Temperature Dependence of Amorphization for Zirconolite and Perovskite Irradiated with 1 Mev Krypton Ions

1994 ◽  
Vol 353 ◽  
Author(s):  
T. J. White ◽  
R. C. Ewing ◽  
L. M. Wang ◽  
J. S. Forrester ◽  
C. Montross

AbstractA transmission electron microscope investigation was made of zirconolites and perovskites irradiated to amorphization with 1 MeV krypton ions using the HVEM-Tandem Facility at Argonne National Laboratory. Three specimens were examined - a prototype zirconolite CaZrTi2O7, a gadolinium doped zirconolite Ca0.75Gd0.50Zr0.75Ti2O7and a uranium doped zirconolite Ca0.75U0.50Zr0.75Ti2O7. The critical amorphization dose Dc was determined at several temperatures between 20K to 675K. Dc was inversely proportional with temperature. For example, pure zirconolite requiring 10x the dose for amorphization at 475K compared with gadolinium zirconolite. Using an Arrhenius plot, the activation energy Ea for annealing in these compounds was found to be 0.129 eV and 0.067 eV respectively. The greater ease of amorphization for the gadolinium sample is probably a reflection of this element’s large cross section for interaction with heavy ions. Uranium zirconolite was very susceptible to damage and amorphised under 4 keV argon ions during the preparation of microscope specimens. In each sample, zirconolite coexisted with minor perovskite, reduced rutile (Magneli phases) and zirconia. These phases were more resistant to ion irradiation than zirconolite. Even for high gadolinium loadings, perovskite (Ca0.8Gd0.2TiO3) was 3-4 times more stable to ion irradiation than the surrounding zirconolite crystals.

Author(s):  
M. W. Bench ◽  
I. M. Robertson ◽  
M. A. Kirk

Transmission electron microscopy experiments have been performed to investigate the lattice damage created by heavy-ion bombardments in GaAs. These experiments were undertaken to provide additional insight into the mechanisms by which individual amorphous zones and eventually amorphous layers are created. To understand these mechanisms, the structure of the defects created as a function of material, irradiating ion, dose, dose rate, and implantation tenperature have been studied using TEM. Also, the recovery of the crystalline structure by annealing has been investigated.These experiments were performed at the High-Voltage Electron Microscope - Ion Accelerator Facility at Argonne National Laboratory. This facility consists of an HVEM which has been interfaced with two ion accelerators. This coupling, plus the availability of several specimen stages permits ion irradiations to be performed in the specimen chamber of the microscope at controlled temperatures from 10 to 1000 K.


1997 ◽  
Vol 3 (S2) ◽  
pp. 771-772
Author(s):  
W.L. Gong ◽  
L.M. Wang ◽  
R.C. Ewing

Radiation damage in quartz has been of interest to the semiconductor industry, optical fiber industry, and nuclear industry. Cross-section transmission electron microscopy (TEM) is a powerful tool for investigating the irradiation effects since it provides a direct measurement of the ion and the damage distributions, and can also provide detailed microstructural information such as the presence of amorphous regions and the size, density and chemical nature of defect aggregates. The results reported below are from a systematic cross-section TEM study on 1.5 MeV Kr+ ion irradiated quartz.3-mm discs of quartz (along 010 face) were prepared with 100 μm in thickness. One side for each discs was well polished using a 0.05 μm diamond paste. The well-polished side was irradiated at room temperature with 1.5 MeV Kr ions in the HVEM-Tandem Facility at Argonne National Laboratory. Following irradiation, cross-section TEM specimens were prepared using the so-called T-tool technique, a modified tripot technique


