scholarly journals Film Synthesis on Powders by Cathodic ARC Plasma Deposition

1995 ◽  
Vol 388 ◽  
Author(s):  
André Anders ◽  
Simone Anders ◽  
Ian G. Brown ◽  
Igor C. Ivanov

AbstractCathodic arc plasma deposition was used to coat Al2O3 powder (mesh size 60) with platinum. the power particles were moved during deposition using a mechanical system operating at a resonance frequency of 20 Hz. Scanning electron microscopy and auger electron microscopy show that all particles are completely coated with a platinum film having a thickness of about 100 nm. the actual deposition time was only 20 s, thus the deposition rate was very high (5 nm/s).

1996 ◽  
Vol 46 (1) ◽  
pp. 77-83 ◽  
Author(s):  
Kwang-Lung Lin ◽  
Ming-Yeong Hwang ◽  
Cheng-Dau Wu

2005 ◽  
Vol 200 (5-6) ◽  
pp. 1391-1394 ◽  
Author(s):  
S.K. Kim ◽  
P.V. Vinh ◽  
J.H. Kim ◽  
T. Ngoc

2015 ◽  
Vol 719-720 ◽  
pp. 127-131
Author(s):  
Min Jung Kim ◽  
Dong Bok Lee

TiAlCrSiN thin films consisting of alternating TiCrN and AlSiN nanolayers were deposited by cathodic arc plasma deposition, and oxidized at 1000°C in air. When oxidized for 10 h, about 1 μm-thick oxide sale formed, and its surface was covered with numerous tiny oxide crystallites. When oxidized for 30 h, about 2.5 μm-thick oxide scale formed, and began to spall from the surface. When oxidized for 80 h, the oxide sale was about 12.2 μm-thick. The film had a reasonable oxidation resistance due mainly to Al, Cr, and Si, which formed protective oxides.


2008 ◽  
Vol 202 (22-23) ◽  
pp. 5395-5399 ◽  
Author(s):  
Sun Kyu Kim ◽  
Pham Van Vinh ◽  
Jae Wook Lee

Sign in / Sign up

Export Citation Format

Share Document