Etching Reactions at Solid Surfaces
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AbstractAn understanding of etching reactions in a plasma environment requires a knowledge of: (1) the types of gas phase particles which react at the surface, (2) the etch products formed, and (3) the processes which lead from reactants to products. Experimental data relavant to these topics are reviewed in this paper. A conceptual framework for understanding the etching reaction is reviewed and it is shown that the experimental data presently available is consistent with this framework. The influence of ion bombardment on etching reactions is extensively discussed.
Theoretical analysis of counter-current absorption of a poorly soluble gas based on the PDE-AD model
1986 ◽
Vol 51
(6)
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pp. 1222-1239
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1991 ◽
Vol 56
(10)
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pp. 2020-2029
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1989 ◽
Vol 54
(11)
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pp. 2933-2950
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1989 ◽
Vol 157
(1-2)
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pp. 55-59
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1997 ◽
Vol 31
(12)
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pp. 3600-3605
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