Calculation of Carrier and Lattice Temperatures Induced in Si and GaAs By Picosecond Laser Pulses
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ABSTRACTA previously presented computer model was used to calculate melt thresholds and carrier temperatures in crystalline silicon and gallium arsenide subjected to picosecond laser pulses at 532 nm. The energy relaxation time of hot carriers was a variable parameter. For Si, a thermalization time of 1 ps yields results which are in very satisfactory agreement with published experimental data: the melt threshold is 0.19 J/cm2, and the maximum carrier temperature for the threshold pulse is 5500 K. The melt threshold in GaAs is substantially less, 0.03 J/cm2 for a thermalization time of 1 ps.
Формирование кремниевых наночастиц методом импульсной лазерной абляции пористого кремния в жидкостях
2020 ◽
Vol 46
(14)
◽
pp. 13
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