Replication Lithography

1984 ◽  
Vol 38 ◽  
Author(s):  
H. W. Deckman ◽  
J. H. Dunsmuir
Keyword(s):  
Science And Technology ◽  
Diffraction Gratings ◽  
New Method ◽  
Pattern Transfer ◽  
Large Area ◽  
Surface Textures ◽  
Aspect Ratios ◽  
Dry Processing ◽  
Inorganic Substrate

AbstractA new method has been developed which allows submicron patterns to be rapidly copied from a master into an inorganic substrate. Physical repli-cation and lithographic pattern transfer are combined to produce a wide variety of surface textures on large area substrates. Physical replication techniques are used to create a polymeric intermediate transfer mask which is then used as an etch mask on the substrate. Both positive and negative copies of the original pattern can be created using this process. Final pattern transfer is accomplished by dry processing, allowing precisely controlled alterations of the aspect ratios in the original pattern. Using this process it is possible to fabricate extremely large area submicron sized surface textures (such as diffraction gratings) which are useful in many areas of science and technology.

scholarly journals Chlorosulfuric acid-assisted production of functional 2D materials

2021 ◽  
Vol 5 (1) ◽  
Author(s):  
Mohsen Moazzami Gudarzi ◽  
Maryana Asaad ◽  
Boyang Mao ◽  
Gergo Pinter ◽  
Jianqiang Guo ◽  
...  
Keyword(s):  
Hexagonal Boron Nitride ◽  
2D Materials ◽  
Real Life ◽  
Large Area ◽  
Polar Solvents ◽  
Aspect Ratios ◽  
Two Dimensional Materials ◽  
Liquid Phase Exfoliation

AbstractThe use of two-dimensional materials in bulk functional applications requires the ability to fabricate defect-free 2D sheets with large aspect ratios. Despite huge research efforts, current bulk exfoliation methods require a compromise between the quality of the final flakes and their lateral size, restricting the effectiveness of the product. In this work, we describe an intercalation-assisted exfoliation route, which allows the production of high-quality graphene, hexagonal boron nitride, and molybdenum disulfide 2D sheets with average aspect ratios 30 times larger than that obtained via conventional liquid-phase exfoliation. The combination of chlorosulfuric acid intercalation with in situ pyrene sulfonate functionalisation produces a suspension of thin large-area flakes, which are stable in various polar solvents. The described method is simple and requires no special laboratory conditions. We demonstrate that these suspensions can be used for fabrication of laminates and coatings with electrical properties suitable for a number of real-life applications.

scholarly journals Synthesis of α-CaSO4·0.5H2O from flue gas desulfurization gypsum regulated by C4H4O4Na2·6H2O and NaCl in glycerol-water solution

RSC Advances ◽  
2017 ◽  
Vol 7 (44) ◽  
pp. 27807-27815 ◽  
Author(s):  
Qing-Jun Guan ◽  
Wei Sun ◽  
Yue-Hua Hu ◽  
Zhi-Gang Yin ◽  
Chang-Ping Guan
Keyword(s):  
Phase Transition ◽  
Flue Gas ◽  
Water Solution ◽  
Flue Gas Desulfurization ◽  
New Method ◽  
Glycerol Water ◽  
Aspect Ratios

A brand new method to prepare α-CaSO4·0.5H2O with low aspect ratios from flue gas desulfurization gypsum in glycerol-water solution was presented, in which NaCl was used as the phase transition accelerator and C4H4O4Na2·6H2O as the crystal modifier.

Pulse deposition of large area, patterned manganese oxide nanowires in variable aspect ratios without templates

2008 ◽  
Vol 10 (11) ◽  
pp. 1792-1796 ◽  
Author(s):  
Chi-Chang Hu ◽  
Kuo-Hsin Chang ◽  
Yung-Tai Wu ◽  
Ching-Yun Hung ◽  
Chi-Cheng Lin ◽  
...  
Keyword(s):  
Manganese Oxide ◽  
Large Area ◽  
Oxide Nanowires ◽  
Aspect Ratios ◽  
Pulse Deposition

Closed-chamber CVD — a new method for preparation of group-IV thin films for large area electronics

2001 ◽  
Vol 383 (1-2) ◽  
pp. 206-208
Author(s):  
S. Koynov ◽  
M. Tzolov ◽  
P. Brogueira ◽  
R. Schwarz
Keyword(s):  
Thin Films ◽  
Group Iv ◽  
New Method ◽  
Large Area ◽  
Closed Chamber ◽  
Large Area Electronics

Research on Power and Brake Detection Integration of Wheeled Construction Machinery

2014 ◽  
Vol 945-949 ◽  
pp. 2126-2131
Author(s):  
Cong Cong Gong ◽  
Ming Lu ◽  
Hai Feng Ling ◽  
Bo Li
Keyword(s):  
Mathematical Model ◽  
Performance Test ◽  
New Method ◽  
Test Equipment ◽  
Treatment Efficiency ◽  
Large Area ◽  
Construction Machinery ◽  
Test Platform ◽  
Brake Performance ◽  
The Mathematical Model

