Recent Advances in Si And Ge Zone-Melting
Recrystallization
ABSTRACTBy improving the thermal uniformity and stability of our graphite-strip-heater oven, we have been able to significantly improve the overall quality of ZMR Si films. We have observed unbranched subboundaries and new types of defects that are less extended than the usual sub-boundaries. The overall wafer flatness has been improved so that total warp is less than 4 μm for 3-inch wafers. We have also utilized the ZMR technique for producing thin Ge-on-insulator films.
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1987 ◽
Vol 70
(7)
◽
pp. 105-112
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