Polymer Hosts for Non-Linear Absorbing Materials

1994 ◽  
Vol 374 ◽  
Author(s):  
Stephen P McGeoch ◽  
Alan Christie ◽  
Gurmit S Bahra ◽  
Kevin R Welford
Keyword(s):  
Solid Phase ◽  
Damage Threshold ◽  
Host Material ◽  
Absorbing Materials ◽  
Non Linear ◽  
Laser Induced Damage

AbstractThere is a recognised requirement for solid-phase, non-linear absorbing devices. We present data for a range of non-linear absorbing dyes in polymer hosts. We identify polycarbonate as a useful host material. We recognise that progress will be required to increase the laser-induced damage threshold of the dyed polymers if practical devices are to be realised.

Dual wavelength laser-induced damage threshold measurements of alumina/silica and hafnia/silica ultraviolet antireflective coatings

2015 ◽  
Vol 55 (1) ◽  
pp. 104 ◽  
Author(s):  
Marius Mrohs ◽  
Lars Jensen ◽  
Stefan Günster ◽  
Thimotheus Alig ◽  
Detlev Ristau
Keyword(s):  
Damage Threshold ◽  
Dual Wavelength ◽  
Antireflective Coatings ◽  
Dual Wavelength Laser ◽  
Laser Induced Damage

scholarly journals High laser induced damage threshold photoresists for nano-imprint and 3D multi-photon lithography

Nanophotonics ◽  
2021 ◽  
Vol 0 (0) ◽  
Author(s):  
Elmina Kabouraki ◽  
Vasileia Melissinaki ◽  
Amit Yadav ◽  
Andrius Melninkaitis ◽  
Konstantina Tourlouki ◽  
...  
Keyword(s):  
Nanoimprint Lithography ◽  
Three Dimensional ◽  
Damage Threshold ◽  
Laser Pulses ◽  
Intense Laser ◽  
Optical Elements ◽  
Photonic Circuits ◽  
Future Production ◽  
Intense Laser Pulses ◽  
Laser Induced Damage

Abstract Optics manufacturing technology is predicted to play a major role in the future production of integrated photonic circuits. One of the major drawbacks in the realization of photonic circuits is the damage of optical materials by intense laser pulses. Here, we report on the preparation of a series of organic–inorganic hybrid photoresists that exhibit enhanced laser-induced damage threshold. These photoresists showed to be candidates for the fabrication of micro-optical elements (MOEs) using three-dimensional multiphoton lithography. Moreover, they demonstrate pattern ability by nanoimprint lithography, making them suitable for future mass production of MOEs.

scholarly journals Laser-induced damage thresholds of ultrathin targets and their constraint on laser contrast in laser-driven ion acceleration experiments

2020 ◽  
Vol 8 ◽  
Author(s):  
Dahui Wang ◽  
Yinren Shou ◽  
Pengjie Wang ◽  
Jianbo Liu ◽  
Zhusong Mei ◽  
...  
Keyword(s):  
Damage Threshold ◽  
Wide Band ◽  
Laser Pulses ◽  
Laser Damage Threshold ◽  
Single Shot ◽  
Bulk Materials ◽  
Free Standing ◽  
Wide Band Gap ◽  
Different Types ◽  
Laser Induced Damage

Abstract Single-shot laser-induced damage threshold (LIDT) measurements of multi-type free-standing ultrathin foils were performed in a vacuum environment for 800 nm laser pulses with durations τ ranging from 50 fs to 200 ps. The results show that the laser damage threshold fluences (DTFs) of the ultrathin foils are significantly lower than those of corresponding bulk materials. Wide band gap dielectric targets such as SiN and formvar have larger DTFs than semiconductive and conductive targets by 1–3 orders of magnitude depending on the pulse duration. The damage mechanisms for different types of targets are studied. Based on the measurement, the constrain of the LIDTs on the laser contrast is discussed.

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