The power and brake performance of wheeled construction machinery are separately detected on different test equipment in present chassis detection line. A new method is put forward in the veiw of high cost, large area occupied and low treatment efficiency of the traditional line. A DC dynamometer is provided as the power absorbing device and the reverse drag device to combine the two separate platforms in the proposed method, and the mathematical model of DC dynamometer is built based on the principle of chassis performance test. The parameter of dynamometer is determined by calculating, and power and brake detection integration of the wheeled construction machinery is achieved on the integrated test platform.

scholarly journals A new method to generate superoscillating functions and supershifts

2021 ◽  
Vol 477 (2249) ◽  
pp. 20210020
Author(s):  
Yakir Aharonov ◽  
Fabrizio Colombo ◽  
Irene Sabadini ◽  
Tomer Shushi ◽  
Daniele C. Struppa ◽  
...  
Keyword(s):  
Signal Processing ◽  
Quantum Mechanics ◽  
Large Class ◽  
Science And Technology ◽  
Fourier Component ◽  
New Method ◽  
Weak Values ◽  
Antenna Theory ◽  
Superoscillating Functions ◽  
Band Limited

Superoscillations are band-limited functions that can oscillate faster than their fastest Fourier component. These functions (or sequences) appear in weak values in quantum mechanics and in many fields of science and technology such as optics, signal processing and antenna theory. In this paper, we introduce a new method to generate superoscillatory functions that allows us to construct explicitly a very large class of superoscillatory functions.

scholarly journals Enhanced Surface Properties of Light-Trapping Si Nanowires Using Synergetic Effects of Metal-Assisted and Anisotropic Chemical Etchings

2019 ◽  
Vol 9 (1) ◽  
Author(s):  
Youngsoon Jeong ◽  
Chanwoo Hong ◽  
Yeong Hun Jung ◽  
Rashida Akter ◽  
Hana Yoon ◽  
...  
Keyword(s):  
Interfacial Energy ◽  
Chemical Etching ◽  
Low Cost ◽  
Light Trapping ◽  
Si Nanowires ◽  
Si Substrate ◽  
Large Area ◽  
Aspect Ratios ◽  
Energy States ◽  
Si Nanostructures

Abstract Metal-assisted chemical etching (MACE) has been widely explored for developing silicon (Si)-based energy and optical devices with its benefits for low-cost and large-area fabrication of Si nanostructures of high aspect ratios. Surface structures and properties of Si nanostructures fabricated through MACE are significantly affected by experimental and environmental conditions of etchings. Herein, we showed that surfaces and interfacial energy states of fabricated Si nanowires can be critically affected by oxidants of MACE etching solutions. Surfaces of fabricated Si nanowires are porous and their tips are fully covered with lots of Si nano-sized grains. Strongly increased photoluminescence (PL) intensities, compared to that of the crystalline Si substrate, are observed for MACE-fabricated Si nanowires due to interfacial energy states of Si and SiOx of Si nano-sized grains. These Si grains can be completely removed from the nanowires by an additional etching process of the anisotropic chemical etching (ACE) of Si to taper the nanowires and enhance light trapping of the nanowires. Compared with the MACE-fabricated Si nanowires, ACE-fabricated tapered Si nanowires have similar Raman and PL spectra to those of the crystalline Si substrate, indicating the successful removal of Si grains from the nanowire surfaces by the ACE process.

scholarly journals Fabrication of Large Area, Ordered Nanoporous Structures on Various Substrates for Potential Electro-Optic Applications

2021 ◽  
Vol 11 (24) ◽  
pp. 12136
Author(s):  
Hongsub Jee ◽  
Kiseok Jeon ◽  
Min-Joon Park ◽  
Jaehyeong Lee
Keyword(s):  
Ion Beam ◽  
High Sensitivity ◽  
Interference Lithography ◽  
Periodic Pattern ◽  
Pattern Transfer ◽  
Direct Writing ◽  
Large Area ◽  
Anodized Aluminum ◽  
Multibeam Interference ◽  
Nanoporous Structures

Nanoporous structures have attracted great attention in electronics, sensor and storage devices, and photonics because of their large surface area, large volume to surface ratio, and potential for high-sensitivity sensor applications. Normally, electron or ion beam patterning can be used for nanopores fabrication by direct writing. However, direct writing is a rather expensive and time-consuming method due to its serial nature. Therefore, it may not translate to a preferred manufacturing process. In this research, a perfectly ordered large-area periodic pattern in an area of approximately 1 cm2 has been successfully fabricated on various substrates including glass, silicon, and polydimethylsiloxane, using a two-step process comprising visible light-based multibeam interference lithography and subsequent pattern transfer processes of reactive ion etching and nanomolding. Additionally, the multibeam interference lithography templated anodized aluminum oxide process has been described. Since the fabrication area in multibeam interference lithography can be extended by using a larger beam size, it is highly cost effective and manufacturable. Furthermore, although not described here, an electrodeposition process can be utilized as a pattern transfer process. This large-area perfectly ordered nanopore array will be very useful for high-density electronic memory and photonic bandgap and metamaterial applications.

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