Author(s):  
Charles W. Allen ◽  
Robert C. Birtcher

The uranium silicides, including U3Si, are under study as candidate low enrichment nuclear fuels. Ion beam simulations of the in-reactor behavior of such materials are performed because a similar damage structure can be produced in hours by energetic heavy ions which requires years in actual reactor tests. This contribution treats one aspect of the microstructural behavior of U3Si under high energy electron irradiation and low dose energetic heavy ion irradiation and is based on in situ experiments, performed at the HVEM-Tandem User Facility at Argonne National Laboratory. This Facility interfaces a 2 MV Tandem ion accelerator and a 0.6 MV ion implanter to a 1.2 MeV AEI high voltage electron microscope, which allows a wide variety of in situ ion beam experiments to be performed with simultaneous irradiation and electron microscopy or diffraction.At elevated temperatures, U3Si exhibits the ordered AuCu3 structure. On cooling below 1058 K, the intermetallic transforms, evidently martensitically, to a body-centered tetragonal structure (alternatively, the structure may be described as face-centered tetragonal, which would be fcc except for a 1 pet tetragonal distortion). Mechanical twinning accompanies the transformation; however, diferences between electron diffraction patterns from twinned and non-twinned martensite plates could not be distinguished.


2008 ◽  
Vol 1122 ◽  
Author(s):  
Karl R. Whittle ◽  
Katherine L. Smith ◽  
Mark G. Blackford ◽  
Simon A.T. Redfern ◽  
Elizabeth J. Harvey ◽  
...  

AbstractSynthetic pyrochlore samples Y2Ti2-xSnxO7 (x=0.4, 0.8, 1.2, 1.6), Nd2Zr2O7, Nd2Zr1.2Ti0.8O7, and La1.6Y0.4Hf2O7, were irradiated in-situ using the IVEM-TANDEM microscope facility at the Argonne National Laboratory. The critical temperatures for amorphisation have revealed a dramatic increase in tolerance with increasing Sn content for the Y2Ti2-xSnxO7 series. This change has also found to be linear with increasing Sn content. Nd2Zr1.2Ti0.8O7 and La1.6Y0.4Hf2O7 were both found to amorphise, while Nd2Zr2O7 was found to be stable to high doses (2.5×10^15 ions cm-2). The observed results are presented with respect to previously published results for irradiation stability predictions and structural disorder.


1993 ◽  
Vol 316 ◽  
Author(s):  
A.T. Motta ◽  
L.M. Howe ◽  
P.R. Okamoto

ABSTRACTThis paper reports the results from a study conducted to determine the effect of electron energy on the dose-to-amorphization of Zr3Fe at 23-30 K. Zr3Fe samples were irradiated in the HVEM at Argonne National Laboratory, at energies ranging from 200 to 900 keV. Amorphization occurred at electron energies from 900 keV down to 250 keV. Three distinct regions were observed: between 900 and 700 keV amorphization occurred at a constant low dose of ~ 4 × 1021 e cm-2; a higher plateau at 1022 was observed between 600 and 400 keV, and finally there was a sharp increase in the dose-to-amorphization below 400 keV, so that at 250 keV the necessary dose was an order of magnitude higher than that at 900 keV. In the region below 400 keV there was evidence of a dependence of the dose-to-amorphization on the orientation of the sample with respect to the electron beam. The results can be analyzed in terms of a composite displacement cross section dominated at high energies by displacements of Zr and Fe atoms, by displacements of Fe atoms at intermediate energies and of secondary displacements of lattice atoms by recoil impurities at low energies.


1988 ◽  
Vol 100 ◽  
Author(s):  
M. W. Bench ◽  
I. M. Robertson ◽  
M. A. Kirk

ABSTRACTTransmission electron microscopy experiments have been performed to investigate the lattice damage created by heavy-ion bombardments in GaAs. These experiments have been performed in situ by using the HVEN - Ion Accelerator Facility at Argonne National Laboratory. The ion bcorbardments (50 keV Ar+ and Kr+) and the microscopy have been carried out at temperatures rangrin from 30 to 300 K. Ion fluences ranged from 2 × 1011 to 5 × 1013 ions cm−2.Direct-inpact amorphization is observed to occur in both n-type and semi-insulating GaAs irradiated to low ion doses at 30 K and room temperature. The probability of forming a visible defect is higher for low temperature irradiations than for room temperature irradiations. The amorphous zones formed at low temperature are stable to temperatures above 250 K. Post implantation annealing is seen to occur at room temperature for all samples irradiated to low doses until eventually all visible damage disappears.


