НОВОГО ПОКОЛЕНИЯ (5G)

2020 ◽  
Vol 96 (3s) ◽  
pp. 321-324
Author(s):  
Е.В. Ерофеев ◽  
Д.А. Шишкин ◽  
В.В. Курикалов ◽  
А.В. Когай ◽  
И.В. Федин
Keyword(s):  
Output Power ◽  
Power Amplifier ◽  
Integrated Circuit ◽  
Phase Shifter ◽  
Phase Error ◽  
Microwave Integrated Circuit ◽  
Gain Compression ◽  
Monolithic Microwave Integrated Circuit ◽  
And Performance ◽  
Power Capability

В данной работе представлены результаты разработки СВЧ монолитной интегральной схемы шестиразрядного фазовращателя и усилителя мощности диапазона частот 26-30 ГГц. СКО ошибки по фазе и амплитуде фазовращателя составили 1,2 град. и 0,13 дБ соответственно. Максимальная выходная мощность и КПД по добавленной мощности усилителя в точке сжатия Ку на 1 дБ составили 30 дБм и 20 % соответственно. This paper describes the design, layout, and performance of 6-bit phase shifter and power amplifier monolithic microwave integrated circuit (MMIC), 26-30 GHz band. Phase shifter MMIC has RMS phase error of 1.2 deg. And RMD amplitude error is 0.13 dB. MMIC power amplifier has output power capability of 30 dBm at 1 dB gain compression (P-1dB) and PAE of 20 %.

Programmable Integrated Photonics

2020 ◽  
Author(s):  
José Capmany ◽  
Daniel Pérez
Keyword(s):  
Integrated Circuit ◽  
Performance Monitoring ◽  
Low Cost ◽  
Limiting Factors ◽  
External Control ◽  
Integrated Photonics ◽  
New Paradigm ◽  
Photonic Integrated Circuit ◽  
And Performance ◽  
Application Fields

Programmable Integrated Photonics (PIP) is a new paradigm that aims at designing common integrated optical hardware configurations, which by suitable programming can implement a variety of functionalities that, in turn, can be exploited as basic operations in many application fields. Programmability enables by means of external control signals both chip reconfiguration for multifunction operation as well as chip stabilization against non-ideal operation due to fluctuations in environmental conditions and fabrication errors. Programming also allows activating parts of the chip, which are not essential for the implementation of a given functionality but can be of help in reducing noise levels through the diversion of undesired reflections. After some years where the Application Specific Photonic Integrated Circuit (ASPIC) paradigm has completely dominated the field of integrated optics, there is an increasing interest in PIP justified by the surge of a number of emerging applications that are and will be calling for true flexibility, reconfigurability as well as low-cost, compact and low-power consuming devices. This book aims to provide a comprehensive introduction to this emergent field covering aspects that range from the basic aspects of technologies and building photonic component blocks to the design alternatives and principles of complex programmable photonics circuits, their limiting factors, techniques for characterization and performance monitoring/control and their salient applications both in the classical as well as in the quantum information fields. The book concentrates and focuses mainly on the distinctive features of programmable photonics as compared to more traditional ASPIC approaches.

scholarly journals Video Scanning Hartmann Optical Testing of State-of-the-Art Parabolic Trough Concentrators

Solar Energy ◽  
2006 ◽  
Author(s):  
Tim Wendelin ◽  
Ken May ◽  
Randy Gee
Keyword(s):  
Technology Development ◽  
Scale Up ◽  
Test System ◽  
Optical Testing ◽  
Parabolic Trough ◽  
Energy Technologies ◽  
Energy Needs ◽  
World Energy ◽  
Optical Test ◽  
And Performance

Significant progress has been made recently in solar parabolic trough technology development and deployment. Part of this success is due to the changing world energy scenario and the recognition that viable renewable energy technologies can play a role in supplying world energy needs. Part is also due to ongoing collaborative efforts by industry and the Department of Energy’s (DOE) Concentrating Solar Power Program (CSP) to enhance the state of the technology in terms of both cost and performance. Currently, there are two trough concentrator projects which the DOE CSP program is supporting. One company, Solargenix, is developing a design to be used in a 64MW plant outside of Boulder City, Nevada. This design is based on the original LUZ LS-2 trough concentrators employed at the Solar Electric Generating Systems (SEGS) plants in Southern California. Another company, Industrial Solar Technology (IST), is working on a scale-up of their design used historically for process heat applications. Very different from the LS-2 approach, this design is still in the research and development stages. One way in which the DOE CSP parabolic trough program assists industry is by providing optical testing and qualification of their concentrator designs. This paper describes the Video Scanning Hartmann Optical Test System (VSHOT) used to optically test both of these designs. The paper also presents the results of tests performed in the past year and what impact the testing has had on the developmental direction of each design.

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