Light-Induced Changes Among Fast-Relaxing Hydrogens in Plasma-Deposited Hydrogenated Amorphous Silicon

1995 ◽  
Vol 377 ◽  
Author(s):  
M. J. Kernan ◽  
R. L. Corey ◽  
P. A. Fedders ◽  
D. J. Leopold ◽  
R. E. Norberg ◽  
...  
Keyword(s):  
Magnetic Resonance ◽  
Hydrogenated Amorphous Silicon ◽  
Film Sample ◽  
High Quality ◽  
Reflected Light ◽  
Dense Fluid ◽  
Spectral Components ◽  
Plasma Decomposition ◽  
Induced Changes ◽  
Hydrogenated Amorphous

ABSTRACTLight-induced rearrangements in a-Si:H,D during and after illumination have been studied by deuteron magnetic resonance (DMR). A film sample was deposited on a 230°C Al substrate by plasma decomposition of S1H4 and D2. The high quality film contained 4 at.% H and 4 at. % D. DMR spectra of fast-relaxing components were examined at 700 msec or less after radio frequency saturation. At 30 K these showed a broad central signal (primarily nanovoid-trapped HD and D2), part of which shifted paramagnetically during illumination. No comparable shifts were shown by spectral components from Si-bonded hydrogen or from microvoid-contained dense fluid hydrogen. The observed post-illumination shifts vanished upon 150°C dark anneal and reflected light-induced metastable magnetic changes in the surroundings of hydrogen trapped in nanovoids.

Nuclear Magnetic Resonance Studies of Hydrogen in Amorphous Silicon

1996 ◽  
Vol 420 ◽  
Author(s):  
R. E. Norberg ◽  
P. A. Fedders ◽  
D. J. Leopold
Keyword(s):  
Nuclear Magnetic Resonance ◽  
Magnetic Resonance ◽  
Amorphous Silicon ◽  
Molecular Hydrogen ◽  
Hydrogenated Amorphous Silicon ◽  
High Quality ◽  
Magnetic Resonance Studies ◽  
Structural Configurations ◽  
Species Specific ◽  
Hydrogenated Amorphous

AbstractProton and deuteron NMR in hydrogenated amorphous silicon yield quantitative measures of species-specific structural configurations and their dynamics. Populations of silicon-bonded and molecular hydrogens correlate with photovoltaic quality, doping, illumination/dark anneal sequences, and with infrared and other characterizations. High quality films contain substantial populations of nanovoid-trapped molecular hydrogen.

High Rate Deposition of Stable Hydrogenated Amorphous Silicon in Transition from Amorphous to Microcrystalline Silicon

2003 ◽  
Vol 762 ◽  
Author(s):  
Guofu Hou ◽  
Xinhua Geng ◽  
Xiaodan Zhang ◽  
Ying Zhao ◽  
Junming Xue ◽  
...  
Keyword(s):  
Phase Transition ◽  
Amorphous Silicon ◽  
Hydrogenated Amorphous Silicon ◽  
Chemical Vapor ◽  
High Rate ◽  
Very High Frequency ◽  
High Quality ◽  
Working Pressure ◽  
Hydrogen Dilution ◽  
Hydrogenated Amorphous

AbstractHigh rate deposition of high quality and stable hydrogenated amorphous silicon (a-Si:H) films were performed near the threshold of amorphous to microcrystalline phase transition using a very high frequency plasma enhanced chemical vapor deposition (VHF-PECVD) method. The effect of hydrogen dilution on optic-electronic and structural properties of these films was investigated by Fourier-transform infrared (FTIR) spectroscopy, Raman scattering and constant photocurrent method (CPM). Experiment showed that although the phase transition was much influenced by hydrogen dilution, it also strongly depended on substrate temperature, working pressure and plasma power. With optimized condition high quality and high stable a-Si:H films, which exhibit σph/σd of 4.4×106 and deposition rate of 28.8Å/s, have been obtained.

Mechanical Spectroscopy Study on the Light Soaking Effect on Hydrogenated Amorphous Silicon

2012 ◽  
Vol 184 ◽  
pp. 416-421 ◽  
Author(s):  
H. Mizubayashi ◽  
I. Sakata ◽  
H. Tanimoto
Keyword(s):  
Internal Friction ◽  
Temperature Dependence ◽  
Amorphous Silicon ◽  
Hydrogenated Amorphous Silicon ◽  
Wide Distribution ◽  
Activation Energies ◽  
Mechanical Spectroscopy ◽  
Induced Changes ◽  
Mild Temperature ◽  
Hydrogenated Amorphous

For hydrogenated amorphous silicon (a-Si:H) films deposited at temperatures between 423 K and 623 K (a-Si:H423Kand so on), the light-induced changes in the internal friction between 80 K and 400 K were studied. The internal friction is associated with H2motion in microvoid networks, and shows the mild temperature dependence between about 80 K and 300 K (Q-180-300K) and the almost linear increase above 300 K (Q-1>300K). BothQ-180-300KandQ-1>300Kdecrease with increasing the deposition temperature, and show the mild temperature dependence ina-Si:H623K. The white light soaking with 100 mW/cm2(WLS100and so on) below 300 K caused a change inQ-180-300Kand no changes inQ-1>300K, respectively, and the light-induced changes inQ-180-300Krecovered after annealing at 423 K. The wide distribution of activation energies for H2motions between microvoids indicate that most of neighboring microvoids are connected through windows, i.e., the microvoid networks are existing ina-Si:H, and the spatially loose or solid structures are responsible for the low or high activation energies for the H2motion between microvoids, respectively. Furthermore, the light-induced hydrogen evolution (LIHE) was observed for WLS200to WLS400in a vacuum between 400 and 500 K, resulting in the disappearance of the internal friction due to the H2motion in the microvoid network.

scholarly journals High quality crystalline silicon surface passivation by combined intrinsic and n-type hydrogenated amorphous silicon

2011 ◽  
Vol 99 (20) ◽  
pp. 203503 ◽  
Author(s):  
Jan-Willem A. Schüttauf ◽  
Karine H. M. van der Werf ◽  
Inge M. Kielen ◽  
Wilfried G. J. H. M. van Sark ◽  
Jatindra K. Rath ◽  
...  
Keyword(s):  
Amorphous Silicon ◽  
Silicon Surface ◽  
Surface Passivation ◽  
Crystalline Silicon ◽  
Hydrogenated Amorphous Silicon ◽  
High Quality ◽  
Hydrogenated Amorphous ◽  
Silicon Surface Passivation
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