Characterization of Magneto-Optical Rare Earth-Doped Ingaasp Thin Films on InP

1995 ◽  
Vol 392 ◽  
Author(s):  
B. J. Stadler ◽  
K. Vaccaro ◽  
A. Davis ◽  
E. A. Martin ◽  
G. O. Ramseyer ◽  
...  

AbstractWe have investigated the properties of rare earth-doped InGaAsP thin films with special interest in magneto-optical device applications. Magneto-optical properties have been used in optical systems as isolators, waveguides, and switches. These materials and devices can be used to expand the functionality of InP opto-electronic integrated circuits (OEICs). Thin films of InP, InGaAs, and InGaAsP, grown by liquid phase epitaxy, were lattice matched to the (100) InP substrates. The films were n-type, with the carrier concentration decreasing by an order of magnitude in the doped films due to gettering by the rare earth elements. The doped films contained 2.6×1018 - 1.5×1020 cm−3 rare earth elements, which were observed to segregate toward the film/melt interface in the more highly doped films. A broad photoluminescence was observed at 1.52 μm in the Er-doped films. The Verdet constant was measured through the sample thickness, and the substrate signal dominated the measurements. However, the measured values were in agreement with published values for InP, which gives an indication of the films' host value. The Verdet constants increased from 4 to 7 deg/T/mm as the wavelength decreased toward the band edge. The band edges of our samples were 0.93, 1.62, and 1.30 μm, respectively. Rare earth dopants were observed to raise the refractive index of the InP films, and waveguiding at 1.3 μm was achieved in the rare earth-doped InP films and in the InGaAsP films.

2004 ◽  
Vol 832 ◽  
Author(s):  
C. Rozo ◽  
L. F. Fonseca ◽  
O. Resto ◽  
S. Z. Weisz

ABSTRACTEr3+, and Nd3+ doped Si/Al/SiO2 and thin films have been prepared by rf co-sputtering. Some of these films were annealed to 700°C. Erbium doped Si/Al/SiO2 films were prepared with two different sputtering configurations: one configuration with a large quantity of Al and a second configuration with a smaller quantity of Al. The configuration with large quantity of Al shows a diminished luminescence at 1.53 μm, but this emission is increased by substrate heating. The configuration with smaller quantity of Al shows emission at 1.525 μm similar in intensity to the Er-doped Si/SiO2. The spectral shape for the 4I13/2→4I15/2 emission is broader than for an analogous Er3+ doped Si/SiO2. The smaller quantity of Al configuration increases the solubility of Nd3+ (and luminescence for high Nd3+ concentration) in Si/SiO2 films and changes the spectral shape of the 4F3/2 emission with respect to the Nd3+ doped Si/SiO2 films.


2014 ◽  
Vol 1033-1034 ◽  
pp. 1235-1238
Author(s):  
Tao Bai ◽  
Shi Gen Zhu

Rare earth doped titaniumdioxide (TiO2) thin films (rare earth-doped TiO2) have been successfully prepared on a glass substrate by a sol–gel route. After the rare earth-doped TiO2thin films were calcined at 773K for 1h, the effect of rare earth-doping on the properties were investigated using X-ray diffraction (XRD), scanning electronmicroscopy (SEM), ultraviolet–visible spectroscopy and thermogravimetric techniques (TG/DTG). The XRD results showed that rare earth-doped TiO2thin films contained only a single crystalline phase of anatase TiO2after calcining at 773K for 1h. SEM micrographs showed that rare earth-doped TiO2thin films have smooth surfaces containing granular nanocrystallines and are without cracks. The UV–vis absorption spectra showed that the absorption of the rare earth-doped TiO2thin films has a red-shift. From ambient to 1273K, it is about 12% of mass loss because of the volatilizing of water and organic and the phase transformation.


1996 ◽  
Vol 422 ◽  
Author(s):  
B. J. H. Stadler ◽  
J. P. Lorenzo

AbstractRare earth (Gd, Eu, Er) doped InGaAs and InP layers were grown by liquid phase epitaxy (LPE). The refractive index of these layers was observed to increase with the addition of the rare earth ions. The observed increase could not be explained by changes in host composition as typically calculated from changes in lattice parameter. In fact, the refractive index was seen to increase (∼0.25) by an order of magnitude more than would be expected by the change in the lattice parameter (∼0.02). The increased refractive indices of InP layers due to Er-doping enabled waveguiding. These findings suggest that optically active waveguide devices can be fabricated from semiconducting hosts by simple rare earth doping.


1962 ◽  
Vol 18 (4) ◽  
pp. 1127-1153
Author(s):  
V FASSEL ◽  
R CURRY ◽  
R KNISELEY

2017 ◽  
Vol 8 (1) ◽  
Author(s):  
Takaaki Hatanaka ◽  
Akimasa Matsugami ◽  
Takamasa Nonaka ◽  
Hideki Takagi ◽  
Fumiaki Hayashi ◽  
...  

Coatings ◽  
2021 ◽  
Vol 11 (6) ◽  
pp. 724
Author(s):  
Sara Massardo ◽  
Alessandro Cingolani ◽  
Cristina Artini

Rare earth-doped ceria thin films are currently thoroughly studied to be used in miniaturized solid oxide cells, memristive devices and gas sensors. The employment in such different application fields derives from the most remarkable property of this material, namely ionic conductivity, occurring through the mobility of oxygen ions above a certain threshold temperature. This feature is in turn limited by the association of defects, which hinders the movement of ions through the lattice. In addition to these issues, ionic conductivity in thin films is dominated by the presence of the film/substrate interface, where a strain can arise as a consequence of lattice mismatch. A tensile strain, in particular, when not released through the occurrence of dislocations, enhances ionic conduction through the reduction of activation energy. Within this complex framework, high pressure X-ray diffraction investigations performed on the bulk material are of great help in estimating the bulk modulus of the material, and hence its compressibility, namely its tolerance toward the application of a compressive/tensile stress. In this review, an overview is given about the correlation between structure and transport properties in rare earth-doped ceria films, and the role of high pressure X-ray diffraction studies in the selection of the most proper compositions for the design of thin films.


1967 ◽  
Vol 22 (4) ◽  
pp. 551-555 ◽  
Author(s):  
W. Jeitschko ◽  
E. Parthé

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