1992 ◽  
Vol 279 ◽  
Author(s):  
A. T. Motta ◽  
L. M. Howe ◽  
P. R. Okamoto

ABSTRACTThin foils of Zircaloy-4 were irradiated with 350 KeV 40Ar ions in the dual ion beam/HVEM facility at Argonne National Laboratory at 300 – 650 K. The irradiation-induced araorphization of the intermetallic precipitates Zr (Cr, Fe)2 and Zr2 (Ni, Fe) was studied in situ. For Zr (Cr,Fe)2 precipitates the dose-to-amorphization was found to increase exponentially with temperature, with a critical temperature of about 650 K. The amorphization morphology was shown to be homogeneous, with no preferential site for nucleation, in contrast to neutron-irradiation amorphization which started at the precipitate-matrix interface. For Zr2 (Ni,Fe) precipitates it was found that amorphization occurred at 550 K and 600 K, whereas in neutron irradiation no amorphization has been observed at those temperatures. The results are discussed in the context of the previous experimental results of neutron and electron irradiation and likely amorphization mechanisms are proposed.


Author(s):  
P. P. Newcomer ◽  
L. M. Wang ◽  
M. L. Miller ◽  
R. C. Ewing

The Tl-Ba-Ca-Cu-O class of type-II high temperature superconductors (HTS) have Tc's as high as 125K. Although they have good critical current values, when a field is applied the weak pinning and consequent flow of magnetic vortices are a major impediment to the usefulness of these materials. Ion irradiation has been shown to enhance the pinning. High quality single crystals, as determined with x-ray precession and HRTEM, with sharp HTS Meissner signals, were irradiated with 1.5 MeV Kr+ and Xe+ ions using the HVEM-Tandem facility at Argonne National Laboratory. Ion beam microstructural modification was studied in-situ using electron diffraction and after irradiation using HRTEM and nano-beam EDS on Tl-1212 and Tl-2212 (numbers designate the stoichiometry Tl-Ba- Ca-Cu-O) single-crystal HTS. After irradiation, microstructure was studied using the JEOL 2010 in the Earth and Planetary Science Department at the University of New Mexico in order to characterize the resulting irradiation-induced nano-size precipitates.


Author(s):  
R. C. Birtcher ◽  
L. M. Wang ◽  
C. W. Allen ◽  
R. C. Ewing

We present here results of in situ TEM diffraction observations of the response of U3Si and U3Si2 when subjected to 1 MeV electron irradiation or to 1.5 MeV Kr ion irradiation, and observations of damage occuring in natural zirconolite. High energy electron irradiation or energetic heavy ion irradiation were performed in situ at the HVEM-Tandem User Facility at Argonne National Laboratory. In this Facility, a 2 MV Tandem ion accelerator and a 0.6 MV ion implanter have been interfaced to a 1.2 MeV AEI high voltage electron microscope. This allows a wide variety of in situ experiments to be performed with simultaneous ion irradiation and conventional transmission electron microscopy. During the electron irradiation, the electron beam was focused to a diameter of about 2 μ.m at the specimen thin area. The ion beam was approximately 2 mm in diameter and was uniform over the entire specimen. With the specimen mounted in a heating holder, the temperature increase indicated by the furnace thermocouple during the ion irradiation was typically 8 °K.


1992 ◽  
Vol 268 ◽  
Author(s):  
Mauro P. Otero ◽  
Charles W. Allen

ABSTRACTA special technique is described for in situ transmission electron microscope (TEM) experiments involving simultaneous ion irradiation, in which the resultant phenomena are observed as in a cross-section TEM specimen. That is, instead of ion-irradiating the film or foil specimen normal to the major surfaces and observing in plan view (i.e., in the same direction), the specimen is irradiated edge-on (i.e., parallel to the major surfaces) and is observed normal to the depth direction with respect to the irradiation. The results of amorphization of Si, irradiated in this orientation by 1 or 1.5 MeV Kr, are presented and briefly compared with the usual plan view observations. The limitations of the technique are discussed and several experiments which might profitably employ this technique are suggested.


Sign in / Sign up

Export Citation Format

Share Document