Generation and Structural Analysis of Silicon Nanoparticles

1994 ◽  
Vol 358 ◽  
Author(s):  
Ping Li ◽  
Klaus Sattler
Keyword(s):  
Structural Analysis ◽  
Atomic Force Microscope ◽  
Silicon Nanoparticles ◽  
Pyrolytic Graphite ◽  
Silicon Wafers ◽  
Silicon Substrates ◽  
Size Distributions ◽  
Particle Interactions ◽  
Atomic Force ◽  
Silicon Vapor

ABSTRACTWe have generated 20 to 100 nm sized silicon nanoparticles and analyzed their morphologies using an atomic force microscope (AFM). The particles are formed by deposition of silicon vapor onto silicon wafers and highly oriented pyrolytic graphite (HOPG). On silicon substrates, the particles are close to spherical with relatively narrow size distributions and they are randomly located. On graphite substrates the particles are arranged in chains. Within the chains they show strong deformations in the contact areas. We relate this to covalent inter-particle interactions.

Manipulation of Nickel Nanoparticles Deposited on HOPG

2004 ◽  
Vol 853 ◽  
Author(s):  
Massood Z. Atashbar ◽  
Valery N. Bliznyuk ◽  
Srikanth Singamaneni
Keyword(s):  
Atomic Force Microscope ◽  
Magnetic Force ◽  
Nickel Nanoparticles ◽  
Pyrolytic Graphite ◽  
Critical Force ◽  
Contact Mode ◽  
Cyclic Voltametry ◽  
Atomic Force ◽  
Nickel Nanowires ◽  
Plating Solution

ABSTRACTNickel nanowires were fabricated by electrodepositing Ni from an aqueous plating solution onto the step edges of Highly Oriented Pyrolytic Graphite (HOPG). Freshly cleaved HOPG was exposed to a plating solution of nickel and electro chemically deposited by cyclic voltametry. The morphology of the deposited nanoparticles was studied using an Atomic Force Microscope (AFM) in non-contact mode. The magnetic force of interaction between the nanoparticles was studied by magnetizing the particles. The critical force to displace the nanoparticles was estimated using contact mode of AFM.

Electro-Machining (EM) Using Metal Coated Atomic Force Microscope Tip and Single-Walled Carbon Nanotube Buckypaper Films

2006 ◽  
Author(s):  
Jin Gyu Park ◽  
Qing Liu ◽  
Chuck Zhang ◽  
Richard Liang ◽  
Ben Wang ◽  
...  
Keyword(s):  
Carbon Nanotube ◽  
Atomic Force Microscope ◽  
Pyrolytic Graphite ◽  
Metal Films ◽  
Nanometer Scale ◽  
Single Walled Carbon Nanotube ◽  
Single Walled Carbon ◽  
Atomic Force ◽  
Highly Ordered Pyrolytic Graphite ◽  
Afm Tips

Using metal-coated atomic force microscope (AFM) tips and single-walled carbon nanotube (SWNT) BuckyPaper films, the authors have successfully explored the feasibility of electro-machining (EM) at the nanometer scale. Highly ordered pyrolytic graphite (HOPG) and thin metal films were used as a substrate (workpiece) and metal-coated (Cr/Au) Si AFM tips and BuckyPaper films were used as electrodes. A negative voltage pulse was applied to the AFM tip to fabricate holes as small as 30 nm in diameter on the HOPG surface. Using SWNT BuckyPaper films, the submicron holes were fabricated on a metal surface, demonstrating that SWNTs can work as electrodes.

Adsorption and growth of dip-coating prepolymer films on silicon wafers. An atomic force microscope study

1997 ◽  
Vol 115 (1) ◽  
pp. 10-22 ◽  
Author(s):  
T Gesang ◽  
R Höper ◽  
W Possart ◽  
J Petermann ◽  
O.-D Hennemann
Keyword(s):  
Atomic Force Microscope ◽  
Microscope Study ◽  
Dip Coating ◽  
Silicon Wafers ◽  
Atomic Force

Experimental Study on Cryogenic Polishing Single Silicon Wafer with Nano-Sized Cerium Dioxide Powders

2007 ◽  
Vol 24-25 ◽  
pp. 177-182 ◽  
Author(s):  
Yu Li Sun ◽  
Dun Wen Zuo ◽  
Yong Wei Zhu ◽  
Rong Fa Chen ◽  
D.S. Li ◽  
...  
Keyword(s):  
Experimental Study ◽  
Atomic Force Microscope ◽  
Silicon Wafer ◽  
Cerium Dioxide ◽  
Smooth Surface ◽  
Silicon Wafers ◽  
Atomic Force ◽  
Polishing Pad

Cryogenic polishing single silicon wafer with nano-sized CeO2 abrasives can be known as cryogenic fixed abrasives CMP (CFA-CMP). The abrasive slurry was made of nano-sized CeO2 particles dispersed in de-ionized water with a surfactant and the polishing slurry froze to form cryogenic polishing pad. Then the polishing tests of the blanket silicon wafers in the presence of the cryogenic polishing pad containing the nano-particulates were carried out. The morphologies and surfaces roughness of the polished silicon wafers were observed and examined on an atomic force microscope (AFM). The results show that a super smooth surface with roughness of 0. 293 nm is obtained within 5000 nm× 5000 nm and the removal of material is dominated by plastic flowage.

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